IP Library Granted Patent US 7,515,454
Granted Patent B2
US 7,515,454 · App. 11/497,810 · Granted Apr 7, 2009

CBRAM cell and CBRAM array, and method of operating thereof

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,515,454
App. No.
11/497,810
Granted
Apr 7, 2009
Kind
B2
Abstract

According to one embodiment of the present invention, a CBRAM cell includes a solid electrolyte block having at least three solid electrolyte contacting areas, electrodes electrically connected to the solid electrolyte contacting areas, wherein conductive paths are formable, erasable or detectable within the solid electrolyte block by applying voltages between the solid electrolyte contacting areas using the electrodes as voltage suppliers, and wherein the contacting areas are spatially separated from each other such that conductive paths starting from different solid electrolyte contacting areas or ending at different solid electrolyte contacting areas do not overlap each other.

Claims (38)

1. A solid electrolyte random access memory (CBRAM) cell, comprising:

a solid electrolyte block comprising at least three solid electrolyte contacting areas;

electrodes electrically connected to the solid electrolyte contacting areas; and

conductive paths that are formable, eraseable or detectable within the solid electrolyte block based on voltages applied between the solid electrolyte contacting areas, wherein the contacting areas are spatially separated from each other such that conductive paths starting from different solid electrolyte contacting areas or ending at different solid electrolyte contacting areas do not overlap each other.

2. The CBRAM cell according to claim 1 , wherein the solid electrolyte contacting areas comprise:

a first solid electrolyte contacting area and a second solid electrolyte contacting area, the first and second solid electrolyte contacting areas being positioned over a first surface of the solid electrolyte block; and

a common solid electrolyte contacting area being positioned over a second surface of the solid electrolyte block, wherein conductive paths starting from the first or second solid electrolyte contacting area end at the common solid electrolyte contacting area.

3. The CBRAM cell according to claim 2 , wherein the first solid electrolyte contacting area is positioned at or close to a first edge region of the solid electrolyte block, and the second solid electrolyte contacting area is positioned at or close to a second edge region of the solid electrolyte block.

4. The CBRAM cell according to claim 3 , wherein the first edge region faces the second edge region.

5. The CBRAM cell according to claim 3 , further comprising a third solid electrolyte contacting area positioned over the first surface between the first and the second solid electrolyte contacting areas, wherein a conductive path starting from the third solid electrolyte contacting area ends at the common solid electrolyte contacting area.

6. The CBRAM cell according to claim 1 , wherein the solid electrolyte contacting areas comprise:

a first solid electrolyte contacting area, a second solid electrolyte contacting area, a third solid electrolyte contacting area and a fourth solid electrolyte contacting area, the first, second, third and fourth solid electrolyte contacting areas being positioned over a first surface of the solid electrolyte block; and

a common solid electrolyte contacting area that is positioned over a second surface of the solid electrolyte block, wherein conductive paths starting from the first, second, third or fourth solid electrolyte contacting area end at the common solid electrolyte contacting area.

7. The CBRAM cell according to claim 6 , wherein the first surface of the solid electrolyte block has a rectangular shape, each of the first to fourth solid electrolyte contacting areas being positioned at or close to a different corner of the first surface.

8. The CBRAM cell according to claim 1 , further comprising a resistance layer provided on a first surface of the solid electrolyte block, wherein at least a part of the resistance layer is positioned between the solid electrolyte contacting areas positioned on the first surface, and wherein the resistance layer has a higher electrical resistance than that of the electrodes contacting the solid electrolyte contacting areas positioned on the first surface.

9. The CBRAM cell according to claim 1 , wherein the solid electrolyte contacting areas are surface areas of the solid electrolyte block that are directly contacted by the electrodes.

10. The CBRAM cell according to claim 8 , wherein at least one solid electrolyte contacting area is at least partly covered by the resistance layer.

11. The CBRAM cell according to claim 10 , wherein at least the parts of the resistance layer that cover the at least one solid electrolyte contacting area comprise ions for forming the conductive paths.

12. The CBRAM cell according to claim 8 , wherein a material of the resistance layer is the same as that of the first electrodes, and the thickness of the resistance layer is smaller than the thicknesses of the first electrodes.

13. The CBRAM cell according to claim 8 , wherein the resistance layer comprises metal nitride.

14. The CBRAM cell according to claim 13 , wherein the resistance layer is selected from the group of materials consisting of tantalum nitride (TaN), tungsten nitride (WN), doped silicon (Si), and combinations thereof.

15. The CBRAM cell according to claim 2 , wherein the first surface of the solid electrolyte block faces the second surface of the solid electrolyte block.

16. The CBRAM cell according to claim 2 , wherein the first surface is a top surface of the solid electrolyte block, and the second surface is a bottom surface of the solid electrolyte block.

17. A CBRAM cell array including a plurality of CBRAM cells, each CBRAM cell comprising:

a solid electrolyte block comprising at least three solid electrolyte contacting areas;

electrodes electrically connected to the solid electrolyte contacting areas; and

conductive paths that are formable, eraseable or detectable within the solid electrolyte block based on voltages applied between the solid electrolyte contacting areas, wherein the contacting areas are spatially separated from each other such that conductive paths starting from different solid electrolyte contacting areas or ending at different solid electrolyte contacting areas do not overlap each other.

