IP Library Assignment 067172/0711
Patent Assignment
Reel/Frame 067172/0711

Assignment of Assignor's Interest

Recorded: 2024-04-19 Pages: 12
Assignor
NEXGEN POWER SYSTEMS, INC.
Executed: 2024-03-08
Assignee
SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
5701 N. PIMA ROAD, SCOTTSDALE, ARIZONA, 85250
Covered Properties (98)
Power Supply
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Application: 29/501,217 →
Power Supply
Patent: 762,573 →
Application: 29/525,732 →
Method and System for a Gan Vertical Jfet Utilizing a Regrown Channel
Patent: 9,324,844 →
Application: 14/604,600 →
Publication: US US20150132899A1
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Patent: 9,287,389 →
Application: 14/611,041 →
Publication: US US20150155372A1
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Patent: 9,318,331 →
Application: 14/498,916 →
Publication: US US20150017792A1
Method and System for Floating Guard Rings in Gallium Nitride Materials
Patent: 9,224,828 →
Application: 13/270,606 →
Publication: US US20130087835A1
Method of Fabricating a Gallium Nitride Merged P-I-N Schottky (Mps) Diode
Patent: 8,778,788 →
Application: 13/270,625 →
Publication: US US20130087878A1
Method of Fabricating a Gallium Nitride Merged P-I-N Schottky (Mps) Diode
Patent: 9,171,923 →
Application: 14/299,773 →
Publication: US US20140287570A1
Schottky Diode with Buried Layer in Gan Materials
Patent: 9,196,679 →
Application: 14/594,778 →
Publication: US US20150179733A1
Method and System for Diffusion and Implantation in Gallium Nitride Based Devices
Patent: 8,846,482 →
Application: 13/240,877 →
Publication: US US20130075748A1
Monolithically Integrated Vertical Jfet and Schottky Diode
Patent: 8,941,117 →
Application: 13/935,345 →
Publication: US US20140159051A1
Monolithically Integrated Vertical Jfet and Schottky Diode
Patent: 9,171,937 →
Application: 14/574,265 →
Publication: US US20150140746A1
Schottky Diode with Buried Layer in Gan Materials
Patent: 8,933,532 →
Application: 13/270,641 →
Publication: US US20130087879A1
Aluminum Gallium Nitride Etch Stop Layer for Gallium Nitride Based Devices
Patent: 9,093,284 →
Application: 13/932,290 →
Publication: US US20140162416A1
Method and System for Fabricating Floating Guard Rings in Gan Materials
Patent: 9,171,751 →
Application: 14/264,998 →
Publication: US US20140235030A1
Gan-Based Schottky Barrier Diode with Field Plate
Patent: 8,643,134 →
Application: 13/300,028 →
Publication: US US20130127006A1
Edge Termination by Ion Implantation in Gallium Nitride
Patent: 9,330,918 →
Application: 14/558,393 →
Publication: US US20150200097A1
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Patent: 8,853,063 →
Application: 14/061,741 →
Publication: US US20140116328A1
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Patent: 8,946,725 →
Application: 14/192,662 →
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Patent: 9,318,619 →
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Publication: US US20150137140A1
Ingan Ohmic Source Contacts for Vertical Power Devices
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Application: 14/657,949 →
Publication: US US20150255582A1
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Patent: 9,269,793 →
Application: 14/489,761 →
Publication: US US20150179772A1
Method of Fabricating a Gallium Nitride P-I-N Diode Using Implantation
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Application: 14/454,524 →
Publication: US US20140346527A1
Method of Fabricating a Gan P-I-N Diode Using Implantation
Patent: 9,484,470 →
Application: 14/834,306 →
Publication: US US20150364612A1
Fabrication of Floating Guard Rings Using Selective Regrowth
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Application: 13/335,355 →
Publication: US US20130164893A1
Method and System for Junction Termination in Gan Materials Using Conductivity Modulation
Patent: 8,716,716 →
Application: 13/334,742 →
Publication: US US20130161633A1
Method and System for Junction Termination in Gan Materials Using Conductivity Modulation
Patent: 8,969,180 →
Application: 14/220,564 →
Publication: US US20140206179A1
Method and System for a Gallium Nitride Vertical Jfet with Self-Aligned Source and Gate
Patent: 9,117,850 →
Application: 14/471,374 →
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Application: 15/681,823 →
Publication: US US20180190789A1
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Patent: 8,829,574 →
Application: 13/334,514 →
Publication: US US20130161705A1
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Patent: 9,184,305 →
Application: 13/198,655 →
Publication: US US20130032811A1
Monolithically Integrated Vertical Jfet and Schottky Diode
Patent: 8,502,234 →
Application: 13/289,219 →
Publication: US US20130112985A1
