IP Library Assignment 032628/0926
Patent Assignment
Reel/Frame 032628/0926

Assignment of Assignor's Interest

Recorded: 2014-04-08 Pages: 7
Assignor
LUMINESCENT TECHNOLOGIES, INC.
Executed: 2014-03-27
Assignee
DINO TECHNOLOGY ACQUISITION LLC
ONE TECHNOLOGY DRIVE, CARE OF: KLA-TENCOR LEGAL DEPT., MILPITAS, CALIFORNIA, 95035
Covered Properties (36)
Multistage Extreme Ultra-Violet Mask Qualification
Technique for Repairingan Euv Photo-Mask
Film-Growth Model Using Level Sets
Optimized Photomasks for Photolithography
Patent: 7,480,889 →
Application: 10/408,924 →
Publication: US 2007/0011644
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
Patent: 7,124,394 →
Application: 10/408,928 →
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
Patent: 7,178,127 →
Application: 11/209,268 →
Publication: US 2007/0011645
Optimized Photomasks for Photolithography
Patent: 7,571,423 →
Application: 11/225,378 →
Publication: US 2007/0011647
Systems, Masks, and Methods for Photolithography
Patent: 7,707,541 →
Application: 11/531,673 →
Publication: US 2007/0184357
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
Patent: 7,441,227 →
Application: 11/549,846 →
Publication: US 2007/0198966
Technique for Determining a Mask Pattern Corresponding to a Photo-Mask
Patent: 7,703,068 →
Application: 11/674,130 →
Publication: US 2007/0136716
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
Patent: 7,757,201 →
Application: 11/674,133 →
Publication: US 2007/0192756
Physical-Resist Model Using Fast Sweeping
Patent: 7,805,700 →
Application: 11/773,923 →
Publication: US 2009/0013304
Write-Pattern Determination for Maskless Lithography
Patent: 8,245,162 →
Application: 12/206,651 →
Publication: US 2009/0077526
Write-Pattern Determination for Maskless Lithography
Patent: 8,111,380 →
Application: 12/206,660 →
Publication: US 2009/0073413
Technique for Determining Mask Patterns and Write Patterns
Patent: 8,028,252 →
Application: 12/207,904 →
Publication: US 2009/0075183
System for Determining Repetitive Work Units
Patent: 8,214,775 →
Application: 12/207,962 →
Publication: US 2009/0077527
Photo-Mask and Wafer Image Reconstruction
Patent: 8,644,588 →
Application: 12/440,722 →
Publication: US 2010/0135568
Photo-Mask and Wafer Image Reconstruction
Patent: 8,208,712 →
Application: 12/475,331 →
Publication: US 2010/0021824
Photo-Mask and Wafer Image Reconstruction
Patent: 8,260,032 →
Application: 12/475,338 →
Publication: US 2010/0021042
Photo-Mask and Wafer Image Reconstruction
Patent: 8,331,645 →
Application: 12/475,349 →
Publication: US 2010/0119143
Photo-Mask and Wafer Image Reconstruction
Patent: 8,204,295 →
Application: 12/475,354 →
Publication: US 2010/0021043
Photo-Mask and Wafer Image Reconstruction
Patent: 8,280,146 →
Application: 12/475,361 →
Publication: US 2010/0086195
Photo-Mask and Wafer Image Reconstruction
Patent: 8,200,002 →
Application: 12/475,369 →
Publication: US 2010/0080443
Extending the Field of View of a Mask-Inspection Image
Patent: 8,463,016 →
Application: 12/701,420 →
Publication: US 2011/0194752
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
Patent: 7,984,391 →
Application: 12/794,597 →
Publication: US 2010/0251203
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
Patent: 7,992,109 →
Application: 12/794,614 →
Publication: US 2010/0275176
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
Patent: 8,056,021 →
Application: 12/794,626 →
Publication: US 2010/0275175
Photo-Mask Acceptance Technique
Patent: 8,458,622 →
Application: 12/955,569 →
Publication: US 2012/0134542
Virtual Photo-Mask Critical-Dimension Measurement
Patent: 8,386,968 →
Application: 12/955,617 →
Publication: US 2012/0137260
Technique for Analyzing a Reflective Photo-Mask
Patent: 8,555,214 →
Application: 13/021,591 →
Publication: US 2012/0066652
Technique for Repairing a Reflective Photo-Mask
Patent: 8,612,903 →
Application: 13/024,233 →
Publication: US 2012/0066651
Electron-Beam Image Reconstruction
Patent: 8,653,454 →
Application: 13/182,219 →
Publication: US 2013/0015350
