IP Library Granted Patent US 7,855,086
Granted Patent B2
US 7,855,086 · App. 12/469,051 · Granted Dec 21, 2010

Method for monitoring fabrication parameter

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Quick Facts
Patent No.
US 7,855,086
App. No.
12/469,051
Granted
Dec 21, 2010
Kind
B2
Abstract

A method for monitoring fabrication parameters comprises steps of: obtaining a normal parameter variance curve and a comparing parameter variance curve; defining a plurality of normal parameter points on the normal parameter variance curve; defining a plurality of comparing parameter points on the comparing parameter variance curve; finding out the corresponding comparing parameter points nearest to the normal parameter points; calculating the distances between the normal parameter points and the corresponding comparing parameter points thereof; summing up the distances so as to receive a total distance; and determining whether or not the total distance exceeds a limit. Via this arrangement, when fabrication parameter of tool is abnormal, it can be efficiently and immediately determined.

Claims (50)

1. A method for monitoring fabrication parameters applicable in semiconductor manufacturing, the method comprising the following steps:

obtaining a normal parameter variance curve and a comparing parameter variance curve;

defining a plurality of normal parameter points on the normal parameter variance curve;

defining a plurality of comparing parameter points on the comparing parameter variance curve;

finding the corresponding comparing parameter points nearest to the normal parameter points;

calculating distances between the normal parameter points and the corresponding comparing parameter points thereof;

summing up the distances so as to receive a total distance; and

determining whether or not the total distance exceeds a limit.

2. The method for monitoring fabrication parameters according to claim 1 , further comprising the following step:

issuing an alarm when the total distance exceeds the limit.

3. The method for monitoring fabrication parameters according to claim 1 , wherein a Euclidean distance between the normal parameter points are substantially the same.

4. The method for monitoring fabrication parameters according to claim 3 , wherein the Euclidean distance between the normal parameter points is determined based on the following steps:

calculating a total length of the normal parameter variance curve;

defining a number of normal parameter points; and

dividing the total length of the normal parameter variance curve by the number of normal parameter points, so as to get the Euclidean distance between the normal parameter points.

5. The method for monitoring fabrication parameters according to claim 1 , wherein a Euclidean distance between the comparing parameter points is substantially the same.

6. The method for monitoring fabrication parameters according to claim 5 , wherein the Euclidean distance between the comparing parameter points is determined based on the following steps:

calculating a total length of the comparing parameter variance curve;

defining a number of comparing parameter points; and

dividing the total length of the comparing parameter variance curve by the number of comparing parameter points, so as to get the Euclidean distance between the comparing parameter points.

7. The method for monitoring fabrication parameters according to claim 1 , wherein the comparing parameter points outnumber the normal parameter points.

8. The method for monitoring fabrication parameters according to claim 7 , further comprising the following step:

calculating intervals of the comparing parameter points corresponded to the normal parameter points.

9. The method for monitoring fabrication parameters according to claim 8 , further comprising the following step:

determining whether or not the intervals exceeds another limit.

10. The method for monitoring fabrication parameters according to claim 9 , further comprising the following step:

issuing an alarm when the intervals exceed the limit.

11. The method for monitoring fabrication parameters according to claim 8 , wherein the limit is calculated by multiplying an average of the intervals with a weighted value.

12. The method for monitoring fabrication parameters according to claim 1 , wherein the normal parameter variance curve and the comparing parameter variance curve is respectively generated by a Fault Detection and Classification (FDC) system.

13. A method for monitoring fabrication parameters applicable in semiconductor manufacturing, the method comprising the following steps:

obtaining a normal parameter variance curve and a comparing parameter variance curve;

defining a plurality of normal parameter points on the normal parameter variance curve;

defining a plurality of comparing parameter points on the comparing parameter variance curve;

finding the corresponding comparing parameter points nearest to the normal parameter points;

calculating distances between the normal parameter points and the corresponding comparing parameter points thereof;

summing up the distances so as to receive a total distance; and

determining whether or not the total distance exceeds a limit;

wherein a Euclidean distance between the normal parameter points is substantially the same, and a Euclidean distance between the comparing parameter points is substantially the same.

14. The method for monitoring fabrication parameters according to claim 13 , further comprising the following step:

issuing an alarm when the total distance exceeds the limit.

15. The method for monitoring fabrication parameters according to claim 13 , wherein the Euclidean distance between the normal parameter points is determined based on the following steps:

calculating a total length of the normal parameter variance curve;

defining a number of normal parameter points; and

dividing the total length of the normal parameter variance curve by the number of normal parameter points, so as to get the Euclidean distance between the normal parameter points.

16. The method for monitoring fabrication parameters according to claim 13 , wherein the Euclidean distance between the comparing parameter points is determined based on the following steps:

calculating a total length of the comparing parameter variance curve;

defining a number of comparing parameter points; and

dividing the total length of the comparing parameter variance curve by the number of comparing parameter points, so as to get the Euclidean distance between the comparing parameter points.

17. The method for monitoring fabrication parameters according to claim 13 , wherein the comparing parameter points outnumber the normal parameter points.

18. The method for monitoring fabrication parameters according to claim 13 , wherein the normal parameter variance curve and the comparing parameter variance curve is respectively generated by a Fault Detection and Classification (FDC) system.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050695/0825 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 27, 2017
From: INOTERA MEMORIES, INC.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 041820/0815 →
SUPPLEMENT NO. 3 TO PATENT SECURITY AGREEMENT Recorded Feb 10, 2017
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041675/0105 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 27, 2009
From: LEE, YI FENG; CHEN, CHUN CHI; TIAN, YUN-ZONG; CHEN, WEI JUN
To: INOTERA MEMORIES, INC.
Reel/Frame 022745/0291 →