IP Library › Granted Patent US 6,562,700
Granted Patent Utility
US 6,562,700 · Confirmation No. 4220

PROCESS FOR REMOVAL OF RESIST MASK OVER LOW K CARBON-DOPED SILICON OXIDE DIELECTRIC MATERIAL OF AN INTEGRATED CIRCUIT STRUCTURE, AND REMOVAL OF RESIDUES FROM VIA ETCH AND RESIST MASK REMOVAL

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 Code Description Pages PDF
2001-05-31 TRNA Transmittal of New Application 2 View
2001-05-31 SPEC Specification 12 View
2001-05-31 CLM Claims 4 View
2001-05-31 ABST Abstract 1 View
2001-05-31 DRW Drawings-only black and white line drawings 1 View
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Quick Facts
Patent No.
US 6,562,700
App. No.
09/873,043
Filed
2001-05-31
Granted
2003-05-13
Art Unit
2823
PTA
0 days