Integrated circuit system for bonding

1. An integrated circuit system, comprising:

providing a precursor for an integrated wire bond and flip chip structure, the precursor having a plurality of aluminum contact pads thereon;

depositing a layer of titanium on the precursor;

depositing a layer of nickel-vanadium on the layer of titanium;

depositing a layer of copper on the layer of nickel-vanadium;

forming a mask on at least a portion of the layer of copper;

removing portions of the layers of copper and nickel-vanadium not protected by the mask to expose portions of the layer of titanium; and

etching to remove the exposed portions of the layer of titanium with an etching solution consisting of an etchant, a viscosity modifier, and an oxidizer.

2. The system of claim 1 wherein:

etching further comprises etching with an etchant selected from a group consisting of hydrofluoric acid, ammonium hydroxide, and a combination thereof.

3. The system of claim 1 wherein etching further comprises:

using a viscosity modifier selected from a group consisting of propylene glycol, ethylene glycol, and a combination thereof; and

using an oxidizer selected from a group consisting of hydrogen peroxide, sulfuric acid, and a combination thereof.

4. The system of claim 1 in which etching further comprises forming an etching solution of approximately 0.5-3% hydrofluoric acid, 1-8% hydrogen peroxide, and 50-95.5% propylene glycol.

5. The system of claim 1 wherein:

depositing a layer of titanium further comprises depositing a layer of titanium to a thickness in the range of 300-2000 Å;

depositing a layer of nickel-vanadium further comprises depositing a layer of nickel-vanadium to a thickness in the range of 2000-7000 Å; and

depositing a layer of copper further comprises depositing a layer of copper to a thickness in the range of 3000-15000 Å.

6. An integrated circuit system, comprising:

providing a precursor for an integrated wire bond and flip chip semiconductor structure, the precursor having a passivation layer and a plurality of exposed aluminum contact pads thereon;

depositing a layer of titanium on the precursor;

depositing a layer of nickel-vanadium on the layer of titanium;

depositing a layer of copper on the layer of nickel-vanadium;

forming a photomask on a portion of the layer of copper over one of the contact pads;

etching portions of the layers of copper and nickel-vanadium not protected by the photomask to expose and leave behind corresponding portions of the layer of titanium;

etching and removing the exposed portions of the layer of titanium in the presence of the layers of copper and nickel-vanadium with an etching solution consisting of hydrofluoric acid, a viscosity modifier, and an oxidizer;

removing the photomask; and

solder bumping the layer of copper over the one contact pad.

7. The system of claim 6 wherein etching and removing the exposed portions of the layer of titanium further comprises:

using a viscosity modifier selected from a group consisting of propylene glycol, ethylene glycol, and a combination thereof; and

using an oxidizer selected from a group consisting of hydrogen peroxide, sulfuric acid, and a combination thereof.

8. The system of claim 6 in which etching and removing the exposed portions of the layer of titanium further comprises forming an etching solution of approximately 0.5-3% hydrofluoric acid, 1-8% hydrogen peroxide, and 50-95.5% propylene glycol.

9. The system of claim 6 wherein:

depositing a layer of titanium further comprises depositing a layer of titanium to a thickness in the range of 300-2000 Å, and preferably 800-1200 Å;

depositing a layer of nickel-vanadium further comprises depositing a layer of nickel-vanadium to a thickness in the range of 2000-7000 Å, and preferably 3000-4000 Å; and

depositing a layer of copper further comprises depositing a layer of copper to a thickness in the range of 3000-15000 Å, and preferably 6000-9000 Å.

10. An integrated circuit system, comprising:

a precursor for an integrated wire bond and flip chip structure, the precursor having a plurality of aluminum contact pads thereon;

a layer of titanium on at least a portion of the precursor;

a layer of nickel-vanadium on the layer of titanium;

a layer of copper on the layer of nickel-vanadium; and

at least one of the contact pads being characterized by the effect of an etchant solution consisting of an etchant, a viscosity modifier, and an oxidizer.

11. The system of claim 10 wherein the etchant is an etchant selected from a group consisting of hydrofluoric acid, ammonium hydroxide, and a combination thereof.

12. The system of claim 10 wherein the viscosity modifier is selected from the group consisting of propylene glycol, ethylene glycol, and a combination thereof, and the oxidizer is selected from the group consisting of hydrogen peroxide, sulfuric acid, and a combination thereof.

13. The system of claim 10 in which the etching solution is approximately 0.5-3% hydrofluoric acid, 1-8% hydrogen peroxide, and 50-95.5% propylene glycol.

14. The system of claim 10 wherein the layer of titanium has a thickness in the range of 300-2000 Å, the layer of nickel-vanadium has a thickness in the range of 2000-7000 Å, and the layer of copper has a thickness in the range of 3000-15000 Å.

15. An integrated circuit system, comprising:

a precursor for an integrated wire bond and flip chip semiconductor structure, the precursor having a passivation layer and a plurality of exposed aluminum contact pads thereon;

a layer of titanium on at least a portion of the precursor and over at least a first contact pad;

a layer of nickel-vanadium on the layer of titanium and over at least the first contact pad;

a layer of copper on the layer of nickel-vanadium and over at least the first contact pad;

at least one of the contact pads being characterized by the effect, in the presence of the layers of copper and nickel-vanadium, of an etchant solution consisting of hydrofluoric acid, a viscosity modifier, and an oxidizer; and

a solder bump on the layer of copper over the first contact pad.

16. The system of claim 15 wherein the viscosity modifier is selected from the group consisting of propylene glycol, ethylene glycol, and a combination thereof, and the oxidizer is selected from the group consisting of hydrogen peroxide, sulfuric acid, and a combination thereof.

17. The system of claim 15 in which the etching solution is approximately 0.5-3% hydrofluoric acid, 1-8% hydrogen peroxide, and 50-95.5% propylene glycol.

18. The system of claim 15 wherein:

the layer of titanium has a thickness in the range of 300-2000 Å, and preferably 800-1200 Å;

the layer of nickel-vanadium has a thickness in the range of 2000-7000 Å, and preferably 3000-4000 Å; and

the layer of copper has a thickness in the range of 3000-15000 Å, and preferably 6000-9000 Å.