18. The CBRAM cell array according to claim 17 , wherein the solid electrolyte contacting areas comprise:

a first solid electrolyte contacting area and a second solid electrolyte contacting area, the first and second solid electrolyte contacting areas being positioned over a first surface of the solid electrolyte block; and

a common solid electrolyte contacting area that is positioned over a second surface of the solid electrolyte block, wherein conductive paths starting from the first or second solid electrolyte contacting area end at the common solid electrolyte contacting area.

19. The CBRAM cell array according to claim 18 , wherein the first solid electrolyte contacting area is positioned at or close to a first edge region of the solid electrolyte block, and the second solid electrolyte contacting area being positioned at or close to a second edge region of the solid electrolyte block.

20. The CBRAM cell array according to claim 19 , wherein the first edge region faces the second edge region.

21. The CBRAM cell array according to claim 19 , further comprising a third solid electrolyte contacting area positioned over the first surface between the first and the second solid electrolyte contacting areas, wherein a conductive path starting from the third solid electrolyte contacting area ends at the common solid electrolyte contacting area.

22. The CBRAM cell array according to claim 18 , wherein the solid electrolyte contacting areas comprise:

a first solid electrolyte contacting area, a second solid electrolyte contacting area, a third solid electrolyte contacting area and a fourth solid electrolyte contacting area, the first, second, third and fourth solid electrolyte contacting areas being positioned over a first surface of the solid electrolyte block; and

a common solid electrolyte contacting area that is positioned over a second surface of the solid electrolyte block, wherein conductive paths starting from the first, second, third or fourth solid electrolyte contacting area end at the common solid electrolyte contacting area.

23. The CBRAM cell array according to claim 22 , wherein the first surface of the solid electrolyte block has a rectangular shape, each of the first to fourth solid electrolyte contacting areas being positioned at or close to a different corner of the first surface.

24. The CBRAM cell array according to claim 22 , wherein the electrodes connected to the first, second, third and fourth solid electrolyte contacting areas are electrically connected to bit lines of the CBRAM cell array, and wherein the electrode connected to the common solid electrolyte contacting area is electrically connected to a word line of the CBRAM cell array.

Assignments (13)
RELEASE OF SECURITY INTEREST Recorded Sep 24, 2019
From: OBSIDIAN AGENCY SERVICES, INC., AS COLLATERAL AGENT
To: ADESTO TECHNOLOGIES CORPORATION; ARTEMIS ACQUISITION LLC
Reel/Frame 050480/0836 →
RELEASE OF SECURITY INTEREST Recorded May 9, 2019
From: OPUS BANK
To: ADESTO TECHNOLOGIES CORPORATION; ARTEMIS ACQUISITION LLC
Reel/Frame 049125/0970 →
SECURITY INTEREST Recorded May 8, 2018
From: ADESTO TECHNOLOGIES CORPORATION; ARTEMIS ACQUISITION LLC
To: OBSIDIAN AGENCY SERVICES, INC., AS COLLATERAL AGENT
Reel/Frame 046105/0731 →
RELEASE OF SECURITY INTEREST Recorded Oct 3, 2017
From: WESTERN ALLIANCE BANK
To: ADESTO TECHNOLOGIES CORPORATION; ARTEMIS ACQUISITION LLC
Reel/Frame 044219/0610 →
SECURITY INTEREST Recorded May 22, 2015
From: ADESTO TECHNOLOGIES CORPORATION; ARTEMIS ACQUISITION LLC
To: OPUS BANK
Reel/Frame 035754/0580 →
RELEASE OF SECURITY INTEREST Recorded Oct 15, 2013
From: OPUS BANK
To: ADESTO TECHNOLOGIES CORPORATION; ARTEMIS ACQUISITION LLC
Reel/Frame 031414/0232 →
SECURITY AGREEMENT Recorded Oct 7, 2013
From: ADESTO TECHNOLOGIES CORPORATION; ARTEMIS ACQUISITION LLC
To: BRIDGE BANK, NATIONAL ASSOCIATION
Reel/Frame 031371/0581 →
SECURITY AGREEMENT Recorded Oct 8, 2012
From: ADESTO TECHNOLOGIES CORPORATION; ARTEMIS ACQUISITION LLC
To: OPUS BANK
Reel/Frame 029090/0922 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEES ERRONEOUSLY NAMED AS INFINEON TECHNOLOGIES AG AND ALTIS SEMICONDUCTOR PREVIOUSLY RECORDED ON REEL 018550 FRAME 0057. ASSIGNOR(S) HEREBY CONFIRMS THE CORRECT ASSIGNEES TO BE QIMONDA AG AND ALTIS SEMICONDUCTOR. Recorded Nov 5, 2010
From: SYMANCZYK, RALF
To: QIMONDA AG; ALTIS SEMICONDUCTOR
Reel/Frame 025317/0743 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 8, 2010
From: QIMONDA AG
To: ADESTO TECHNOLOGY CORPORATION
Reel/Frame 024953/0554 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 8, 2010
From: SYMANCZYK, RALF
To: ALTIS SEMICONDUCTOR; INFINEON TECHNOLOGIES AG
Reel/Frame 024953/0546 →
CONTRIBUTION AGREEMENT (RELEVANT PARTS; ENGLISH TRANSLATION) Recorded Oct 6, 2009
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023330/0771 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 25, 2006
From: SYMANCZYK, RALF
To: INFINEON TECHNOLOGIES AG; ALTIS SEMICONDUCTOR
Reel/Frame 018550/0057 →