Vertical Gan Jfet with Gate Source Electrodes on Regrown Gate
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Application: 13/315,720 →
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Vertical Gan-Based Metal Insulator Semiconductor Fet
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Application: 13/315,705 →
Publication: US US20130146885A1
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Patent: 8,946,788 →
Application: 13/198,661 →
Publication: US US20130032813A1
Method and System for Formation of P-N Junctions in Gallium Nitride Based Electronics
Patent: 9,136,116 →
Application: 13/198,666 →
Publication: US US20130032814A1
Method and System for Fabricating Floating Guard Rings in Gan Materials
Patent: 8,749,015 →
Application: 13/299,254 →
Publication: US US20130126885A1
Method and System for Carbon Doping Control in Gallium Nitride Based Devices
Patent: 8,569,153 →
Application: 13/307,108 →
Publication: US US20130137225A1
Method and System for Planar Regrowth in Gan Electronic Devices
Patent: 9,502,544 →
Application: 14/815,780 →
Publication: US US20150340476A1
Method and System for a Gallium Nitride Vertical Jfet with Self-Aligned Gate Metallization
Patent: 8,716,078 →
Application: 13/468,325 →
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Method and System for a Gan Vertical Jfet with Self-Aligned Source Metallization
Patent: 8,841,708 →
Application: 13/468,332 →
Publication: US US20130299882A1
Aluminum Gallium Nitride Etch Stop Layer for Gallium Nitride Based Devices
Patent: 9,159,784 →
Application: 13/299,227 →
Publication: US US20130126884A1
Gan Vertical Superjunction Device Structures and Fabrication Methods
Patent: 8,785,975 →
Application: 13/529,822 →
Publication: US US20130341677A1
Gan Vertical Superjunction Device Structures and Fabrication Methods
Patent: 9,029,210 →
Application: 14/302,270 →
Publication: US US20140295652A1
Method of Fabricating a Gan P-I-N Diode Using Implantation
Patent: 8,822,311 →
Application: 13/335,329 →
Publication: US US20130161780A1
Method and System for a Gan Self-Aligned Vertical Mesfet
Patent: 8,866,147 →
Application: 13/335,572 →
Publication: US US20130161635A1
Gan Power Device with Solderable Back Metal
Patent: 9,105,579 →
Application: 13/552,365 →
Publication: US US20140021479A1
Gan Power Device with Solderable Back Metal
Patent: 9,324,607 →
Application: 14/815,751 →
Publication: US US20150340271A1
Gallium Nitride-Based Schottky Barrier Diode with Aluminum Gallium Nitride Surface Layer
Patent: 8,836,071 →
Application: 13/300,009 →
Publication: US US20130126886A1
Gan-Based Schottky Barrier Diode with Algan Surface Layer
Patent: 9,450,112 →
Application: 14/479,634 →
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Edge Termination by Ion Implantation in Gan
Patent: 8,927,999 →
Application: 13/301,165 →
Publication: US US20130126888A1
Method and System for in-Situ Etch and Regrowth in Gallium Nitride Based Devices
Patent: 9,123,533 →
Application: 13/571,743 →
Publication: US US20140045306A1
Method of Fabricating a Gallium Nitride Merged P-I-N Schottky (Mps) Diode by Regrowth and Etch Back
Patent: 8,969,994 →
Application: 13/585,121 →
Publication: US US20140048902A1
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Application: 14/602,125 →
Publication: US US20150200268A1
Ingan Ohmic Source Contacts for Vertical Power Devices
Patent: 9,006,800 →
Application: 13/326,192 →
Publication: US US20130153917A1
Method and System for a Gan Vertical Jfet Utilizing a Regrown Channel
Patent: 8,969,912 →
Application: 13/198,659 →
Publication: US US20130032812A1
Method and System for Fabricating Edge Termination Structures in Gan Materials
Patent: 8,741,707 →
Application: 13/335,383 →
Publication: US US20130161634A1
Bondable Top Metal Contacts for Gallium Nitride Power Devices
Patent: 8,916,871 →
Application: 13/611,467 →
Publication: US US20140070226A1
Gan Vertical Bipolar Transistor
Patent: 8,823,140 →
Application: 13/675,916 →
Publication: US US20140131837A1
VERTICAL GaN JFET WITH LOW GATE-DRAIN CAPACITANCE AND HIGH GATE-SOURCE CAPACITANCE
Patent: 9,391,179 →
Application: 14/604,606 →
Publication: US US20150132900A1
Lateral Gan Jfet with Vertical Drift Region
Patent: 9,472,684 →
Application: 13/675,826 →
Publication: US US20140131721A1
Method and System for Gallium Nitride Electronic Devices Using Engineered Substrates
Patent: 8,981,432 →
Application: 13/572,408 →
Publication: US US20140042447A1
Ac-Dc Converter for Wide Range Output Voltage and High Switching Frequency
Patent: 9,369,059 →
Application: 14/803,552 →
Publication: US US20150326140A1
Method and System for Planar Regrowth in Gan Electronic Devices
Patent: 9,117,839 →
Application: 13/465,812 →
Publication: US US20130292686A1
Vertical Gan Power Device with Breakdown Voltage Control
