Semiconductor device having sub-surface trench charge compensation regions
View Patent ↗In one embodiment, a semiconductor device is formed having sub-surface charge compensation regions in proximity to channel regions of the device. The charge compensation trenches comprise at least two opposite conductivity type semiconductor layers. A channel connecting region electrically couples the channel region to one of the at least two opposite conductivity type semiconductor layers.
1. A semiconductor device comprising:
a region of semiconductor material having a first major surface;
a body region formed in the region of semiconductor material;
a source region formed in the body region;
a trench gate structure including a gate conductive layer separated from sidewalls of the trench gate structure by a gate dielectric layer, wherein the body region and source region are in proximity to the trench gate structure, and wherein the trench gate structure is configured to control a channel in the body region when the semiconductor device is in operation;
a sub-surface trench compensation region formed in the region of semiconductor material and recessed below the first major surface, wherein the subsurface trench compensation region is adjacent a lower surface of the trench gate structure, and wherein the subsurface trench compensation region comprises a plurality of opposite conductivity type semiconductor layers, and wherein sidewalls of the subsurface trench compensation region adjoin the region of semiconductor material without an intervening dielectric layer; and
a channel connecting region formed in the region of semiconductor material interposed between the body region and the subsurface trench compensation region and configured to electrically couple the channel to at least one of the plurality of opposite conductivity type semiconductor layers, wherein the channel connecting region and the source region comprise a first conductivity type, and wherein the channel connecting region overlies at least a portion of the plurality of opposite conductivity type semiconductor layers.
2. The device of claim 1 wherein the region of semiconductor material and the body region comprise the same conductivity type.
3. The device of claim 1 wherein the region of semiconductor material and the body region comprise opposite conductivity types.
4. The device of claim 1 wherein the sub surface trench compensation region is filled with a plurality of single crystal epitaxial layers including:
a first layer of a first conductivity type formed overlying sidewalls and a lower surface of the trench; and
a second layer of a second and opposite conductivity type formed overlying the first layer.
5. The device of claim 4 further comprising a first buffer layer formed between the first and second layers, wherein the buffer layer has a lower dopant concentration than the first and second layers when deposited.
6. The device of claim 4 further comprising a dielectric region overlying the second layer.
7. The device of claim 6 , wherein the dielectric region comprises a thermal oxide layer overlying the second layer, a polysilicon layer overlying the thermal oxide layer, and a deposited oxide overlying the polysilicon layer.
8. The device of claim 1 further comprising a doped region extending laterally from the subsurface trench compensation region into the region of semiconductor material and below the body region, wherein the doped region and the body region comprise a first conductivity type.
9. The device of claim 1 , wherein the region of semiconductor material comprises a semiconductor substrate and a semiconductor layer formed overlying the semiconductor substrate and having a lower dopant concentration than the semiconductor substrate.
10. The device of claim 9 , wherein the sub-surface trench compensation region extends through the semiconductor layer into the semiconductor substrate.
11. The device of claim 9 , wherein the sub-surface trench compensation region terminates within the semiconductor layer, and wherein the device further comprises a doped region formed between a lower surface of the subsurface trench compensation region and the semiconductor substrate and configured to electrically couple the sub-surface trench compensation region to the semiconductor substrate when the device is in operation.
12. The device of claim 1 further comprising a second dielectric region separating a lower portion of the trench gate structure from the sub-surface trench compensation region, wherein the second dielectric region has a thickness greater than that of the gate dielectric layer.
13. A semiconductor device comprising:
a region of semiconductor material having a first major surface;
a filled trench structure formed in the region of semiconductor material including:
a charge compensating portion recessed below the first major surface, wherein the charge compensating portion includes a first layer of a first conductivity type and a second layer of a second conductivity type overlying the first layer, and wherein the first layer adjoins the region of semiconductor material along sidewall portions that are absent dielectric material; and
a control portion formed overlying the charge compensating portion;
a body region of the first conductivity type formed in the region of semiconductor material adjacent the filled trench structure, wherein the control portion is configured to create a channel within the body region when the device is in operation;
a source region formed in the body region; and
a first doped region of the second conductivity type formed in the region of semiconductor material and configured to electrically couple the channel to the charge compensating portion when the device is in operation, wherein the first doped region overlies at least a portion of the first and second layers.
14. A semiconductor device comprising:
a trench control structure formed in a region of semiconductor material, wherein the trench control structure includes a control electrode for forming a channel in a body region formed along a sidewall of the trench control structure;
a source region formed in the body region;
a charge compensation structure abutting a lower surface of the trench control structure, wherein the charge compensation structure comprises a plurality of opposite conductivity layers overlying sidewall and lower surfaces of the charge compensation structure, and wherein the charge compensation structure is formed without an intervening dielectric layer between the region of semiconductor material and plurality of opposite conductivity type layers; and
a doped region formed in the region of semiconductor material electrically coupling the channel to the charge compensation structure, wherein the doped region and the source region comprise the same conductivity type, and wherein the doped region overlies at least a portion of the plurality of opposite conductivity type semiconductor layers.
15. The device of claim 14 , wherein the trench control structure further includes a first dielectric layer having a first thickness along the sidewall separating the control electrode from the region of semiconductor material, and wherein the device further includes a second dielectric layer having a second thickness isolating the charge compensation structure from the control electrode.
16. The device of claim 15 , wherein the second thickness is greater than the first thickness.
17. The device of claim 14 , wherein the charge compensating portion includes a first layer of a first conductivity type and a second layer of a second conductivity type overlying the first layer.
18. The device of claim 17 , further comprising a dielectric layer formed overlying the second layer.
19. The device of claim 14 , wherein at least a portion of the control electrode is recessed below a major surface of the region of semiconductor material.