IP Library Granted Patent US 7,939,906
Granted Patent B2
US 7,939,906 · App. 12/471,734 · Granted May 10, 2011

Preparation method for an electron tomography sample with embedded markers and a method for reconstructing a three-dimensional image

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Quick Facts
Patent No.
US 7,939,906
App. No.
12/471,734
Granted
May 10, 2011
Kind
B2
Abstract

A manufacturing method for an electron tomography specimen with embedded fiducial markers includes the following steps. A chip of wafer is provided. The chip includes at least one inspecting area. At least one trench is produced beside the inspecting area. A liquid with the markers is filled into the trenches. A first protection layer is coated on the chip, and then a second protection layer is deposited on the first protection layer. Therefore, the markers can be embedded into the electron tomography specimen. The embedded markers can improve the alignment process, due to those embedded markers are easily tracked during feature tracking procedure. In addition, our novel invention also successfully provides a modified version of the technique to deposit gold beads onto TEM pillar samples for much improved 3D reconstruction.

Claims (30)

1. A preparation method for an electron tomography specimen with embedded markers, comprising the steps of:

providing a chip, wherein the chip includes at least one inspecting area;

producing at least one trench adjacent to the inspecting area;

filling a liquid with markers into the trench;

coating a first protection layer on the chip; and

depositing a second protection layer on the first protection layer.

2. The preparation method as claimed in claim 1 , wherein in step of producing at least one trench, the trench is produced by a dual beam focused ion beam system.

3. The preparation method as claimed in claim 1 , wherein the markers are metal particles, and the metal particles have a predetermined dimension in step of filling a liquid with markers into the trench.

4. The preparation method as claimed in claim 1 , wherein the first protection layer is a polymer layer.

5. The preparation method as claimed in claim 4 , further comprising a solidification process of the polymer layer after the step of coating a first protection layer on the chip.

6. The preparation method as claimed in claim 1 , wherein the second protection layer is a metal layer.

7. The preparation method as claimed in claim 1 , further comprising a cutting process after step of coating a second protection layer on the first protection layer.

8. A preparation method for an electron tomography specimen with embedded markers, comprising the steps of:

providing a chip, wherein the chip includes at least one via-hole structure;

filling a liquid with markers into the via-hole structures;

coating a first protection layer on the chip; and

depositing a second protection layer on the first protection layer.

9. The preparation method as claimed in claim 8 , wherein the markers are metal particles, and the metal particles have a predetermined dimension in step of filling a liquid with markers into the via-hole structures.

10. The preparation method as claimed in claim 8 , wherein the first protection layer is a polymer layer.

11. The preparation method as claimed in claim 10 , further comprising a solidification process of the polymer layer after step of coating a first protection layer on the chip.

12. The preparation method as claimed in claim 8 , wherein the second protection layer is a metal layer.

13. The preparation method as claimed in claim 8 , further comprising a cutting process after step of depositing a second protection layer on the first protection layer.

14. A method for reconstructing a 3D image, comprising the steps of:

manufacturing an electron tomography specimen with embedded markers by using the preparation method as claimed in claim 1 or in claim 8 ;

providing an electron microscope to obtain series of tilted 2D images of the electron tomography specimen at different angles; and

using the markers as alignment references to reconstruct the series of tilted 2D images at different angles into a 3D image of the electron tomography specimen.

15. The method for reconstructing a 3D image as claimed in claim 14 , further comprising a thinning process to thin the electron tomography specimen after step of manufacturing a microscope sample.

16. The method for reconstructing a 3D image as claimed in claim 15 , further comprising a step of placing the electron tomography specimen onto a specimen holder after the thinning process.

17. The method for reconstructing a 3D image as claimed in claim 16 , wherein the specimen holder is a carbon-coated grids or a half Cu ring with a convex structure or a copper five post lift-out grids.

18. The method for reconstructing a 3D image as claimed in claim 14 , wherein the markers are metal particles, and the metal particles have a predetermined dimension.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050695/0825 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 27, 2017
From: INOTERA MEMORIES, INC.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 041820/0815 →
SUPPLEMENT NO. 3 TO PATENT SECURITY AGREEMENT Recorded Feb 10, 2017
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041675/0105 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 20, 2009
From: LUO, JIAN-SHING; HUANG, CHIA-CHI
To: INOTERA MEMORIES, INC.
Reel/Frame 022982/0226 →