IP Library Granted Patent US 9,048,276
Granted Patent B2
US 9,048,276 · App. 13/116,732 · Granted Jun 2, 2015

Matched coefficient of thermal expansion for an electrostatic chuck

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Quick Facts
Patent No.
US 9,048,276
App. No.
13/116,732
Granted
Jun 2, 2015
Kind
B2
Abstract

An apparatus and method are provided for selecting materials for forming an electrostatic clamp. The electrostatic clamp has a backing plate having a first coefficient of thermal expansion, wherein the backing plate provides structural support and rigidity to the electrostatic clamp. The electrostatic clamp further has a clamping plate having a clamping surface associated with contact with a workpiece, wherein the clamping plate has a second coefficient of thermal expansion associated therewith. The clamping plate is bonded, attached or grown to the backing plate, wherein minimal deflection of the clamping plate is evident across a predetermined temperature range. The first coefficient of thermal expansion and second coefficient of thermal expansion, for example, are substantially similar, and vary by no greater than a factor of three.

Claims (21)

1. An electrostatic clamp for selectively maintaining a position of a workpiece, the electrostatic clamp comprising:

a backing plate for providing structural support and rigidity to the electrostatic clamp, wherein the backing plate has a first coefficient of thermal expansion associated therewith, wherein the backing plate consists of a metal, therein defining a metallic backing plate; and

a clamping plate having a clamping surface configured to contact the workpiece, wherein the clamping plate has a second coefficient of thermal expansion associated therewith, wherein the clamping plate comprises a ceramic material, therein defining a ceramic clamping plate, wherein the clamping plate is bonded to the backing plate, and wherein the first coefficient of thermal expansion and second coefficient of thermal expansion are minimized, with a maximum difference determined by the geometry of the electrostatic clamp.

2. The electrostatic clamp of claim 1 , wherein the metallic backing plate is comprised of titanium, and wherein the ceramic clamping plate is comprised of aluminum nitride.

3. The electrostatic clamp of claim 1 , wherein the metallic backing plate is comprised of titanium, and wherein the ceramic clamping plate is comprised of aluminum oxide.

4. The electrostatic clamp of claim 1 , wherein the backing plate comprises one or more coolant channels configured to circulate a coolant fluid therethrough, therein controlling a temperature of the electrostatic clamp.

5. The electrostatic clamp of claim 1 , wherein the metal consists of one or more of aluminum, titanium, platinum, and vanadium.

6. An electrostatic clamp for selectively maintaining a position of a workpiece, the electrostatic clamp comprising:

a backing plate for providing structural support and rigidity to the electrostatic clamp, wherein the backing plate has a first coefficient of thermal expansion associated therewith, and wherein the backing plate consists of silicon carbide; and

a clamping plate having a clamping surface configured to contact the workpiece, wherein the clamping plate has a second coefficient of thermal expansion associated therewith, wherein the ceramic clamping plate consists of aluminum nitride, wherein the clamping plate is bonded to the backing plate, and wherein the first coefficient of thermal expansion and second coefficient of thermal expansion are minimized, with a maximum difference determined by the geometry of the electrostatic clamp.

7. A method for manufacturing an electrostatic clamp, the method comprising:

selecting a metallic backing plate material, wherein the metallic backing plate material consists of a metal having a first coefficient of thermal expansion;

selecting a ceramic clamping plate material having a second coefficient of thermal expansion, wherein the first coefficient of thermal expansion and second coefficient of thermal expansion are minimized, with a maximum difference determined by the geometry of the electrostatic clamp; and

forming a backing plate and clamping plate by bonding, attaching, or growing the ceramic clamping plate material on to the backing plate material.

8. The method of claim 7 , wherein the selection of the metallic backing plate material and the ceramic clamping plate material is based on a predetermined temperature range in which the electrostatic clamp is configured to operate.

9. The method of claim 7 , wherein the first coefficient of thermal expansion and second coefficient of thermal expansion vary by no greater than factor of three.

10. The electrostatic clamp of claim 7 , wherein the metal consists of one or more of aluminum, titanium, platinum, and vanadium.

11. An electrostatic clamp for selectively maintaining a position of a workpiece, the electrostatic clamp comprising:

a backing plate for providing structural support and rigidity to the electrostatic clamp, the backing plate consisting of a metal having a first coefficient of thermal expansion associated therewith;

a clamping plate for providing a clamping surface to selectively contact the workpiece, the clamping plate having a second coefficient of thermal expansion associated therewith, wherein the clamping plate is bonded, attached or grown on to the backing plate, and wherein a difference between the first coefficient of thermal expansion and second coefficient of thermal expansion is minimized with a maximum difference determined by the geometry of the electrostatic clamp.

12. The electrostatic clamp of claim 11 , wherein the metal consists of one or more of aluminum, titanium, platinum, and vanadium.

Assignments (4)
RELEASE OF SECURITY INTEREST Recorded Apr 7, 2023
From: SILICON VALLEY BANK A DIVISION OF FIRST-CITIZENS BANK & TRUST COMPANY
To: AXCELIS TECHNOLOGIES, INC.
Reel/Frame 063270/0277 →
SECURITY INTEREST Recorded Jul 31, 2020
From: AXCELIS TECHNOLOGIES, INC.
To: SILICON VALLEY BANK, AS ADMINISTRATIVE AGENT
Reel/Frame 053375/0055 →
SECOND AMENDMENT TO IPSA Recorded Mar 7, 2012
From: AXCELIS TECHNOLOGIES, INC.
To: SILICON VALLEY BANK
Reel/Frame 027824/0767 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 9, 2011
From: LEE, WILLIAM D.; PUROHIT, ASHWIN M.
To: AXCELIS TECHNOLOGIES, INC.
Reel/Frame 026418/0791 →