Patent: 8,866,148 →
Application: 13/721,542 →
Publication: US US20140175450A1
Vertical Gallium Nitride Power Device with Breakdown Voltage Control
Patent: 9,257,500 →
Application: 14/517,564 →
Publication: US US20150104912A1
Method and System for a Gallium Nitride Vertical Transistor
Patent: 9,059,199 →
Application: 13/735,912 →
Publication: US US20140191242A1
Method and System for Local Control of Defect Density in Gallium Nitride Based Electronics
Patent: 9,093,395 →
Application: 13/225,345 →
Publication: US US20130056743A1
Vertical Gan Jfet with Low Gate-Drain Capacitance and High Gate-Source Capacitance
Patent: 8,969,926 →
Application: 13/675,694 →
Publication: US US20140131775A1
Method and System for Co-Packaging Gallium Nitride Electronics
Patent: 8,937,317 →
Application: 13/730,619 →
Publication: US US20140183543A1
Method of Fabricating a Merged P-N Junction and Schottky Diode with Regrown Gallium Nitride Layer
Patent: 9,525,039 →
Application: 14/853,930 →
Publication: US US20160005835A1
Method of Fabricating a Merged P-N Junction and Schottky Diode with Regrown Gallium Nitride Layer
Patent: 9,159,799 →
Application: 13/866,286 →
Publication: US US20140312355A1
Ac-Dc Converter for Wide Range Output Voltage and High Switching Frequency
Patent: 9,089,083 →
Application: 13/692,717 →
Publication: US US20140153304A1
Method and System for Co-Packaging Vertical Gallium Nitride Power Devices
Patent: 9,324,645 →
Application: 13/901,546 →
Publication: US US20140346522A1
Method and System for Operating Gallium Nitride Electronics
Patent: 8,947,154 →
Application: 14/045,708 →
High Power Gallium Nitride Electronics Using Miscut Substrates
Application: 15/697,161 →
Publication: US US20180166556A1
High Power Gallium Nitride Electronics Using Miscut Substrates
Application: 16/423,414 →
Publication: US US20190348522A1
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Application: 16/789,781 →
Publication: US US20200273965A1
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Patent: 9,123,799 →
Application: 14/077,039 →
Publication: US US20150129886A1
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Patent: 9,324,809 →
Application: 14/083,217 →
Publication: US US20150137134A1
High Power Gallium Nitride Electronics Using Miscut Substrates
Patent: 9,368,582 →
Application: 14/071,032 →
Publication: US US20150123138A1
Ac-Dc Converter with Adjustable Output
Patent: 9,531,256 →
Application: 14/095,759 →
Publication: US US20150155775A1
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Application: 15/697,170 →
Publication: US US20180166997A1
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Application: 16/929,926 →
Publication: US US20210028312A1
Method and System for Fabrication of a Vertical Fin-Based Field Effect Transistor
Application: 17/719,221 →
Publication: US US20220310843A1
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Application: 17/707,833 →
Publication: US US20220293530A1
Method and System for Fabricating Fiducials Using Selective Area Growth
Application: 16/929,896 →
Publication: US US20210020580A1
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Application: 18/119,717 →
Publication: US US20230215958A1
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Application: 17/211,562 →
Publication: US US20210305404A1
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Application: 17/131,568 →
Publication: US US20210193846A1
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Application: 17/350,237 →
Publication: US US20210399091A1
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Application: 18/085,985 →
Publication: US US20230127978A1
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Application: 17/524,136 →
Publication: US US20220158539A1
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Application: 17/356,042 →
Publication: US US20210407815A1
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Application: 17/135,436 →
Publication: US US20210210624A1
Method and Apparatus for Digital, Closed-Loop Control of Crcm Switch-Mode Power Converters
Application: 17/524,117 →
Publication: US US20220158560A1
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Application: 17/524,064 →
Publication: US US20220158547A1
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Application: 17/498,426 →
Publication: US US20220149720A1
Related Assignments (24)
Other recorded transfers of the patents in this record — the chain of ownership.
Change of Name Jul 17, 2012
From: EPOWERSOFT, INC.
To: AVOGY, INC.
Reel/Frame 028583/0134 →
Security Interest Apr 1, 2014
From: AVOGY, INC.
To: SILICON VALLEY BANK
Reel/Frame 032611/0010 →
Assignment of Assignor's Interest Sep 2, 2014
From: BEHAR, YVES; MURPHY-REINHERTZ, NOAH; CHANG, DIANA; SMEDBERG, DARIN
To: AVOGY, INC.
