IP Library › Granted Patent US 6,761,770
Granted Patent Utility
US 6,761,770 · Confirmation No. 6163

ATMOSPHERIC PRESSURE WAFER PROCESSING REACTOR HAVING AN INTERNAL PRESSURE CONTROL SYSTEM AND METHOD

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2016-07-05 OATH Oath or Declaration filed 21 View
2003-10-31 IFEE Issue Fee Payment (PTO-85B) 3 View
2003-10-31 OATH Oath or Declaration filed 1 View
2002-08-23 TRNA Transmittal of New Application 1 View
2002-08-23 SPEC Specification 26 View
2002-08-23 CLM Claims 10 View
2002-08-23 ABST Abstract 1 View
2002-08-23 DRW Drawings-only black and white line drawings 13 View
2002-08-23 OATH Oath or Declaration filed 3 View
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Quick Facts
Patent No.
US 6,761,770
App. No.
10/226,773
Filed
2002-08-23
Granted
2004-07-13
Pub. No.
US20030094136A1
Art Unit
1763
PTA
-2 days