Porogen material
A porogen material for forming a dielectric porous film. The porogen material may include a silicon based dielectric precursor and a silicon containing porogen. The porous film may have a substantially uniform dielectric constant value throughout. Methods of forming the porous film as well as semiconductor devices employing circuit features isolated by the porous film are also present.
1. A porogen material comprising:
a silicon containing porogen and
a silicon based dielectric precursor,
wherein said silicon containing porogen and said silicon based dielectric precursor are chemically bonded to one another.
2. The porogen material of claim 1 wherein the silicon containing porogen is a carboxylate including a side chain selected from a group consisting of an alkyl, a fluoroalkyl, a perfluoroalkyl, a cycloalkyl, an aryl, a fluoroaryl, a vinyl, and an allyl.
3. The porogen material of claim 1 wherein the silicon based dielectric precursor is a cyclic siloxane selected from the group consisting of tetramethylcyclotetrasiloxane, hexamethyl cyclotetrasiloxane, and octamethylcyclotetrasiloxane.
4. The porogen material of claim 1 wherein the silicon containing porogen includes a thermally cleavable organic group.
5. The porogen material of claim 4 wherein the thermally cleavable organic group is one of a tertiary butyl group and tertiary amyl group and the porogen material has been transformed into a porous film by thermal cleavage and removal of the thermally cleavable organic group therefrom.
6. The porogen material of claim 1 wherein the silicon based dielectric precursor is a cyclic siloxane.
7. The porogen material of claim 1 which has been formed by chemical vapor deposition of the porogen and the dielectric precursor.
8. A porogen material comprising:
a silicon containing porogen and
a cyclic siloxane precursor.
9. The porogen material of claim 8 wherein the silicon containing porogen is a carboxylate including a side chain selected from a group consisting of an alkyl, a fluoroalkyl, a perfluoroalkyl, a cycloalkyl, an aryl, a fluoroaryl, a vinyl, and an allyl.
10. The porogen material of claim 8 wherein the cyclic siloxane is selected from the group consisting of tetramethylcyclotetrasiloxane, hexamethyl cyclotetrasiloxane, and octamethylcyclotetrasiloxane.
11. A porogen material comprising:
(a) a cyclic siloxane selected from the group consisting of tetramethylcyclotetrasiloxane, hexamethyl cyclotetrasiloxane, and octamethylcyclotetrasiloxane; and
(b) a silicon containing porogen chemically bonded to the cyclic siloxane,
wherein said silicon containing porogen includes a thermally cleavable organic group adapted to form a pore in the material when thermally cleaved, and
wherein said silicon containing porogen is selected from among:
(i) silicon carboxylate compounds comprising a side chain selected from among alkyl, fluoroalkyl, perifluoroalkyl, cycloalkyl, aryl, fluoroaryl, vinyl, and allyl; and
(ii) silicon compounds including a tertiary alkyl side chain selected from among t-butyl and amyl.