Reel/Frame 033653/0088 →
Assignment of Assignor's Interest Sep 29, 2014
From: BOUR, DAVID P.; BROWN, RICHARD J.; KIZILYALLI, ISIK C.; PRUNTY, THOMAS R.
To: EPOWERSOFT, INC.
Reel/Frame 033840/0360 →
Change of Name Sep 30, 2014
From: EPOWERSOFT, INC.
To: AVOGY, INC.
Reel/Frame 033868/0771 →
Assignment of Assignor's Interest Feb 9, 2015
From: KIZILYALLI, ISIK C.; NIE, HUI; EDWARDS, ANDREW P.; ROMANO, LINDA
To: EPOWERSOFT, INC.
Reel/Frame 034922/0174 →
Change of Name Feb 9, 2015
From: EPOWERSOFT, INC.
To: AVOGY, INC.
Reel/Frame 034924/0722 →
Assignment of Assignor's Interest Mar 26, 2015
From: EDWARDS, ANDREW; NIE, HUI; KIZILYALLI, ISIK C.; BROWN, RICHARD J.
To: EPOWERSOFT, INC.
Reel/Frame 035267/0443 →
Change of Name Mar 26, 2015
From: EPOWERSOFT, INC.
To: AVOGY, INC.
Reel/Frame 035307/0151 →
Assignment of Assignor's Interest Apr 6, 2015
From: KIZILYALLI, ISIK C.; NIE, HUI; EDWARDS, ANDREW P.; ROMANO, LINDA
To: EPOWERSOFT, INC.
Reel/Frame 035342/0745 →
Change of Name Apr 6, 2015
From: EPOWERSOFT, INC.
To: AVOGY, INC.
Reel/Frame 035375/0351 →
Assignment of Assignor's Interest Jun 17, 2015
From: DISNEY, DONALD R.; EDWARDS, ANDREW P.; NIE, HUI; BROWN, RICHARD J.
To: AVOGY, INC,
Reel/Frame 035855/0226 →
Assignment of Assignor's Interest Jul 14, 2015
From: KIZILYALLI, ISIK C.; NIE, HUI; EDWARDS, ANDREW P.; ROMANO, LINDA
To: AVOGY, INC.
Reel/Frame 036083/0066 →
Assignment of Assignor's Interest Oct 20, 2015
From: HYLAND, PATRICK JAMES LAZLO; ALVAREZ, BRIAN JOEL; DISNEY, DONALD R.
To: AVOGY, INC.
Reel/Frame 036837/0599 →
Assignment of Assignor's Interest Jun 21, 2016
From: BÉHAR, YVES; MURPHY-REINHERTZ, NOAH; CHANG, DIANA; SMEDBERG, DARIN
To: AVOGY, INC.
Reel/Frame 038977/0708 →
Assignment of Assignor's Interest Feb 2, 2018
From: AVOGY, INC.
To: NEXGEN POWER SYSTEMS, INC.
Reel/Frame 045229/0547 →
Release of Security Interest Feb 13, 2018
From: SILICON VALLEY BANK
To: AVOGY, INC.
Reel/Frame 045317/0963 →
Corrective Assignment to Correct the Assignor from Avogy, Inc. to Avogy (Abc), Llc Previously Recorded on Reel 045229 Frame 0547. Assignor(S) Hereby Confirms the Assignment. Dec 13, 2018
From: AVOGY (ABC), LLC
To: NEXGEN POWER SYSTEMS, INC.
Reel/Frame 047827/0774 →
Assignment of Assignor's Interest Dec 18, 2018
From: AVOGY, INC.
To: AVOGY (ABC), LLC
Reel/Frame 047951/0967 →
Security Interest Oct 23, 2020
From: NEXGEN POWER SYSTEMS, INC.
To: SOUTH LAKE ONE LLC
Reel/Frame 054244/0822 →
Release of Security Interest Jul 26, 2021
From: SOUTH LAKE ONE LLC
To: NEXGEN POWER SYSTEMS, INC.
Reel/Frame 056973/0477 →
Assignment of Assignor's Interest Mar 11, 2024
From: NEXGEN POWER SYSTEMS, INC.
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 066783/0161 →
Corrective Assignment to Correct the the Assignor Name Previously Recorded at Reel: 66783 Frame: 161. Assignor(S) Hereby Confirms the Assignment. Apr 24, 2024
From: NEXGEN (ASSIGNMENT FOR THE BENEFIT OF CREDITORS), LLC
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 067217/0886 →
Nunc Pro Tunc Assignment Apr 24, 2024
From: NEXGEN POWER SYSTEMS, INC.
To: NEXGEN (ASSIGNMENT FOR THE BENEFIT OF CREDITORS), LLC
Reel/Frame 067852/0662 →