IP Library Granted Patent US 6,821,908
Granted Patent Utility
US 6,821,908 · Confirmation No. 3375

IN-SITU METHOD FOR PRODUCING A HYDROGEN TERMINATED HYDROPHOBIC SURFACE ON A SILICON WAFER

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Quick Facts
Patent No.
US 6,821,908
App. No.
09/952,050
Filed
2001-09-10
Granted
2004-11-23
Examiner
VINH, LAN
Art Unit
1765
PTA
-65 days