Granted Patent B2

US 7,122,437 · App. 10/741,203 · Granted Oct 17, 2006

Abstract

Claims (98)

1. A method of forming a bottle-shaped deep trench structure, said method comprising:

forming a deep trench in a semiconductor substrate;

depositing a polysilicon liner layer along a bottom and sidewalls of said deep trench;

depositing another liner layer atop said polysilicon liner layer;

covering a portion of said another liner layer that lines a lower region of said deep trench with a resist material so that a remaining portion of said another liner layer that lines an upper region of said deep trench is exposed;

removing said exposed remaining portion of said another liner layer to expose an underlying portion of said polysilicon liner layer;

removing said resist material to expose a lower portion of said another liner layer lining said lower region of said deep trench;

forming a further layer from said exposed underlying portion of said polysilicon liner layer;

removing said lower portion of said another liner layer and said underlying portion of said polysilicon liner layer using said further layer as a mask so that said sidewalls and said bottom at said lower region of said deep trench are exposed; and

etching said sidewalls and said bottom at said lower region of said deep trench so that said deep trench has a bottle shape.

2. The method of claim 1 wherein said step of covering with a resist material comprises:

filling said deep trench with said resist material; and

removing said resist material from said upper region of said deep trench.

3. The method of claim 1 wherein said another liner layer is one of an oxide liner layer and a nitride liner layer, and said further layer is an oxide when said another liner layer is said nitride liner layer and said further layer is a nitride when said another liner layer is said oxide liner layer.

4. The method of claim 1 further comprising:

depositing an underlying nitride liner layer prior to depositing said polysilicon liner layer; and

removing a lower portion of said underlying nitride liner layer after removing said lower portion of said another liner layer and said underlying portion of said polysilicon liner layer.

5. The method of claim 3 further comprising:

growing an oxide liner layer and then forming a nitride liner layer; and

removing a lower portion of said oxide liner layer after removing a lower portion of said nitride liner layer.

6. A method of forming a deep trench structure, said method comprising:

forming a deep trench in a semiconductor substrate;

depositing a polysilicon liner layer along a bottom and sidewalls of said deep trench;

depositing another liner layer atop said polysilicon liner layer;

covering a portion of said another liner layer that lines a lower region of said deep trench with a resist material so that a remaining portion of said another liner layer that lines an upper region of said deep trench is exposed;

removing said exposed remaining portion of said another liner layer to expose an underlying portion of said polysilicon liner layer;

removing said resist material to expose a lower portion of said another liner layer;

forming a further layer from said exposed underlying portion of said polysilicon liner layer;

removing said lower portion of said another liner layer and said underlying portion of said polysilicon liner layer using said further layer as a mask so that said sidewalls and said bottom at said lower region of said deep trench are exposed;

etching said sidewalls and said bottom of said lower region of said deep trench so that said deep trench has a bottle shape;

forming an oxide on said bottom and sidewalls of said lower region of said deep trench;

depositing a further polysilicon liner layer atop said at least one insulator layer of said upper region and atop said oxide of said lower region;

depositing another further liner layer atop said polysilicon liner layer;

covering a portion of said another further liner layer that lines a lower part and bottom of said lower region with a further resist material so that a remaining portion of said another further liner layer that lines an upper part of said lower region and said upper region is exposed;

removing said exposed remaining portion of said another further liner layer to expose an underlying portion of said further polysilicon liner layer;

removing said further resist material to expose said lower part of said lower portion of said another further liner layer;

forming a still further layer from said exposed portion of said further polysilicon liner layer;

removing said exposed portion of said another further liner layer and an underlying portion of said further polysilicon liner layer using said still further layer as a mask so that a portion of said oxide that covers said sidewalls and said bottom of said lower part of said lower region of said deep trench is exposed;

etching said exposed portion of said oxide so that a remaining portion that covers said upper part of said lower region forms an oxide collar;

covering a bottom and sidewalls of at least said lower part of said lower portion of said deep trench with a hemispherical grain (HSG) polysilicon layer; and

doping said hemispherical grain (HSG) polysilicon layer and a portion of said semiconductor substrate that surrounds said lower part of said lower portion of said deep trench, said nitride liner layer preventing dopants from entering a further portion of said semiconductor substrate that surrounds said upper region and that surrounds said upper part of said lower region of said deep trench.

7. The method of claim 6 wherein said another liner layer and said further another liner layer are one of an oxide liner layer and a nitride liner layer, and said further layer and said still further layer are an oxide when said another liner layer and said further another liner layer are a nitride and said further layer and said still further layer are a nitride when said another liner layer and said further another liner layer are an oxide.

8. The method of claim 6 wherein said step of covering with a resist material comprises:

filling said deep trench with said resist material; and

removing said resist material from said upper region of said deep trench.

