Epitaxial growth method and substrate for epitaxial growth
View Patent ↗An epitaxial growth method includes: supporting a substrate for growth (for example, an InP substrate) with a substrate supporter, growing a compound semiconductor layer comprising 3 or 4 elements (for example, a III-V group compound semiconductor such as an InGaAs layer, AlGaAs layer, AlInAs layer and AlInGaAs layer) on the substrate for growth by metal organic chemical vapor deposition, polishing the substrate so that an angle of gradient is 0.00° to 0.03° or 0.04° to 0.24° with respect to (100) direction in the entire effective area of the substrate, and forming the compound semiconductor layer to be 0.5 μm thick or more on the substrate by using the substrate for growth.
1. An epitaxial growth method comprising: supporting a substrate for growth with a substrate supporter, forming a III-V compound semiconductor layer comprising 3 or 4 elements on the substrate for growth by metal organic chemical vapor deposition, polishing the substrate so that an angle of gradient is not in the range from above 0.03° to below 0.04° with respect to (100) direction in an entire effective area of the substrate, and forming the compound semiconductor layer to be 0.5 μm thick or more on the substrate by using the substrate for growth,
wherein the 3 or 4 elements are selected from the group consisting of AlGaAs, AlInAs, AlInGaAs and combinations thereof, and
wherein the dislocation density of the substrate is 5000 cm −2 or less.
2. The epitaxial growth method as claimed in claim 1 , further comprising: forming a buffer layer on the substrate for growth, and forming the compound semiconductor layer on the buffer layer.
3. The epitaxial growth method as claimed in claim 2 , wherein the compound semiconductor layer comprises AlInAs.
4. The epitaxial growth method as claimed in claim 3 , wherein the substrate for growth is a semiconductor crystal substrate having dislocation density of 5000 cm −2 or less.
5. The epitaxial growth method as claimed in claim 4 , wherein the substrate for growth is an InP substrate.
6. The epitaxial growth method as claimed in claim 2 , wherein the substrate for growth is a semiconductor crystal substrate having a dislocation density of 5000 cm −2 or less.
7. The epitaxial growth method as claimed in claim 6 , wherein the substrate for growth is an InP substrate.
8. The epitaxial growth method as claimed in claim 1 , wherein the compound semiconductor layer comprises AlInAs.
9. The epitaxial growth method as claimed in claim 8 , wherein the substrate for growth is a semiconductor crystal substrate having dislocation density of 5000 cm −2 or less.
10. The epitaxial growth method as claimed in claim 9 , wherein the substrate for growth is an InP substrate.
11. The epitaxial growth method as claimed in claim 1 , wherein the substrate for growth is a semiconductor crystal substrate having a dislocation density of 5000 cm −2 or less.
12. The epitaxial growth method as claimed in claim 11 , wherein the substrate for growth is an InP substrate.
13. A substrate for epitaxial growth used for an epitaxial growth method in which a compound semiconductor layer comprising 3 or 4 elements is formed on the substrate for growth by metal organic chemical vapor deposition, wherein an angle of gradient is not in the range from above 0.03° to below 0.04° with respect to (100) direction in an entire effective area of the substrate.
14. The substrate for epitaxial growth as claimed in claim 13 , wherein the substrate is a semiconductor crystal substrate having dislocation density of 5000 cm −2 or less.
15. The substrate for epitaxial growth as claimed in claim 14 , wherein the substrate is an InP substrate.
16. The substrate for epitaxial growth as claimed in claim 13 , wherein the substrate is an InP substrate.