Photometrically modulated delivery of reagents
View Patent ↗A process system adapted for processing of or with a material therein. The process system includes: a sampling region for the material; an infrared photometric monitor constructed and arranged to transmit infrared radiation through the sampling region and to responsively generate an output signal correlative of the material in the sampling region, based on its interaction with the infrared radiation; and process control means arranged to receive the output of the infrared photometric monitor and to responsively control one or more process conditions in and/or affecting the process system.
1. A system for delivery of a dilute semiconductor manufacturing material, comprising:
an active material source of semiconductor manufacturing material;
a diluent fluid source;
a fluid flow-metering device for dispensing of the semiconductor manufacturing material from the active material source thereof at a predetermined flow rate;
a mixing device arranged to mix active semiconductor manufacturing material from the active material source thereof that is dispensed at said predetermined flow rate by the fluid flow metering device, with diluent fluid to form a diluted active semiconductor manufacturing fluid mixture; and
a monitor arranged to measure concentration of active semiconductor manufacturing material in the diluted active semiconductor manufacturing fluid mixture, and responsively adjust the fluid flow-metering device, to control the dispensing rate of the active semiconductor manufacturing material, and maintain a predetermined concentration of active semiconductor manufacturing material in the diluted active semiconductor manufacturing fluid mixture.
2. The system of claim 1 , further comprising a source for supplying the material in gaseous form.
3. The system of claim 2 , wherein the material comprises a solid.
4. The system of claim 2 , wherein the material comprises a liquid.
5. The system of claim 1 , wherein the material is initially of a non-gaseous form.
6. The system of claim 5 , wherein the initially non-gaseous form material comprises a liquid.
7. The system of claim 5 , wherein the initially non-gaseous form material comprises a solid.
8. The system of claim 1 , wherein the monitor comprises an infrared photometric monitor.
9. The system of claim 8 , wherein the infrared photometric monitor comprises a sampling region for the material.
10. A system for delivery of a dilute material, comprising:
an active material source;
a diluent fluid source;
a fluid flow-metering device for dispensing of the material source at a predetermined flow rate;
a mixing device arranged to mix active material from the active material source that is dispensed at said predetermined flow rate by the fluid flow metering device, with diluent fluid to form a diluted active fluid mixture; and
a monitor comprising an infrared photometric monitor including a sampling region for the material and being arranged to measure concentration of active material in the diluted active fluid mixture, and responsively adjust the fluid flow-metering device, to control the dispensing rate of the active material, and maintain a predetermined concentration of active material in the diluted active fluid mixture, wherein the infrared photometric monitor is constructed and arranged to transmit infrared radiation through the sampling region and to responsively generate an output signal correlative of the material in the sampling region, based on its interaction with the infrared radiation; and a process controller arranged to receive the output of the infrared photometric monitor and to responsively control one or more process conditions in and/or affecting the process system.
11. A process for delivery of dilute semiconductor manufacturing material, comprising:
providing an active material source of semiconductor manufacturing material and a diluent fluid source;
controllably dispensing active material from the active semiconductor manufacturing material source at a predetermined flow rate;
mixing active semiconductor manufacturing material from the active material source that is dispensed at said predetermined flow rate, with diluent fluid from the diluent fluid source, to form a diluted active semiconductor manufacturing fluid mixture; and
monitoring concentration of active material in the diluted active semiconductor manufacturing fluid mixture, and responsively adjusting the dispensing rate of the active semiconductor manufacturing material, to maintain a predetermined concentration of active semiconductor manufacturing material in the diluted active gas mixture.
12. The process of claim 11 , further comprising a source for supplying the material in gaseous form.
13. The process of claim 12 , wherein the material comprises a solid.
14. The process of claim 12 , wherein the material comprises a liquid.
15. The process of claim 11 , wherein the material is initially of a non-gaseous form.
16. The process of claim 15 , wherein the initially non-gaseous form material comprises a liquid.
17. The process of claim 15 , wherein the initially non-gaseous form material comprises a solid.
18. The process of claim 11 , wherein said monitoring comprises use of an infrared photometric monitor.
19. The process of claim 18 , wherein the infrared photometric monitor comprises a sampling region for the material.
20. A process for delivery of dilute material, comprising:
providing an active material source and a diluent fluid source;
controllably dispensing active material from the active material source at a predetermined flow rate;
mixing active material from the active material source that is dispensed at said predetermined flow rate, with diluent fluid from the diluent fluid source, to form a diluted active fluid mixture; and
monitoring concentration of active material in the diluted active fluid mixture, and responsively adjusting the dispensing rate of the active material, to maintain a predetermined concentration of active material in the diluted active gas mixture wherein said monitoring comprises use of an infrared photometric monitor including a sampling region for the material, wherein the infrared photometric monitor is constructed and arranged to transmit infrared radiation through the sampling region and to responsively generate an output signal correlative of the material in the sampling region, based on its interaction with the infrared radiation; and wherein said adjusting comprises use of a process controller arranged to receive the output of the infrared photometric monitor and to responsively control one or more process conditions in and/or affecting the process.