Photometrically modulated delivery of reagents
View Patent ↗A process system adapted for processing of or with a material therein. The process system includes: a sampling region for the material; an infrared photometric monitor constructed and arranged to transmit infrared radiation through the sampling region and to responsively generate an output signal correlative of the material in the sampling region, based on its interaction with the infrared radiation; and process control means arranged to receive the output of the infrared photometric monitor and to responsively control one or more process conditions in and/or affecting the process system.
1. A system adapted to supply a gaseous reagent species to a gaseous reagent species-utilizing manufacturing process region, the system comprising:
(a) a sampling region for analyzing the gaseous reagent species;
(b) a monitor in sensory communication with the sampling region, the monitor being constructed and arranged to responsively generate an output signal correlative of presence or concentration of the gaseous reagent species in the sampling region; and
(c) a process controller arranged to receive the output of the monitor and to responsively control one or more process conditions in and/or affecting the gaseous species-utilizing manufacturing process region.
2. The system of claim 1 , wherein said gaseous reagent species is generated from a non-gaseous species.
3. The system of claim 2 , wherein said non-gaseous species is transformed into said gaseous reagent species by vaporizing, subliming, volatilizing, or atomizing.
4. The system of claim 1 , wherein said monitor is arranged to monitor any of the reagent species of interest, and one or more decomposition by-products of the reagent species.
5. The system of claim 2 , wherein said non-gaseous species comprises a solid.
6. The system of claim 2 , wherein said non-gaseous species comprises a liquid.
7. The system of claim 1 , comprising a semiconductor manufacturing facility utilizing said gaseous reagent species.
8. The system of claim 7 , wherein the gaseous species-utilizing manufacturing process region comprises a vapor deposition unit.
9. The system of claim 7 , wherein the gaseous species-utilizing manufacturing process region comprises an ion implantation unit.
10. The system of claim 1 , wherein said monitor comprises an infrared photometric monitor constructed and arranged to transmit infrared radiation through the sampling region and to responsively generate an output signal correlative of presence or concentration of the gaseous reagent species in the sampling region, based on its interaction with the infrared radiation.
11. The system of claim 1 , wherein said process controller is adapted to control a delivery parameter selected from gaseous reagent species flow rate, vaporizer temperature, pressure and combinations thereof.
12. The system of claim 2 , further comprising a source vessel for said non-gaseous species.
13. The system of claim 2 , further comprising a synthesis or generating unit for said non-gaseous species.
14. The system of claim 1 , further comprising flow circuitry for said gaseous species.
15. The system of claim 14 , wherein said flow circuitry is heated.
16. The system of claim 2 , wherein said sampling region comprises a gas cell, and said gas cell is heated to prevent said gaseous reagent species from reverting to said non-gaseous species.
17. The system of claim 1 , wherein said process controller controls flow rate of the gaseous reagent species, temperature of the gaseous reagent species, or utilization of said gaseous reagent species in said gaseous-species utilizing manufacturing process region.
18. A method of manufacturing a semiconductor, the method comprising monitoring a gaseous reagent species using the system of claim 1 , and responsively controlling one or more process conditions in and/or affecting the gaseous species-utilizing manufacturing process region.
19. A gaseous reagent species supply system comprising:
a sampling region for analyzing a gaseous reagent species;
an infrared radiation source arranged to emit infrared radiation into the sampling region;
a photometric detector arranged to receive infrared radiation from the sampling region and responsively generate an output signal correlative of presence or concentration of the gaseous reagent species in the sampling region;
at least one infrared radiation filter element optically coupled between the infrared radiation source and the photometric detector; and
a process controller arranged to receive the output of the detector and to responsively control one or more process conditions in and/or affecting the gaseous species-utilizing manufacturing process region.
20. A system for supplying gaseous reagent material subject to degradation, the system comprising:
a sampling region for analyzing gaseous reagent material;
a photometric monitor arranged to receive radiation from the sampling region and responsively generate an output signal correlative of presence or concentration of any of (i) at least one species of said gaseous reagent material, and (ii) at least one decomposition by-product of said gaseous reagent material or a species thereof; and
a control element adapted to receive the output signal to determine whether degradation of gaseous reagent exceeds a predetermined level.
21. A method utilizing the system of claim 20 , the method comprising:
flowing gaseous reagent material through the sampling region;
photometrically detecting radiation from the sampling region and responsively generating an output signal correlative of presence or concentration of any of (i) at least one species of said gaseous reagent material, and (ii) at least one decomposition by-product of said gaseous reagent material or a species thereof; and
utilizing the control element to suppress degradation of said gaseous reagent responsive to said output signal.