IP Library Granted Patent US 7,697,330
Granted Patent B1
US 7,697,330 · App. 11/961,203 · Granted Apr 13, 2010

Non-volatile memory array having drain-side segmentation for an FPGA device

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Quick Facts
Patent No.
US 7,697,330
App. No.
11/961,203
Granted
Apr 13, 2010
Kind
B1
Abstract

A non-volatile memory array for an FPGA comprises a plurality of memory cells arranged in rows and columns and divided into a plurality of row segments. The source of each non-volatile memory transistor in each segment is coupled together to a common source line. A column segment line is associated with each segment of the array, and is coupled to the drains of each non-volatile memory transistor in the segment. A segment select transistor is coupled between each column segment line and its associated column line, and a high-voltage driver transistor is coupled to each column line.

Claims (40)

1. A non-volatile memory array for a field-programmable-gate-array device having drain-side segmentation and comprising:

a plurality of memory cells arranged as an array of rows and columns, the array divided into a plurality of segments, each segment including a plurality of rows, each memory cell including a non-volatile memory transistor having a source, a drain, a floating gate, and a control gate, the source of each non-volatile memory transistor in each segment coupled together to a common source line, the non-volatile memory transistors in each segment being formed in a well associated only with that segment;

at least one switch transistor associated with each non-volatile memory transistor, the at least one switch transistor having a source, a drain, a floating gate and a control gate and wherein each non-volatile memory transistor shares a floating gate with its associated at least one switch transistor;

a column line associated with each column in the array;

a column segment line associated with each segment of the array, each column segment line coupled to the drains of each non-volatile memory transistor in the segment;

a segment select transistor coupled between each column segment line and its associated column line; and

a high-voltage driver transistor coupled to each column line.

2. The non-volatile memory array of claim 1 wherein the sources of non-volatile memory transistors in adjacent columns are coupled to the same common source line.

3. The non-volatile memory array of claim 2 wherein each common source line is coupled to a source-bias transistor.

4. The non-volatile memory array of claim 3 wherein each source-bias transistor is coupled to ground.

5. The non-volatile memory array of claim 4 wherein the source-bias transistors associated with segments that include non-volatile memory transistors in the same rows are all controlled by a single gate line.

6. The non-volatile memory array of claim 1 wherein the non-volatile memory transistors in a single segment in adjacent pairs of odd-even columns are formed in the same well.

7. The non-volatile memory array of claim 6 wherein the non-volatile memory transistors are n-channel MOS transistors and the well is a p-well.

8. The non-volatile memory array of claim 1 wherein the control gates all non-volatile memory transistors and all of the least one switch transistors in a single row of the array are coupled together.

9. The non-volatile memory array of claim 1 wherein all of the at least one switch transistors associated with non-volatile memory transistors in a segment of a column of the array are formed in a single well.

10. The non-volatile memory array of claim 9 wherein all of the at least one switch transistors are n-channel MOS transistors and the well is a p-well.

11. The non-volatile memory array of claim 1 wherein the sources of non-volatile memory transistors in adjacent columns of the same segment are coupled to the same common source line.

12. The non-volatile memory array of claim 11 wherein each common source line is coupled to a source-bias transistor.

13. The non-volatile memory array of claim 12 wherein each source-bias transistor is coupled to ground.

14. The non-volatile memory array of claim 12 wherein the source-bias transistors associated with segments that include non-volatile memory transistors in the same rows are all controlled by a single gate line.

15. A non-volatile memory array for a field-programmable-gate-array device having drain-side segmentation and comprising:

a plurality of memory cells arranged as an array of rows and columns, the array divided into a plurality of segments, each segment including a plurality of rows, each memory cell including a non-volatile memory transistor having a source, a drain, a floating gate, and a control gate, the source of each non-volatile memory transistor in each segment coupled together to a segment source line, the non-volatile memory transistors in each segment being formed in a well associated only with that segment;

at least one switch transistor associated with each non-volatile memory transistor, the at least one switch transistor having a source, a drain, a floating gate and a control gate and wherein each non-volatile memory transistor shares a floating gate with its associated at least one switch transistor;

a plurality of column lines associated with the array, neighboring ones of the non-volatile memory transistors in adjacent pairs share a common column line;

a column segment line associated with each segment of the array, each column segment line coupled to the drains of each non-volatile memory transistor in the segment;

a segment select transistor coupled between each column segment line and its associated column line; and

a high-voltage driver transistor coupled to each column line.

16. The non-volatile memory array of claim 15 wherein the sources of non-volatile memory transistors in adjacent columns are coupled to the same segment source line.

17. The non-volatile memory array of claim 16 wherein each segment source line is coupled to a source-bias transistor.

18. The non-volatile memory array of claim 17 wherein each source-bias transistor is coupled to ground.

19. The non-volatile memory array of claim 18 wherein the source-bias transistors associated with segments that include non-volatile memory transistors in the same rows are all controlled by a single gate line.

