Optically controlled silicon carbide and related wide-bandgap transistors and thyristors
View Patent ↗An optically active material is used to create power devices and circuits having significant performance advantages over conventional methods for affecting optical control of power electronics devices and circuits. A silicon-carbide optically active material is formed by compensating shallow donors with the boron related D-center. The resulting material can be n-type or p-type but it is distinguished from other materials by the ability to induce persistent photoconductivity in it when illuminated by electromagnetic radiation with a photon energy in excess of the threshold energy required to photoexcite electrons from the D-center to allowed states close to the conduction band edge, which varies from polytype to polytype.
1. A device comprising:
a substrate;
an optically active, semi-insulating silicon carbide (SiC) layer applied over the substrate, the SiC layer having boron-related D-center defects formed therein; and
an electromagnetic radiation source, the electromagnetic radiation source in optical communication with the SiC layer such that electromagnetic radiation produced by the electromagnetic radiation source is directed onto a surface of the SiC layer;
wherein the electromagnetic radiation source produces electromagnetic radiation having at least a first wavelength that stimulates photoconductivity in the SiC layer and a second wavelength that quenches photoconductivity in the SiC layer.
2. The device of claim 1 , wherein the substrate is a N-type conducting substrate.
3. The device of claim 1 , wherein the substrate is a P-type conducting substrate.
4. The device of claim 1 , further comprising:
a controller connected to the electromagnetic radiation source, the controller driving the electromagnetic radiation source to deliver a pulse of electromagnetic radiation of the first or second wavelength to the optically active, semi-insulating silicon carbide (SiC) layer such that the device changes from a conducting to a non-conducting state or from a non-conducting to a conducting state.
5. The device of claim 1 , wherein the device is configured as an optically controlled bi-polar junction transistor (BJT).
6. The device of claim 1 , wherein the device is an optically controlled junction transistor field effect transistor (JFET).
7. The device of claim 1 , wherein the device is configured as an optically controlled metal oxide semiconductor field effect transistor (MOSFET).
8. The device of claim 1 , wherein the device is an optically controlled thyristor.
9. A device comprising:
a substrate;
a drift layer disposed on the substrate;
a channel layer disposed on the drift layer;
an optically active, semi-insulating silicon carbide (SiC) layer applied over the substrate, the SiC layer having boron-related D-center defects formed therein; and
an electromagnetic radiation source, the electromagnetic radiation source in optical communication with the SiC layer such that electromagnetic radiation produced by the electromagnetic radiation source is directed onto a surface of the SiC layer;
wherein the electromagnetic radiation source produces electromagnetic radiation having at least a first wavelength that stimulates photoconductivity in the SiC layer and a second wavelength that quenches photoconductivity in the SiC layer.
10. The device of claim 9 , wherein the substrate is a N-type conducting substrate.
11. The device of claim 9 , wherein the substrate is a P-type conducting substrate.
12. The device of claim 9 , further comprising:
a controller connected to the electromagnetic radiation source, the controller driving the electromagnetic radiation source to deliver a pulse of electromagnetic radiation of the first or second wavelength to the optically active, semi-insulating silicon carbide (SiC) layer such that the device changes from a conducting to a non-conducting state or from a non-conducting to a conducting state.
13. The device of claim 9 , wherein the device is an optically controlled BJT.
14. The device of claim 9 , wherein the device is an optically controlled JFET.
15. The device of claim 9 , wherein the device is an optically controlled MOSFET.
16. The device of claim 9 , wherein the device is an optically controlled thyristor.
17. The device of claim 1 , wherein the device further comprises a material which allows electromagnetic radiation to enter the surface of the SiC layer, wherein the electromagnetic radiation source is adapted to direct the electromagnetic radiation onto the surface of the SiC layer through the material.
18. The device of claim 17 , wherein the material which allows electromagnetic radiation to enter the surface of the SiC layer is a dielectric material.
19. The device of claim 9 , wherein the device further comprises a material which allows electromagnetic radiation to enter the surface of the SiC layer, wherein the electromagnetic radiation source is adapted to direct the electromagnetic radiation onto the surface of the SiC layer through the material.
20. The device of claim 19 , wherein the material which allows electromagnetic radiation to enter the surface of the SiC layer is a dielectric material.