9. The method of claim 6 further comprising:

depositing an underlying nitride liner layer prior to depositing said polysilicon liner layer; and

removing a lower portion of said underlying nitride liner layer after removing said lower portion of said another liner layer and said underlying portion of said polysilicon liner layer.

10. The method of claim 9 further comprising:

growing an underlying oxide liner layer prior to depositing said underlying nitride liner layer; and

removing a lower portion of said underlying oxide liner layer after removing said lower portion of said underlying nitride liner layer.

11. The method of claim 6 wherein said step of covering with a further resist material comprises:

filling said deep trench with said further resist material; and

removing said further resist material from said upper portion of said deep trench and from said upper part of said lower region of said deep trench.

12. The method of claim 6 wherein said step of forming an oxide comprises is selected from the group consisting of growing said oxide on said bottom and sidewalls of said lower region; and depositing said oxide on said bottom and sidewalls of said upper and lower regions and removing said oxide from said sidewalls of said upper region.

13. The method of claim 6 further comprising:

depositing an underlying further nitride liner layer prior to depositing said further polysilicon liner layer; and

removing a portion of said underlying further nitride liner layer after removing said exposed portion of said another further liner layer and said underlying portion of said further polysilicon liner layer.

14. The method of claim 6 further comprising: removing said at least one insulator layer from said upper portion of said deep trench prior to depositing said further polysilicon liner layer.

15. The method of claim 6 wherein said hemispherical grain (HSG) polysilicon layer further lines at least a portion of said upper part of said lower region.

16. The method of claim 6 wherein said step of covering with a hemispherical grain (HSG) polysilicon layer comprises:

depositing said hemispherical grain (HSG) polysilicon layer atop a bottom and sidewalls of said upper and lower portions of said deep trench; and

removing said hemispherical grain (HSG) polysilicon layer from said upper portion of said deep trench and from at least a portion of said upper part of said lower region of said deep trench.

17. The method of claim 6 wherein said doping step comprises a gas phase doping step.

18. The method of claim 6 further comprising: depositing a dielectric layer that covers at least said hemispherical grain (HSG) polysilicon layer.

19. The method of claim 18 further comprising: depositing a doped polysilicon

material that fills said upper region and said lower region.

20. A method of forming an oxide collar in a deep trench structure, said method comprising:

forming a deep trench in a semiconductor substrate;

depositing a polysilicon liner layer along a bottom and sidewalls of said deep trench;

depositing another liner layer atop said polysilicon liner layer;

covering a portion of said another liner layer that lines a lower region of said deep trench with a resist material so that a remaining portion of said another liner layer that lines an upper region of said deep trench is exposed;

removing said exposed remaining portion of said another liner layer to expose an underlying portion of said polysilicon liner layer;

removing said resist material to expose a lower portion of said another liner layer;

forming a further layer from said exposed underlying portion of said polysilicon liner layer;

removing said lower portion of said another liner layer and said underlying portion of said polysilicon liner layer using said further layer as a mask so that said sidewalls and said bottom at said lower region of said deep trench are exposed;

depositing an additional liner layer atop said further layer and atop said sidewalls and said bottom of said lower region;

covering a portion of said additional liner layer that lines a lower part and a bottom of said lower region with a further resist material so that a remaining portion of said additional liner layer that lines an upper part of said lower region of said deep trench and that lines said further layer is exposed;

removing said exposed remaining portion of said additional liner layer to expose sidewalls of said upper part of said lower region of said deep trench;

removing said further resist material;

etching said sidewalls of said upper part of said lower region of said deep trench; and

growing an oxide on said sidewalls of said upper part of said lower region of said deep trench to form said oxide collar.

21. The method of claim 20 wherein said further layer is an oxide and said another liner layer is a nitride liner layer.

22. The method of claim 20 wherein said step of covering with a resist material comprises:

filling said deep trench with said resist material; and

removing said resist material from said upper region of said deep trench.

23. The method of claim 20 wherein said step of covering with a further resist material comprises:

filling said deep trench with said further resist layer; and

removing said further resist layer from said upper portion of said deep trench and from said upper part of said lower region of said deep trench.

24. The method of claim 20 further comprising:

depositing an underlying nitride liner layer prior to depositing said polysilicon liner layer; and

removing a lower portion of said underlying nitride liner layer after removing said lower portion of said another liner layer and said underlying portion of said polysilicon liner layer.

25. The method of claim 24 further comprising:

growing an underlying oxide liner layer prior to depositing said underlying nitride liner layer; and

removing an upper part of said lower portion of said underlying oxide liner layer after removing said exposed portion of said additional liner layer.

26. The method of claim 24 further comprising:

removing at least said additional liner layer to expose sidewalls of said lower part of said lower region of said deep trench; and

etching said sidewalls of said lower part of said lower region of said deep trench so that said deep trench has a bottle shape.

Assignments (10)