20. The non-volatile memory array of claim 15 wherein the non-volatile memory transistors in a single segment in adjacent pairs of odd-even columns are formed in the same well.

21. The non-volatile memory array of claim 20 wherein the non-volatile memory transistors are n-channel MOS transistors and the well is a p-well.

22. The non-volatile memory array of claim 15 wherein the control gates all non-volatile memory transistors and all of the least one switch transistors in a single row of the array are coupled together.

23. The non-volatile memory array of claim 15 wherein all of the at least one switch transistors associated with non-volatile memory transistors in a segment of a column of the array are formed in a single well.

24. The non-volatile memory array of claim 23 wherein all of the at least one switch transistors are n-channel MOS transistors and the well is a p-well.

25. The non-volatile memory array of claim 15 wherein the sources of non-volatile memory transistors in adjacent columns of the same segment are coupled to the same segment source line.

26. The non-volatile memory array of claim 25 wherein each segment source line is coupled to a source-bias transistor.

27. The non-volatile memory array of claim 26 wherein each source-bias transistor is coupled to ground.

28. The non-volatile memory array of claim 26 wherein the source-bias transistors associated with segments that include non-volatile memory transistors in the same rows are all controlled by a single gate line.

Assignments (7)
RELEASE OF SECURITY INTEREST Recorded May 29, 2018
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: MICROSEMI CORPORATION; MICROSEMI SEMICONDUCTOR (U.S.), INC.; MICROSEMI FREQUENCY AND TIME CORPORATION; MICROSEMI COMMUNICATIONS, INC.; MICROSEMI SOC CORP.; MICROSEMI CORP. - POWER PRODUCTS GROUP; MICROSEMI CORP. - RF INTEGRATED SOLUTIONS
Reel/Frame 046251/0391 →
PATENT SECURITY AGREEMENT Recorded Feb 3, 2016
From: MICROSEMI CORPORATION; MICROSEMI SEMICONDUCTOR (U.S.) INC. (F/K/A LEGERITY, INC., ZARLINK SEMICONDUCTOR (V.N.) INC., CENTELLAX, INC., AND ZARLINK SEMICONDUCTOR (U.S.) INC.); MICROSEMI FREQUENCY AND TIME CORPORATION (F/K/A SYMMETRICON, INC.); MICROSEMI COMMUNICATIONS, INC. (F/K/A VITESSE SEMICONDUCTOR CORPORATION); MICROSEMI SOC CORP. (F/K/A ACTEL CORPORATION); MICROSEMI CORP. - POWER PRODUCTS GROUP (F/K/A ADVANCED POWER TECHNOLOGY INC.); MICROSEMI CORP. - RF INTEGRATED SOLUTIONS (F/K/A AML COMMUNICATIONS, INC.)
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037691/0697 →
RELEASE OF SECURITY INTEREST Recorded Jan 19, 2016
From: BANK OF AMERICA, N.A.
To: MICROSEMI CORPORATION; MICROSEMI CORP.-ANALOG MIXED SIGNAL GROUP, A DELAWARE CORPORATION; MICROSEMI SOC CORP., A CALIFORNIA CORPORATION; MICROSEMI SEMICONDUCTOR (U.S.) INC., A DELAWARE CORPORATION; MICROSEMI FREQUENCY AND TIME CORPORATION, A DELAWARE CORPORATION; MICROSEMI COMMUNICATIONS, INC. (F/K/A VITESSE SEMICONDUCTOR CORPORATION), A DELAWARE CORPORATION; MICROSEMI CORP.-MEMORY AND STORAGE SOLUTIONS (F/K/A WHITE ELECTRONIC DESIGNS CORPORATION), AN INDIANA CORPORATION
Reel/Frame 037558/0711 →
CHANGE OF NAME Recorded Dec 28, 2015
From: ACTEL CORPORATION
To: MICROSEMI SOC CORP.
Reel/Frame 037393/0572 →
NOTICE OF SUCCESSION OF AGENCY Recorded Apr 9, 2015
From: ROYAL BANK OF CANADA (AS SUCCESSOR TO MORGAN STANLEY & CO. LLC)
To: BANK OF AMERICA, N.A., AS SUCCESSOR AGENT
Reel/Frame 035657/0223 →
PATENT SECURITY AGREEMENT Recorded Feb 11, 2011
From: WHITE ELECTRONIC DESIGNS CORP.; ACTEL CORPORATION; MICROSEMI CORPORATION
To: MORGAN STANLEY & CO. INCORPORATED
Reel/Frame 025783/0613 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 14, 2008
From: BELLIPPADY, VIDYADHARA; YACHARENI, SANTOSH; DHAOUI, FETHI; WANG, ZHIGANG
To: ACTEL CORPORATION
Reel/Frame 020655/0679 →