IP Library › Assignment 032612/0572
Patent Assignment
Reel/Frame 032612/0572

Change of Name

Recorded: 2014-04-04 Pages: 16
Assignor
SII NANOTECHNOLOGY INC.
Executed: 2013-01-01
Assignee
HITACHI HIGH-TECH SCIENCE CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, TOKYO, 105-0003, JAPAN
Covered Properties (2)
Photomask Defect Correcting Method and Device
Patent: 8,257,887 →
Application: 12/733,090 →
Publication: US 2010/0178601
Photomask Defect Correcting Method and Device
Patent: 8,815,474 →
Application: 13/601,028 →
Publication: US 2012/0328974
Related Assignments (7)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 19, 2010
From: TAKAOKA, OSAMU
To: SII NANOTECHNOLOGY INC.
Reel/Frame 024112/0519 →
Assignment of Assignor's Interest Oct 3, 2012
From: TAKAOKA, OSAMU
To: SII NANOTECHNOLOGY INC.
Reel/Frame 029126/0627 →
Change of Name Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →
Change of Address Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0543 →
Change of Address Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072909/0223 →
Change of Name Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0636 →
Change of Name Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072907/0356 →