IP Library › Granted Patent US 6,707,562
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US 6,707,562 · Confirmation No. 2053

METHOD OF USING SCATTEROMETRY MEASUREMENTS TO CONTROL PHOTORESIST ETCH PROCESS

Inventor: Kevin R. Lensing
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2003-10-28 1449 List of References cited by applicant and considered by examiner 1 View
2003-10-28 IIFW Issue Information including classification, examiner, name, claim, renumbering, etc. 1 View
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2003-09-17 A.NE Response After Final Action 1 View
2003-09-17 REM Applicant Arguments/Remarks Made in an Amendment 1 View
2003-09-17 DIST Terminal Disclaimer Filed 1 View
2003-07-14 CTFR Final Rejection 8 View
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2003-04-28 IDS Information Disclosure Statement (IDS) Form (SB08) 3 View
2003-03-24 CTNF Non-Final Rejection 6 View
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2003-01-27 REM Applicant Arguments/Remarks Made in an Amendment 2 View
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2002-11-18 CTNF Non-Final Rejection 9 View
2002-11-18 892 List of references cited by examiner 1 View
2002-11-18 1449 List of References cited by applicant and considered by examiner 3 View
2002-11-14 SRNT Examiner's search strategy and results 4 View
2002-07-22 IDS Information Disclosure Statement (IDS) Form (SB08) 2 View
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2001-07-02 SPEC Specification 18 View
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2001-07-02 OATH Oath or Declaration filed 3 View
2001-07-02 IIFW Issue Information including classification, examiner, name, claim, renumbering, etc. 1 View
2001-07-02 SRFW Search information including classification, databases and other search related notes 1 View
2001-07-02 FWCLM Index of Claims 1 View
2001-07-02 TRNA Transmittal of New Application 3 View
2001-07-02 DRW Drawings-only black and white line drawings 3 View
2001-07-02 SPEC Specification 18 View
2001-07-02 CLM Claims 20 View
2001-07-02 ABST Abstract 1 View
2001-07-02 OATH Oath or Declaration filed 3 View
2001-07-02 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
Patent No.
US 6,707,562
App. No.
09/897,205
Filed
2001-07-02
Granted
2004-03-16
Art Unit
2876
PTA
-91 days