Technique for Repairing a Reflective Photo-Mask
Patent: 9,005,852 →
Application: 13/764,517 →
Publication: US 2014/0072903
Multistage Extreme Ultra-Violet Mask Qualification
Patent: 9,091,935 →
Application: 13/794,330 →
Publication: US 2014/0254913
Technique for Repairing an EUV Photo-Mask
Patent: 9,494,854 →
Application: 13/830,217 →
Publication: US 2014/0272676
Film-Growth Model Using Level Sets
Patent: 9,547,233 →
Application: 13/830,327 →
Publication: US 2014/0278231
Related Assignments (23)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Nov 14, 2005
From: ABRAMS, DANIEL S.; PENG, DANPING
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 017011/0505 →
Assignment of Assignor's Interest Dec 2, 2005
From: ABRAMS, DANIEL S.; PENG, DANPING; OSHER, STANLEY
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 017316/0051 →
Assignment of Assignor's Interest May 3, 2006
From: ABRAMS, DANIEL S.; PENG, DANPING; OSHER, STANLEY
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 017569/0224 →
Assignment of Assignor's Interest May 22, 2007
From: ABRAMS, DANIEL S.; PENG, DANPING; OSHER, STANLEY
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 019328/0815 →
Assignment of Assignor's Interest Jun 26, 2007
From: ABRAMS, DANIEL S.; PENG, DANPING; OSHER, STANLEY
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 019481/0543 →
Assignment of Assignor's Interest Jul 10, 2007
From: ABRAMS, DANIEL S.; PENG, DANPING; OSHER, STANLEY
To: LUMINESCENT TECHNOLOGIES INC.
Reel/Frame 019539/0433 →
Assignment of Assignor's Interest Jan 17, 2008
From: PENG, DANPING
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 020377/0084 →
Assignment of Assignor's Interest Nov 25, 2008
From: GERGOV, JORDAN; BAISUCK, ALLEN
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 021889/0566 →
Security Agreement Nov 26, 2008
From: LUMINESCENT TECHNOLOGIES, INC.
To: SILICON VALLEY BANK
Reel/Frame 021890/0481 →
Assignment of Assignor's Interest Dec 3, 2008
From: CECIL, THOMAS C.
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 021920/0461 →
Assignment of Assignor's Interest Dec 3, 2008
From: ABRAMS, DANIEL S.; LIN, TIMOTHY
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 021920/0550 →
Assignment of Assignor's Interest Dec 3, 2008
From: ABRAMS, DANIEL S.; LIN, TIMOTHY
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 021920/0605 →
Assignment of Assignor's Interest Dec 8, 2008
From: ABRAMS, DANIEL S.; PENG, DANPING; OSHER, STANLEY
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 021937/0988 →
Security Interest Feb 6, 2009
From: LUMINESCENT TECHNOLOGIES, INC.
To: VENTURE LENDING & LEASING IV, INC.
Reel/Frame 022248/0437 →
Release of Security Interest Aug 31, 2009
From: VENTURE LENDING & LEASING IV, INC.
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 023163/0631 →
Assignment of Assignor's Interest Oct 6, 2009
From: PREIL, MOSHE E.; HEGYI, ALEX N.; ABRAMS, DANIEL S.
To: LUMINESCENT TECHNOLOGIES INC.
Reel/Frame 023334/0073 →
Assignment of Assignor's Interest Oct 6, 2009
From: PREIL, MOSHE E.; HEGYI, ALEX N.; ABRAMS, DANIEL S.
To: LUMINESCENT TECHNOLOGIES INC.
Reel/Frame 023334/0110 →
Assignment of Assignor's Interest Dec 1, 2009
From: ABRAMS, DANIEL S.; PENG, DANPING; OSHER, STANLEY
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 023587/0690 →
Assignment of Assignor's Interest Dec 8, 2009
From: ABRAMS, DANIEL S.; PENG, DANPING; OSHER, STANLEY
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 023618/0192 →
Security Agreement Dec 8, 2009
From: LUMINESCENT TECHNOLOGIES, INC.
To: SILICON VALLEY BANK
Reel/Frame 023617/0658 →
Assignment of Assignor's Interest Dec 8, 2009
From: ABRAMS, DANIEL S.; PENG, DANPING; OSHER, STANLEY
To: LUMINESCENT TECHNOLOGIES, INC.
Reel/Frame 023607/0954 →
Assignment of Assignor's Interest Feb 5, 2010
From: PREIL, MOSHE E.; HEGYI, ALEX N.; ABRAMS, DANIEL S.
To: LUMINESCENT TECHNOLOGIES INC.
Reel/Frame 023911/0689 →
Assignment of Assignor's Interest Oct 13, 2021
From: DINO TECHNOLOGY ACQUISITION LLC
To: KLA CORPORATION
Reel/Frame 057778/0472 →