Ingan ohmic source contacts for vertical power devices
View Patent ↗A vertical III-nitride field effect transistor includes a drain comprising a first III-nitride material, a drain contact electrically coupled to the drain, and a drift region comprising a second III-nitride material coupled to the drain and disposed adjacent to the drain along a vertical direction. The field effect transistor also includes a channel region comprising a third III-nitride material coupled to the drift region, a gate region at least partially surrounding the channel region, and a gate contact electrically coupled to the gate region. The field effect transistor further includes a source coupled to the channel region. The source includes a GaN-layer coupled to an InGaN layer. The channel region is disposed between the drain and the source along the vertical direction such that current flow during operation of the vertical III-nitride field effect transistor is along the vertical direction.
1. A power device comprising:
a drain comprising a first III-nitride material;
a drain contact electrically coupled to the drain;
a drift region comprising a second III-nitride material coupled to the drain and disposed adjacent to the drain along a vertical direction;
a channel region comprising a third III-nitride material coupled to the drift region;
a gate region at least partially surrounding the channel region;
a gate contact electrically coupled to the gate region;
a source coupled to the channel region, wherein the source comprises (i) a gallium nitride layer and (ii) a crystalline indium gallium nitride (InGaN) layer coupled to the gallium nitride layer; and
a source contact electrically coupled to the source;
wherein the channel region is disposed between the drain and the source along the vertical direction such that current flow during operation of the power device is along the vertical direction.
2. The power device of claim 1 wherein the percentage of indium in the InGaN layer is between 20% and 90%.
3. The power device of claim 2 wherein the percentage of indium in the InGaN layer is between 30% and 90%.
4. The power device of claim 3 wherein the percentage of indium in the InGaN layer is between 50% and 90%.
5. The power device of claim 1 wherein the gallium nitride layer has an n-type conductivity.
6. The power device of claim 1 wherein the gate region has a first conductivity opposite to a second conductivity of the first III-nitride material.
7. The power device of claim 6 wherein the first conductivity is p-type.