IP Library Granted Patent US 7,205,589
Granted Patent B2
US 7,205,589 · App. 10/864,092 · Granted Apr 17, 2007

Semiconductor devices fabricated with different processing options

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Quick Facts
Patent No.
US 7,205,589
App. No.
10/864,092
Granted
Apr 17, 2007
Kind
B2
Abstract

A semiconductor device that provides identical functionality and timing characteristics, fabricated with two fabricating options comprised of: a user configurable high cost fabricating option utilizing a set of masking patterns and a process sequence; and a mask programmable lower cost fabricating option utilizing a reduced set of said masking patterns and reduced steps of said process sequence, wherein at least one mask is customized and a plurality of masks are identical.

Claims (43)

1. A programmable semiconductor device that provides identical functionality and timing characteristics, fabricated with two different fabricating options comprising:

a first fabricating option utilizing a first set of masking patterns and a first process sequence; and

a second fabricating option utilizing a second set of masking patterns and a second process sequence;

wherein, a plurality of masking patterns are identical between said first and second sets of masking patterns; and

wherein, said second set of masking patterns comprises less masking patterns compared to said first set of masking patterns to reduce the device cost.

2. The device of claim 1 , wherein said second process sequence comprises a logic process sequence and said second set of masking patterns comprises at least one custom mask to construct a specific device with predefined functionality and timing.

3. The device of claim 2 , wherein said at least one custom mask provide wire connections coupled to a power bus or a ground bus to hard-wire a memory pattern.

4. The device of claim 1 , wherein said first process sequence comprises a configuration memory process sequence inserted into a logic process sequence to construct a generic device that allows a user to customize functionality or timing by configuring the memory elements constructed by said configuration memory process sequence.

5. The device of claim 4 , wherein the configuration memory element is selected from one of electrical-fuse links, laser-fuse links, antifuse capacitors, SRAM cells, DRAM cells, metal optional links, EPROM cells, ERPROM cells, Flash cells, Carbon nano-tubes, Electro-Chemical cells, Electro-Mechanical cells, Optical cells, Electro-Magnetic cells and Ferro-Electric cells.

6. The device of claim 1 , wherein both of said first and second fabricating options comprise a common module layer comprising transistors for digital circuits, fabricated with an identical sub-set of masking patterns and an identical process subsequence.

7. The device of claim 1 , wherein both of said first and second fabricating options comprise a common module layer comprising intercoonect to connect digital circuits, fabricated with an identical sub-set of masking patterns and an identical process subsequence.

8. The device of claim 1 , wherein both of said first and second fabricating options comprise a memory module layer that differs between said first and second fabricating options, said memory module layer further comprising:

a user configurable memory process sequence in the first fabricating option, said configurable memory providing a plurality of memory data sets to change the functionality or timing of the device; and

a hard-wired memory process sequence in the second fabricating option, said hard-wired memory providing a fixed memory data set identical to one of said plurality of user configurable memory data sets in the first fabricating option, wherein the device functionality and timing is substantially unchanged by the fabrication option.

9. A semiconductor device that provides identical functionality and timing characteristics, fabricated with two fabricating options comprised of:

a user configurable fabricating option utilizing a first set of masks and a first process sequence; and

a mask programmable fabricating option utilizing:

a second set of masks, wherein at least one mask is customized and a plurality of masks are identical to said first set of masks, and wherein the second set of masks has less masks compared to said first set of masks; and

a second process sequence, wherein the second process sequence comprises less process steps compared to said first process sequence.

10. The device of claim 9 , wherein the user configurable option forms a programmable logic device (PLD), further comprising:

one or more digital circuits formed on a first module layer;

one or more programmable logic blocks formed on the first module layer and electrically coupled to the digital circuits;

one or more memory blocks formed on the first module layer and electrically coupled to the digital circuits;

one or more configurable memory elements formed on a second module layer and electrically coupled to the programmable logic blocks to customize the programmable content of the PLD; and

one or more interconnect and routing wires formed in a third module layer, electrically coupled to first and second module layers to provide the functionality of the PLD.

11. The device of claim 10 , wherein the second module layer is generic and user configurable to program and re-program to alter the functional response and performance of the PLD.

12. The device of claim 10 , wherein the configurable memory element is selected from one of electrical-fuse links, laser-fuse links, antifuse capacitors, SRAM cells, DRAM cells, metal optional links, EPROM cells, EEPROM cells, Flash cells, Carbon nano-tubes, Electro-Chemical cell, Electro-Mechanical cells, Optical cells, Electro-Magnetic cells and Ferro-Electric cells.

13. The device of claim 10 , wherein the mask programmable option forms an Application Specific Integrated Circuit (ASIC), further comprising:

one or more digital circuits formed on ((a)) first module layer;

one or more programmable logic blocks formed on the first module layer and electrically coupled to the digital circuits;

one or more memory blocks formed on the first module layer and electrically coupled to the digital circuits;

one or more predetermined wire connections formed on ((a)) second module layer and electrically coupled to the programmable logic blocks to customize the programmable content of PLD; and

one or more interconnect and routing wires formed in a third module layer and electrically coupled to first and second module layers.

14. The device of claim 13 , wherein:

the user configurable option further comprises fabricating configuration memory to control logic in one or more programmable logic circuits; and

the predetermined wire connections is formed using a configuration memory data set from the user configurable option and wherein the configuration memory data is used to map substantially identical logic control of said programmable logic circuits.

15. The device of claim 13 , wherein the predetermined wire connections is integrated in the first module layer.

16. The device of claim 13 , wherein the predetermined wire connections is integrated in the third module layer.

17. The device of claim 9 , wherein the user configurable option comprises configuration memory to customize logic, and for every given configuration memory pattern, a unique predetermined wire connection pattern exists in the mask programmable option to substantially match logic customization.

18. The device of claim 9 , further comprising circuit blocks, wherein one or more of the circuit blocks maintain substantially identical timing characteristics under both fabricating options.

19. A programmable semiconductor device, wherein the functionality or timing of a portion of digital circuits fabricated on a semiconductor substrate is determined by digital inputs, said digital inputs fabricated by two different fabricating options, wherein:

a first fabricating option comprises a plurality of masking layers and process steps to fabricate storage elements above the digital circuits that allows a user to configure one storage pattern from a plurality of storage patterns to customize digital inputs; and

a second fabricating option comprises eliminating storage element fabricating masks and processing steps and hard-wiring one or more metal and via masks to customize a specific digital input pattern.

Assignments (6)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 27, 2020
From: INTELLECTUAL VENTURES ASSETS 154 LLC
To: LIBERTY PATENTS LLC
Reel/Frame 051709/0805 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 3, 2020
From: CALLAHAN CELLULAR L.L.C.
To: INTELLECTUAL VENTURES ASSETS 154 LLC
Reel/Frame 051464/0389 →
MERGER Recorded Oct 9, 2015
From: YAKIMISHU CO. LTD., L.L.C.
To: CALLAHAN CELLULAR L.L.C.
Reel/Frame 036829/0821 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 31, 2011
From: TIER LOGIC, INC.
To: YAKIMISHU CO. LTD., LLC
Reel/Frame 026839/0396 →
CHANGE OF NAME Recorded Aug 29, 2011
From: VICICIV TECHNOLOGY, INC.
To: TIER LOGIC, INC.
Reel/Frame 026824/0623 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 6, 2007
From: MADURAWE, RAMINDA U
To: VICICIV TECHNOLOGY, INC.
Reel/Frame 019520/0314 →