IP Library Assignment 051320/0051
Patent Assignment
Reel/Frame 051320/0051

Assignment of Assignor's Interest

Recorded: 2019-12-18 Pages: 8
Assignors
DIAO, LI
Executed: 2014-11-20
GILBERT, DAVID
Executed: 2014-11-14
LEE, CHAN-YUN
Executed: 2014-11-20
ELLISTON, ROBERT GEORGE
Executed: 2014-12-03
PARIS, JAMES
Executed: 2014-11-24
PHANVU, HAIAU
Executed: 2014-12-03
VANIAPURA, VIJAY MATTHEW
Executed: 2014-12-03
TILLERY, TOM
Executed: 2014-11-30
Assignee
MATTSON TECHNOLOGY, INC.
47131 BAYSIDE PARKWAY, FREMONT, CALIFORNIA, 94538
Covered Property (1)
Method for High Aspect Ratio Photoresist Removal in Pure Reducing Plasma
Application: 16/587,439 →
Publication: US 2020/0098576
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 18, 2019
From: MATTSON TECHNOLOGY, INC.
To: MATTSON TECHNOLOGY, INC.; BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
Reel/Frame 051320/0151 →
Security Interest Oct 19, 2020
From: MATTSON TECHNOLOGY, INC.
To: EAST WEST BANK
Reel/Frame 054100/0167 →
Release of Security Interest Apr 15, 2021
From: EAST WEST BANK
To: MATTSON TECHNOLOGY, INC.
Reel/Frame 055950/0452 →