Probe station with low noise characteristics
View Patent ↗A cable includes an inner conductor, an inner dielectric, and a guard conductor, where the inner dielectric is between the inner conductor and the guard conductor. The cable also includes an outer dielectric, and a shield conductor, where the outer dielectric is between the guard conductor and the shield conductor. The cable further includes an additional layer of material between the outer dielectric and the shield conductor of suitable composition for reducing triboelectric current generation between the outer dielectric and the shield conductor to less than that which would occur were the outer dielectric and the shield conductor to directly adjoin each other.
1. A probe station for probing a device under test comprising:
(a) a support for holding said device under test;
(b) a probing device for testing said device under test while being supported by said support;
(c) a cable connecting said probing device to a test instrument, said cable including:
(i) a first conductor, a first dielectric, and a second conductor, where said first dielectric is between said first conductor and said second conductor;
(ii) a second dielectric, and a third conductor, where said second dielectric is between said second conductor and said third conductor;
(iii) further including a first layer of material between said second dielectric and said third conductor of suitable composition for reducing triboelectric current generation between said second dielectric and said third conductor to less than that which would occur were said second dielectric and said third conductor to directly adjoin each other.
2. The probe station of claim 1 further comprising a second layer of material between said first dielectric and said second conductor of suitable composition for reducing triboelectric current generation between said first dielectric and said second conductor to less than that which would occur were said first dielectric and said second conductor to directly adjoin each other.
3. A probe station for probing a device under test comprising:
(a) a support for holding said device under test;
(b) a probing device for testing said device under test while being supported by said support;
(c) a cable connecting said probing device to a test instrument, said cable including:
(i) a first conductor, a first dielectric, and a second conductor, where said first dielectric is between said first conductor and said second conductor;
(ii) a second dielectric, and a third conductor, where said second dielectric is between said second conductor and said third conductor;
(iii) further including a first layer of material between said second dielectric and said second conductor of suitable composition for reducing triboelectric current generation between said second dielectric and said second conductor to less than that which would occur were said second dielectric and said second conductor to directly adjoin each other.
4. The probe station of claim 3 further comprising a second layer of material between said first dielectric and said second conductor of suitable composition for reducing triboelectric current generation between said first dielectric and said second conductor to less than that which would occur were said first dielectric and said second conductor to directly adjoin each other.
5. A probe station for probing a device under test comprising:
(a) a support for holding said device under test;
(b) a probing device for testing said device under test while being supported by said support;
(c) a cable connecting said probing device to a test instrument, said cable including:
(i) a first conductor, a first dielectric, and a second conductor, where said first dielectric is between said first conductor and said second conductor;
(ii) a second dielectric, and a third conductor, where said second dielectric is between said second conductor and said third conductor;
(iii) further including a first layer of material between said first dielectric and said first conductor of suitable composition for reducing triboelectric current generation between said first dielectric and said first conductor to less than that which would occur were said first dielectric and said first conductor to directly adjoin each other.
6. The probe station of claim 5 further comprising a second layer of material between said first dielectric and said second conductor of suitable composition for reducing triboelectric current generation between said first dielectric and said second conductor to less than that which would occur were said first dielectric and said second conductor to directly adjoin each other.
7. A cable comprising
(a) a first conductor, a first dielectric, and a second conductor, where said first dielectric is between said first conductor and said second conductor;
(b) a second dielectric, and a third conductor, where said second dielectric is between said second conductor and said third conductor;
(c) further including a first layer of material between said second dielectric and said third conductor of suitable composition for reducing triboelectric current generation between said second dielectric and said third conductor to less than that which would occur were said second dielectric and said third conductor to directly adjoin each other.
8. The cable of claim 7 further comprising a second layer of material between said first dielectric and said second conductor of suitable composition for reducing triboelectric current generation between said first dielectric and said second conductor to less than that which would occur were said first dielectric and said second conductor to directly adjoin each other.
9. A cable comprising:
(a) a first conductor, a first dielectric; and a second conductor, where said first dielectric is between said first conductor and said second conductor;
(b) a second dielectric, and a third conductor, where said second dielectric is between said second conductor and said third conductor,
(c) further including a first layer of material between said second dielectric and said second conductor of suitable composition for reducing triboelectric current generation between said second dielectric and said second conductor to less than that which would occur were said second dielectric and said second conductor to directly adjoin each other.
10. The cable of claim 9 further comprising a second layer of material between said first dielectric and said second conductor of suitable composition for reducing triboelectric current generation between said first dielectric and said second conductor to less than that which would occur were said first dielectric and said second conductor to directly adjoin each other.
11. A cable comprising:
(a) a first conductor, a first dielectric, and a second conductor, where said first dielectric is between said first conductor and said second conductor;
(b) a second dielectric, and a third conductor, where said second dielectric is between said second conductor and said third conductor;
(c) further including a first layer of material between said first dielectric and said first conductor of suitable composition for reducing triboelectric current generation between said first dielectric and said first conductor to less than that which would occur were said first dielectric and said first conductor to directly adjoin each other.
12. The probe station of claim 11 further comprising a second layer of material between said first dielectric and said second conductor of suitable composition for reducing triboelectric current generation between said first dielectric and said second conductor to less than that which would occur were said first dielectric and said second conductor to directly adjoin each other.