Granted Patent B2

US 7,416,972 · App. 11/730,942 · Granted Aug 26, 2008

Abstract

Claims (9)

1. A method of making a circuitized substrate, said method comprising:

providing a first dielectric sub-layer including a low moisture absorptivity resin and having first and second opposing surfaces, said first dielectric sub-layer further including a plurality of fibers having a low coefficient of thermal expansion;

forming first and second circuitized layers on said first and second opposing surfaces of said first dielectric sub-layer, respectively;

positioning second and third dielectric sub-layers on said first and second circuitized layers, respectively, each of said second and third dielectric sub-layers also of a low moisture absorptivity resin, said second and third dielectric sub-layers not including continuous or semi-continuous fibers or the like as part thereof;

forming third and fourth circuitized layers on said second and third dielectric sub-layers, respectively; and

forming a highly dense pattern of thru-holes which extend through said first, second and third sub-layers and said first second third and fourth circuitized layers.

2. The method of claim 1 wherein said forming of said highly dense pattern of thru-holes comprises forming each of said thru-holes with an aspect ratio of the thickness of said first, second and third dielectric sub-layers of said circuitized substrate to the diameter of said thru-holes within the range of from about 2:1 to about 20:1.

3. The method of claim 1 wherein said highly dense pattern of said thru-holes are provided within said first, second and third dielectric sub-layers using a laser.

4. The method of claim 1 further including electrically coupling at least one electrical component to said third circuitized layer.

Assignments (13)