IP Library Granted Patent US 7,409,660
Granted Patent B2
US 7,409,660 · App. 11/324,105 · Granted Aug 5, 2008

Method and end cell library for avoiding substrate noise in an integrated circuit

Assignee: LSI Corporation
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Quick Facts
Patent No.
US 7,409,660
App. No.
11/324,105
Granted
Aug 5, 2008
Kind
B2
Abstract

A method of avoiding substrate noise in an integrated circuit includes steps of receiving as input an integrated circuit design that includes at least a portion of a block for placement and routing on a substrate and an outer boundary of the block. An end cell is selected from a set of end cells for terminating the block in an outer area that extends from the outer boundary to an end cell boundary outside the block. The selected end cell is placed in the outer area to isolate the block electrically from the substrate.

Claims (23)

1. A method comprising steps of:

(a) receiving as input an integrated circuit design that includes at least a portion of a block for placement and routing on a substrate, the block comprising two N-well layers separated by a P-substrate layer, the N-well layers and the P-substrate layer extending to an outer boundary enclosing the block;

(b) selecting an end cell from a pre-defined set of end cells, the end cell comprising a layer of an electrically conductive material to attenuate propagation of substrate noise; and

(c) placing the selected end cell along the outer boundary so that an area enclosed by the end cell extends outside the outer boundary to form a single segment of an electrically conductive ring, the electrically conductive ring enclosing the outer boundary to isolate the block from substrate noise and to terminate the portion of the block in the integrated circuit design.

2. The method of claim 1 further comprising repeating steps (b) and (c) to complete the electrically conductive ring.

3. The method of claim 1 further comprising a step of generating the pre-defined set of end cells.

4. The method of claim 3 wherein step (b) comprises selecting the end cell comprising a P-type layer for terminating the P-substrate layer at the outer boundary.

5. The method of claim 4 further comprising selecting the end cell comprising an N-well region formed outside the P-substrate layer.

6. The method of claim 5 further comprising selecting the end cell comprising an electrically conductive layer formed outside the N-well region.

7. The method of claim 6 further comprising selecting the end cell comprising an electrically conductive layer that comprises one of a P-type layer and a metal layer.

8. The method of claim 3 wherein step (b) comprises selecting the end cell comprising an electrically conductive layer for terminating the N-well layer at the outer boundary.

9. An apparatus comprising:

at least a portion of a block for placement and routing on a substrate in an integrated circuit design, the block comprising two N-well layers separated by a P-substrate layer, the N-well layers and the P-substrate layer extending to an outer boundary enclosing the block; and

an end cell selected from a pre-defined set of end cells, the end cell comprising a layer of an electrically conductive material to attenuate propagation of substrate noise, the end cell placed along the outer boundary so that an area enclosed by the end cell extends outside the outer boundary to form a single segment of an electrically conductive ring, the electrically conductive ring enclosing the outer boundary to isolate the block from substrate noise and to terminate the portion of the block in the integrated circuit design.

10. The apparatus of claim 9 further comprising multiple end cells selected from the pre-defined set of end cells to complete the electrically conductive ring.

11. The apparatus of claim 9 further comprising the pre-defined set of end cells.

12. The apparatus of claim 9 , the end cell further comprising a P-type layer for terminating the P-substrate layer at the outer boundary.

13. The apparatus of claim 12 further comprising an N-well region formed in the end cell outside the P-substrate layer.

14. The apparatus of claim 13 further comprising an electrically conductive layer formed in the end cell outside the N-well region.

15. The apparatus of claim 14 , the electrically conductive layer comprising one of a P-type layer and a metal layer.

16. The apparatus of claim 9 , the end cell comprising an electrically conductive layer for terminating the N-well layer at the outer boundary.

17. An apparatus comprising:

a set of pre-defined end cells for terminating at least a portion of a block for placement and routing on a substrate of an integrated circuit design, the block comprising two N-well layers separated by a P-substrate layer, the N-well layers and the P-substrate layer extending to an outer boundary enclosing the block, each end cell comprising a layer of an electrically conductive material to attenuate propagation of substrate noise when the end cell is placed along the outer boundary so that an area enclosed by the end cell extends outside the outer boundary to form a single segment of an electrically conductive ring, the electrically conductive ring enclosing the outer boundary to isolate the block from substrate noise and to terminate the portion of the block in the integrated circuit design.

Assignments (10)
RELEASE OF SECURITY INTEREST Recorded Apr 15, 2022
From: CORTLAND CAPITAL MARKET SERVICES LLC
To: HILCO PATENT ACQUISITION 56, LLC; BELL SEMICONDUCTOR, LLC; BELL NORTHERN RESEARCH, LLC
Reel/Frame 059720/0223 →
SECURITY INTEREST Recorded Feb 1, 2018
From: HILCO PATENT ACQUISITION 56, LLC; BELL SEMICONDUCTOR, LLC; BELL NORTHERN RESEARCH, LLC
To: CORTLAND CAPITAL MARKET SERVICES LLC, AS COLLATERAL AGENT
Reel/Frame 045216/0020 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 17, 2017
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.; BROADCOM CORPORATION
To: BELL SEMICONDUCTOR, LLC
Reel/Frame 044887/0109 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS (RELEASES RF 032856-0031) Recorded Feb 2, 2016
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: LSI CORPORATION; AGERE SYSTEMS LLC
Reel/Frame 037684/0039 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 3, 2015
From: LSI CORPORATION
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 035390/0388 →
CHANGE OF NAME Recorded Jun 6, 2014
From: LSI LOGIC CORPORATION
To: LSI CORPORATION
Reel/Frame 033102/0270 →
PATENT SECURITY AGREEMENT Recorded May 8, 2014
From: LSI CORPORATION; AGERE SYSTEMS LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 032856/0031 →
MERGER Recorded Feb 19, 2008
From: LSI SUBSIDIARY CORP.
To: LSI CORPORATION
Reel/Frame 020548/0977 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNOR'S DOC DATE PREVIOUSLY RECORDED ON REEL 017334 FRAME 0987. ASSIGNOR(S) HEREBY CONFIRMS THE DOC DATE: 01/17/2006.. Recorded Apr 7, 2006
From: WU, HSIAO-HUI; LAI, KAI; JEN, FREDRICK
To: LSI LOGIC CORPORATION
Reel/Frame 017441/0703 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 13, 2006
From: HUNG, CHIH-JU; SONG, XIANG MATTHEW; WU, HSIAO-HUI; LAI, KAI; JEN, FREDRICK
To: LSI LOGIC CORPORATION
Reel/Frame 017334/0987 →
Continuity (1)
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