Shielded trace structure and fabrication method

1. A method comprising:

forming a patterned sacrificial layer on a first carrier;

forming a patterned trace layer on the patterned sacrificial layer;

laminating the patterned sacrificial layer and the patterned trace layer to a dielectric material;

removing the first carrier;

removing the patterned sacrificial layer creating sacrificial layer gaps above the patterned trace layer and within the dielectric material;

filling the sacrificial layer gaps with a trace layer isolation dielectric material;

laser-ablating shield trenches within the dielectric material and on opposite sides of a signal trace of the patterned trace layer; and

filling the shield trenches with electrically conductive material to form shield walls.

2. The method of claim 1 wherein the forming a patterned sacrificial layer on a first carrier comprises:

providing the first carrier with a photoresist layer;

patterning the photoresist layer to form a patterned photoresist layer comprising circuit pattern artifacts therein; and

plating the patterned sacrificial layer on the first carrier and within the circuit pattern artifacts.

3. The method of claim 2 wherein the forming a patterned trace layer on the patterned sacrificial layer comprises:

plating the patterned trace layer on the patterned sacrificial layer and within the circuit pattern artifacts.

4. The method of claim 3 further comprising stripping the patterned photoresist layer.

5. A method comprising:

forming a patterned sacrificial layer on a first carrier;

forming a patterned trace layer on the patterned sacrificial layer;

laminating the patterned sacrificial layer and the patterned trace layer to a dielectric material;

removing the first carrier;

removing the patterned sacrificial layer creating sacrificial layer gaps above the patterned trace layer;

filling the sacrificial layer gaps with a trace layer isolation dielectric material;

laser-ablating shield trenches within the dielectric material and on opposite sides of a signal trace of the patterned trace layer;

filling the shield trenches with electrically conductive material to form shield walls; and

patterning the electrically conductive material to form a shield top.

6. The method of claim 5 wherein the patterning the electrically conductive material to form a shield top comprises:

applying a photoresist layer to the electrically conductive material;

patterning the photoresist layer to form a patterned photoresist layer on the electrically conductive material, wherein exposed portions of the electrically conductive material are exposed by the patterned photoresist layer; and

removing the exposed portions of the electrically conductive material.

7. The method of claim 6 further comprising stripping the patterned photoresist layer.

8. The method of claim 5 wherein the shield walls extend from a first surface of the dielectric material through the dielectric material to a second carrier mounted to a second surface of the dielectric material.

9. The method of claim 8 wherein the shield walls are electrically connected to the second carrier.

10. The method of claim 8 wherein the signal trace is shielded from above by the shield top, from the sides by the shield walls, and from below by the second carrier.

11. The method of claim 10 wherein a bias shield comprises:

the shield top;

the shield walls; and

the second carrier.

12. A method comprising:

laminating a patterned sacrificial layer and a signal trace to a dielectric material;

removing the patterned sacrificial layer creating a sacrificial layer gap above the signal trace and within the dielectric material;

filling the sacrificial layer gap with a trace layer isolation dielectric material;

laser-ablating shield trenches within the dielectric material and on opposite sides of the signal trace; and

filling the shield trenches with electrically conductive material to form shield walls.

13. The method of claim 12 further comprising forming the patterned sacrificial layer on a first carrier.

14. The method of claim 13 further comprising forming a patterned trace layer on the patterned sacrificial layer.

15. The method of claim 14 wherein the patterned trace layer comprises the signal trace.

16. The method of claim 13 further comprising removing the first carrier.

17. The method of claim 12 further comprising:

patterning the electrically conductive material to form a shield top.

18. The method of claim 12 wherein the shield walls extend from a first surface of the dielectric material through the dielectric material to a second carrier mounted to a second surface of the dielectric material, the shield walls being electrically connected to the second carrier.

19. The method of claim 18 wherein the signal trace is shielded from above by the shield top, from the sides by the shield walls, and from below by the second carrier.

20. A method comprising:

laminating a patterned sacrificial layer and a signal trace on a first carrier to a first surface of a dielectric material;

removing the first carrier;

removing the patterned sacrificial layer creating a sacrificial layer gap above the signal trace and within the dielectric material;

filling the sacrificial layer gap with a trace layer isolation dielectric material;

laser-ablating shield trenches within the dielectric material and on opposite sides of the signal trace;

filling the shield trenches with electrically conductive material to form shield walls; and

patterning the electrically conductive material to form a shield top, wherein the shield walls extend from the first surface of the dielectric material through the dielectric material to a second carrier mounted to a second surface of the dielectric material, wherein a bias shield around the signal trace comprises:

the shield top;

the shield walls; and

the second carrier.