Apparatus and method for reducing particle contamination in a vacuum chamber
View Patent ↗An apparatus and method for maintaining low gas velocity variation across a diffuser membrane during the vent-up of a vacuum chamber is disclosed. The diffuser membrane permeability and the pressure conditions across the membrane are chosen to minimize variation in gas flow velocity through the membrane during the vent-up cycle. This reduces re-distribution of particles from a vacuum chamber onto sensitive substrates in the vacuum chamber during vent-up from sub-atmospheric pressure to atmospheric pressure.
1. A method of venting a chamber at sub-atmospheric pressure to about atmospheric pressure, said method comprising:
opening an inlet valve to a substantially disk shaped gas diffuser membrane, said inlet valve upstream of said substantially disk shaped gas diffuser membrane, said substantially disk shaped diffuser membrane has a maximum inlet pressure with outlet to vacuum of 100 psi or more, a 9 LRV retention of 0.003 micron particles at volumetric gas flow of 30 slpm, and a flow rate at maximum inlet pressure of about 100 slpm;
flowing a source gas through said substantially disk shaped gas diffuser membrane into said chamber, said chamber at sub-atmospheric pressure, and establishing a differential pressure of 70 psid or more across said substantially disk shape gas diffuser membrane during flow of said gas source gas through the substantially disk shaped diffuser membrane into said chamber,
stopping the supply of source gas to said substantially disk shaped gas diffuser membrane when said chamber reaches a final pressure of about atmospheric pressure.
2. A vacuum chamber comprising:
a chamber and a substantially disk shaped gas diffuser membrane that controls the flow of gas into the chamber;
said substantially disk shaped gas diffuser membrane characterized by a maximum differential pressure of 70 psid or more, a maximum flow rate for 9 LRV retention of 0.003 micron particles of about 30 slpm, a maximum inlet pressure with outlet to vacuum of 100 psig or more, and a flow rate at maximum inlet pressure of about 100 slpm.
3. The chamber of claim 2 where the substantially disk shaped gas diffuser membrane comprises a fine layer that has a pore size of 10 microns or less on an upstream side of said substantially disk shaped gas diffuser membrane and an open support layer on a downstream side of said substantially disk shaped diffuser membrane, said substantially disk shaped gas diffuser membrane bonded to a fixture that mounts to the chamber.
4. The method of claim 1 further including a soft vent step.
5. The method of claim 1 where the substantially disk shaped gas diffuser membrane comprises a fine layer that has a pore size of 10 microns or less on an upstream side of said substantially disk shaped gas diffuser membrane and an open support layer on a substantially downstream side of said gas diffuser membrane, said substantially disk shaped gas diffuser membrane bonded to a fixture that mounts to the chamber.
6. The method of claim 1 wherein the gas diffuser membrane is disk shaped.
7. The vacuum chamber of claim 2 wherein the substantially disk shaped gas diffuser membrane is disk shaped.
8. The vacuum chamber of claim 3 wherein the substantially disk shaped gas diffuser membrane is disk shaped.