IP Library Assignment 037392/0561
Patent Assignment
Reel/Frame 037392/0561

Release of Security Interest

Recorded: 2015-12-31 Pages: 5
Assignor
Assignee
MEMC KOREA COMPANY
854, MANGHYANG-RO, SEONGGEO-EUP, SEOBUK-GU, CHEONAN-SI, CHUNGCHEONGNAM-DO, 331-831, KOREA, REPUBLIC OF
Covered Property (1)
Polishing Slurry Composition and Method of Using the Same
Patent: 7,601,273 →
Application: 11/367,406 →
Publication: US 2006/0196850
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Release of Security Interest Dec 26, 2013
From: BANK OF AMERICA, N.A.
To: ENFLEX CORPORATION; SUN EDISON LLC; SOLAICX; SUNEDISON, INC. (F/K/A MEMC ELECTRONIC MATERIALS, INC.)
Reel/Frame 031870/0031 →
Security Interest May 27, 2014
From: MEMC KOREA COMPANY
To: GOLDMAN SACHS BANK USA, AS ADMINISTRATIVE AGENT
Reel/Frame 033032/0169 →
Corrective Assignment to Correct the Name of the Second Receiving Party Previously Recorded on Reel 017651 Frame 0878. Assignor(S) Hereby Confirms the Assignment Sep 24, 2014
From: ROH, HYUN SOO; PARK, TAE WON; LEE, TAE YOUNG; LEE, IN KYUNG
To: CHEIL INDUSTRIES, INC.; MEMC KOREA COMPANY
Reel/Frame 033812/0477 →