EUV debris mitigation filter and method for fabricating semiconductor dies using same
According to one exemplary embodiment, an extreme ultraviolet (EUV) source collector module for use in a lithographic tool comprises an EUV debris mitigation filter. The EUV debris mitigation filter can be in the form of an aerogel film, and can be used in combination with an EUV debris mitigation module comprising a combination of conventional debris mitigation techniques. The EUV debris mitigation filter protects collector optics from contamination by undesirable debris produced during EUV light emission, while advantageously providing a high level of EUV light transmittance. One disclosed embodiment comprises implementation of an EUV debris mitigation filter in an EUV source collector module utilizing a discharge-produced plasma (DPP) light source. One disclosed embodiment comprises implementation of an EUV debris mitigation filter in an EUV source collector module utilizing a laser-produced plasma (LPP) light source.
1. A source collector module for fabricating a semiconductor wafer, said source collector module comprising:
a light source capable of providing light to a collector optics in said source collector module;
a debris mitigation filter comprising an aerogel film positioned adjacent to said collector optics;
said debris mitigation filter configured to be substantially transmissive of light produced by said light source.
2. A semiconductor die diced from said semiconductor wafer fabricated by the source collector module of claim 1 .
3. The semiconductor die of claim 2 , where said semiconductor die is utilized in a circuit board.
4. The source collector module of claim 1 wherein said light source comprises a discharge-produced plasma (DPP) source.
5. The source collector module of claim 1 wherein said light source comprises a laser-produced plasma (LPP) source.
6. The source collector module of claim 1 wherein said aerogel film is selected from the group consisting of a silicon aerogel, a silica aerogel, and a metal foam.
7. An extreme ultraviolet (EUV) debris mitigation filter for use in an EUV source collector module to fabricate a semiconductor wafer, said EUV debris mitigation filter comprising:
an aerogel film capable of being situated between a debris mitigation module and a collector optics of said EUV source collector module;
said aerogel film being capable of protecting said collector optics from contamination by debris passing through said debris mitigation module;
said EUV debris mitigation filter configured to be substantially transmissive of EUV light.
8. The EUV debris mitigation filter of claim 7 wherein said aerogel film comprises a silicon aerogel.
9. The EUV debris mitigation filter of claim 7 wherein said aerogel film comprises a silica aerogel.
10. The EUV debris mitigation filter of claim 7 wherein said aerogel film comprises a metal foam.
11. The EUV debris mitigation filter of claim 7 wherein said aerogel film has a thickness of from approximately 1.0 micrometer to approximately 20.0 micrometers.
12. A method for fabricating a semiconductor wafer using extreme ultraviolet (EUV) lithography, said method comprising:
placing an EUV debris mitigation filter between a (Debris mitigation module and a collector optics, said EUV debris mitigation filter comprising an aerogel film and being substantially transmissive of EUV light;
shining EUV light through said debris mitigation module and debris mitigation filter onto said collector optics module to create a pattern for fabrication of said semiconductor wafer.
13. The method of claim 12 further comprising dicing said semiconductor wafer into a plurality of semiconductor dies.
14. The method of claim 13 further comprising utilizing one or more of said plurality of semiconductor dies in a circuit board.
15. The method of claim 13 further comprising packaging one or more of said plurality of semiconductor dies.
16. The method of claim 13 , wherein at least one of said plurality of semiconductor dies is utilized in a circuit board as a part of an electronic system, said electronic system being selected from the group consisting of a wired communications device, a wireless communications device, a cell phone, a switching device, a router, a repeater, a codec, a LAN, a WLAN, a Bluetooth enabled device, a digital camera, a digital audio player and/or recorder, a digital video player and/or recorder, a computer, a monitor, a television set, a satellite set top box, a cable modem, a digital automotive control system, a digitally-controlled home appliance, a printer, a copier, a digital audio or video receiver, an RF transceiver, a personal digital assistant (PDA), a digital game playing device, a digital testing and/or measuring device, a digital avionics device, a medical device, and a digitally-controlled medical equipment.
17. The method of claim 12 wherein said aerogel film comprises a silicon aerogel.
18. The method of claim 12 wherein said aerogel film comprises a silica aerogel.
19. The method of claim 12 wherein said aerogel film comprises a metal foam.
20. The method of claim 12 wherein said aerogel film has a thickness of from approximately 1.0 micrometer to approximately 20.0 micrometers.