Developer solution and process for use
View Patent ↗An improved composition and method for the development of resists is disclosed. The method comprises contacting the resist with a developer solution comprising a source of alkalinity and a cationic surfactant which is an ethoxylated and/or propoxylated tallow amine. The improved developer solution more effectively removes the uncured resist from the resist coated surface.
1. An aqueous developer composition comprising:
a. a source of alkalinity; and
b. a cationic surfactant of the following structure:
where:
R 1 =fatty acid group;
R 2 ═—H, —CH 2 CH 2 O—, or —CH 2 CH(CH 3 )O—R 2 ═—H;
R 3 ═—H, —CH 2 CH 2 O—, or —CH 2 CH(CH 3 )O—;
R 4 ═—H if x 2 is zero, alkyl, aryl, or alkaryl;
sum of all x 1 =an integer totaling from 3 to 30;
sum of all x 2 =an integer totaling 0 to 15.
2. A composition according to claim 1 wherein R 1 is selected from the group consisting of myristic acid, myristoleic acid, pentadecanoic acid, palmitic acid, palmitoleic acid, stearic acid, oleic acid, linoleic acid, alpha-linoleic acid and mixture of any or all of the foregoing.
3. A composition according to claim 2 wherein the composition also comprises one or more materials selected from the group consisting of anti-foam and water miscible organic solvents.
4. A composition according to any one of claims 1 , 2 , or 3 wherein R 2 is —CH 2 CH (CH 3 )O—.
5. A composition according to any one of claims 1 , 2 , or 3 wherein R 3 is H or —CH 2 CH (CH 3 )O—.
6. A composition according to any one of claims 1 , 2 , or 3 wherein the sum of all x 1 , is an integer totaling 15 and the sum of all X 2 is an integer totaling 2.
7. A method of developing a resist coated surface said method comprising: contacting the resist coated surface comprising areas of cured resist and areas of uncured resist with a developer composition comprising:
a. a source of alkalinity; and
b. a cationic surfactant of the following structure.
where:
R 1 =fatty acid group;
R 2 ═—H, —CH 2 CH 2 O—, or —CH 2 CH(CH 3 )O—R 2 ═—H;
R 3 ═—H, —CH 2 CH 2 O—, or —CH 2 CH(CH 3 )O—;
R 4 ═—H if x 2 is zero, alkyl, aryl, or alkaryl;
sum of all x 1 =an integer totaling from 3 to 30;
sum of all x 2 =an integer totaling 0 to 15.
8. A method according to claim 7 wherein R 1 is selected from the group consisting of myristic acid, myristoleic acid, pentadecanoic acid, palmitic acid, palmitoleic acid, stearic acid, oleic acid, linoleic acid, alpha-linoleic acid and mixture of any or all of the foregoing.
9. A method according to claim 8 wherein the composition also comprises one or more materials selected from the group consisting of anti-foam and water miscible organic solvents.
10. A method according to any one of claims 7 , 8 or 9 wherein R 2 is —CH 2 CH(CH 3 )O—.
11. A method according to any one of claims 7 , 8 , or 9 wherein R 3 is H or —CH 2 CH (CH 3 )O—.
12. A method according to any one of claims 7 , 8 , or 9 wherein the sum of all x 1 , is an integer totaling 15 and the sum of all X 2 is an integer totaling 2.