Ion beam monitoring in an ion implanter using an imaging device

1. An ion implantation system comprising:

an ion source that generates an ion beam;

a beam line assembly that receives the ion beam from the ion source and through which the ion beam passes;

an imaging monitor system that captures frames of the ion beam at one or more points along a path of the ion beam and analyzes the captured frames to measure one or more characteristics of the ion beam; and

a target location that receives the ion beam from the beam line assembly.

2. The system of claim 1 , further comprising an end station located downstream of the beam line assembly, that holds a target workpiece at the target location.

3. The system of claim 2 , wherein the end station further comprises a process disk onto which multiple target workpieces are held and pass through the target location.

4. The system of claim 2 , wherein the end station is a single workpiece end station.

5. The system of claim 1 , wherein the imaging monitor system comprises an image sensor located proximate to the target location.

6. The system of claim 1 , wherein the imaging monitor system comprises an image sensor positioned within the beam line assembly or with a view of the interior of the beamline assembly through which the beam passes.

7. The system of claim 1 , wherein the imaging monitor system comprises a plurality of sensors.

8. The system of claim 1 , wherein the measured characteristics comprise at least one from the group consisting of particle count, particle characteristics, beam intensity, beam intensity variations, and size and shape of the ion beam.

9. The system of claim 1 , wherein the imaging monitor system comprises one or more image sensors that capture the frames, an image analyzer that analyzes the frames to measure the one or more characteristics, and a controller that generates feedback for the beam line assembly and the ion source.

10. The system of claim 1 , wherein the imaging monitor system provides feedback to the beam line assembly according to the measured characteristics.

11. The system of claim 1 , wherein the imaging monitor system provides feedback to the ion source according to the measured characteristics.

12. An imaging monitor system comprising:

one or more image sensors positioned along a path of an ion beam that capture frames of the ion beam;

an image analyzer that receives the captured frames from the one or more image sensors and analyzes the captured frames to measure one or more characteristics of the ion beam; and

a controller that receives the measured characteristics from the image analyzer and determines corrective adjustments according to the measured characteristics.

13. The system of claim 12 , further comprising an ion implantation system that generates the ion beam and receives the corrective adjustments.

14. The system of claim 12 , wherein the one or more image sensors operate at a selected frame rate and resolution.

15. The system of claim 14 , wherein the selected frame rate is at least 30 fps and the selected resolution is 640 pixels by 480 pixels.

16. The system of claim 12 , wherein the measured characteristics include a particle count.

17. The system of claim 12 , wherein the measured characteristics include beam intensity and beam shape.

18. The system of claim 12 , wherein the image analyzer determines particle vectors for identified particles that include velocity and trajectory.

19. A method of monitoring characteristics of an ion beam comprising:

providing an ion beam traveling along a beam path toward a target location;

capturing one or more orthogonal frames or images of the ion beam along the beam path; and

analyzing the captured frames to obtain measured characteristics of the ion beam.

20. The method of claim 19 , further comprising comparing the measured characteristics with desired beam characteristics.

21. The method of claim 20 , further comprising determining adjustments for beam generation according to the measured characteristics and the desired beam characteristics.

22. The method of claim 19 , wherein analyzing the captured frames to obtain the measured characteristics includes obtaining particle count, beam intensity beam intensity variations, and beam shape.

23. A method for performing image analysis comprising:

obtaining one or more frames along a path of an ion beam;

analyzing the obtained frames to identify a start frame for a particle;

determining a start point and trajectory path for the particle;

analyzing the obtained frames to identify interim frames;

further determining the trajectory path according to the identified interim frames;

analyzing the obtained frames to identify an end frame for the particle;

further determining the trajectory path according to the identified end frame; and

determining an end point for the particle according to the identified end frame.

24. The method of claim 23 , further comprising determining a mass for the particle from the start frame.

25. The method of claim 23 , further comprising determining a velocity according to the trajectory path, the start point, and the end point.

26. The method of claim 25 , further comprising determining a projected target location according to the velocity and the trajectory path.

27. The method of claim 23 , wherein the start frame is identified as a first frame having a segment of pixels with an intensity above a baseline value.