Solder bump interconnect

1. A semiconductor package, comprising:

a device pad on a substrate;

a polybenzoxazole (PBO) layer overlying the substrate, the PBO layer having an opening to expose the device pad;

a redistribution layer (RDL) comprising a landing pad, the RDL positioned on the PBO layer and conductively coupled to the device pad;

a polymer layer on the RDL;

an under bump metal pad (UBM) on the landing pad and extending onto a top surface of the polymer layer, wherein the UBM electrically connects to the landing pad through an opening in the polymer layer; and

a solder bump on the UBM;

wherein a shortest distance from a center of the landing pad to an outer edge of the landing pad, and a shortest distance from a center of the UBM to an outer edge of the UBM are in a ratio that ranges from 0.5:1 up to 0.95:1.

2. The semiconductor package of claim 1 , wherein the solder bump has a generally spherical shape and has an outer surface extending beyond an outer edge of the UBM.

3. The semiconductor package of claim 1 , wherein a shortest distance from a center of the opening in the polymer layer to an outer edge of the opening in the polymer layer, and a shortest distance from the center of the UBM to the outer edge of the UBM are in a ratio that ranges from 0.35:1 up to 0.85:1.

4. The semiconductor package of claim 1 , wherein the polymer layer is configured to distribute, throughout the semiconductor package, forces associated with thermal and mechanical stresses.

5. The semiconductor package of claim 1 , wherein the landing pad, the UBM, and the polymer layer employ a circular geometry.

6. The semiconductor package of claim 1 , wherein the landing pad, the UBM, and the polymer layer employ a square geometry.

7. The semiconductor package of claim 1 , wherein the polymer layer is polyimide.

8. The semiconductor package of claim 1 , wherein the polymer layer is benzocyclobutene (BCB).

9. The semiconductor package of claim 1 , wherein the polymer layer is polybenzoxazole.

10. The semiconductor package of claim 1 , wherein the solder bump has a diameter of at least 9 mils.

11. A redistributed package, comprising:

a semiconductor substrate comprising a plurality of device pads on a front surface of the substrate;

a wafer passivation layer on the front surface of the substrate, wherein the wafer passivation layer has openings to expose at least a portion of each device pad;

a polybenzoxazole (PBO) layer overlying the wafer passivation layer, wherein the PBO layer overlaps and contacts a portion of a top surface of each device pad, and the PBO layer has openings to expose a portion of each device pad;

a redistribution layer overlying and in contact with at least a portion of the PBO layer and providing a plurality of landing pads, wherein each of a plurality of portions of the redistribution layer contacts a respective one of the device pads through a respective one of the openings in the PBO layer;

an upper passivation layer overlying the redistribution layer and the PBO layer, wherein the upper passivation layer is PBO;

a plurality of under bump metal pads (UBMs), wherein each UBM is positioned on one of the plurality of landing pads, and each UBM extends onto and overlaps a portion of a top surface of the upper passivation layer; and

a plurality of solder bumps, each solder bump secured to a respective one of the UBMs;

wherein a shortest distance from a center of each respective landing pad to an outer edge of the respective landing pad, and a shortest distance from a center of the corresponding UBM to an outer edge of the corresponding UBM are in a ratio that ranges from 0.5:1 up to 0.95:1.

12. The redistributed package of claim 11 , wherein the redistribution layer is a titanium/aluminum/titanium stack.

13. The redistributed package of claim 11 , wherein the upper passivation layer has a thickness of greater than four microns and a dielectric constant of less than 4.0.

14. The redistributed package of claim 11 , wherein the PBO layer has a thickness of at least four microns.

15. The redistributed package of claim 11 , wherein each of the UBMs has a top copper layer in contact with its corresponding solder bump.

16. The redistributed package of claim 11 , wherein each of the UBMs is an Al/Ni/Cu stack, and the Ni is doped with vanadium.

17. The redistributed package of claim 11 , wherein each of the UBMs is a Ti/Ni/Cu stack, and the Ni is doped with vanadium.

18. A structure, comprising:

a semiconductor substrate comprising a plurality of device pads located at a front surface of the substrate;

a wafer passivation layer overlying the front surface of the substrate, wherein the wafer passivation layer has openings to expose a portion of each device pad;

a polybenzoxazole (PBO) layer overlying the wafer passivation layer, wherein the PBO layer has openings to expose a portion of each device pad, and the PBO layer has a thickness of at least four microns;

a redistribution layer positioned overlying and in contact with at least a portion of the PBO layer and providing a plurality of landing pads, wherein each of a plurality of portions of the redistribution layer contacts a respective one of the device pads through a respective one of the openings in the PBO layer, and the redistribution layer is a titanium/aluminum/titanium stack;

a plurality of under bump metal pads (UBMs), wherein each UBM is on a respective one of the landing pads; and

a plurality of solder bumps, each solder bump secured to a respective one of the landing pads;

wherein a shortest distance from a center of each respective landing pad to an outer edge of the respective landing pad, and a shortest distance from a center of the corresponding UBM to an outer edge of the corresponding UBM are in a ratio that ranges from 0.5:1 up to 0.95:1.

19. The structure of claim 18 , further comprising an upper passivation layer overlying the redistribution layer and the PBO layer, and wherein each UBM extends onto and overlaps a portion of a top surface of the upper passivation layer.

20. The structure of claim 19 , wherein the upper passivation layer is PBO.