Semiconductor device and method of forming thermally conductive layer between semiconductor die and build-up interconnect structure

1. A method of making a semiconductor device, comprising: forming a thermally conductive layer including an opening in the thermally conductive layer, the thermally conductive layer being electrically non-conductive; providing a semiconductor die; disposing the semiconductor die over the thermally conductive layer; and depositing an encapsulant over the semiconductor die and thermally conductive layer.

2. The method of claim 1 , further including forming a first interconnect structure over the encapsulant and semiconductor die.

3. The method of claim 2 , further including:

forming a conductive via through the encapsulant; and

forming a second interconnect structure over the encapsulant and semiconductor die opposite the first interconnect structure, the second interconnect structure being electrically connected to the first interconnect structure through the conductive via.

4. The method of claim 1 , wherein the thermally conductive layer includes aluminum oxide, beryllium oxide, thermal interface material, bakelite, or an anodized aluminum sheet.

5. The method of claim 1 , further including forming a heat sink over the semiconductor die.

6. The method of claim 1 , further including forming a shielding layer over the semiconductor die.

7. The method of claim 1 , wherein disposing the semiconductor die over the thermally conductive layer further includes disposing a bump of the semiconductor die within the opening in the thermally conductive layer.

8. A method of making a semiconductor device, comprising:

providing a thermally conductive layer including a plurality of openings;

providing a semiconductor die including a plurality of bumps formed over a surface of the semiconductor die; and

disposing the semiconductor die over the thermally conductive layer with the bumps disposed within the openings in the thermally conductive layer.

9. The method of claim 8 , further including:

depositing an encapsulant over the semiconductor die and thermally conductive layer; and

forming a first interconnect structure over the encapsulant and semiconductor die.

10. The method of claim 9 , wherein forming the first interconnect structure includes:

forming a first insulating layer within the openings of the thermally conductive layer;

forming an electrically conductive layer over the first insulating layer and thermally conductive layer; and

forming a second insulating layer over the electrically conductive layer and first insulating layer.

11. The method of claim 9 , further including:

forming a conductive via through the encapsulant; and

forming a second interconnect structure over the encapsulant and semiconductor die opposite the first interconnect structure, the second interconnect structure being electrically connected to the first interconnect structure through the conductive via.

12. The method of claim 8 , wherein the thermally conductive layer includes aluminum oxide, beryllium oxide, thermal interface material, bakelite, anodized aluminum sheet, or sheet of copper or aluminum with a thin insulating coating.

13. The method of claim 8 , wherein a first bump of the plurality of bumps contacts a sidewall of a first opening of the plurality of openings in the thermally conductive layer.

14. The method of claim 8 , wherein the thermally conductive layer includes electrically non-conductive material.

15. A method of making a semiconductor device, comprising:

providing a semiconductor die including a bump;

providing a thermally conductive layer including an opening in the thermally conductive layer configured to receive the bump;

disposing the semiconductor die over the thermally conductive layer; and

depositing an encapsulant over the semiconductor die and thermally conductive layer.

16. The method of claim 15 , further including forming an interconnect structure over the encapsulant and semiconductor die.

17. The method of claim 15 , wherein the thermally conductive layer includes aluminum oxide, beryllium oxide, thermal interface material, bakelite, anodized aluminum sheet, or sheet of copper or aluminum with a thin insulating coating.

18. The method of claim 15 , further including forming a heat sink over the semiconductor die.

19. The method of claim 15 , further including forming a shielding layer over the semiconductor die.

20. The method of claim 15 , wherein the thermally conductive layer includes electrically non-conductive material.

21. The method of claim 15 , further including:

forming a conductive via through the encapsulant; and

forming an interconnect structure over the encapsulant and semiconductor die electrically connected to the conductive via.

22. The method of claim 15 , wherein disposing the semiconductor die over the thermally conductive layer further includes disposing the bump within the opening in the thermally conductive layer.

23. A semiconductor device, comprising:

a semiconductor die including an interconnect structure; and

a thermally conductive layer disposed over the semiconductor die including an opening in the thermally conductive layer configured to receive the interconnect structure.

24. The semiconductor device of claim 23 , wherein the interconnect structure includes a bump.

25. The semiconductor device of claim 23 , wherein the thermally conductive layer includes aluminum oxide, beryllium oxide, thermal interface material, bakelite, anodized aluminum sheet, or sheet of copper or aluminum with a thin insulating coating.

26. The semiconductor device of claim 23 , further including a heat sink disposed over the semiconductor die.

27. The semiconductor device of claim 23 , further including a shielding layer disposed over the semiconductor die.

28. The semiconductor device of claim 23 , wherein the thermally conductive layer disposed over the semiconductor die further includes the interconnect structure disposed within the opening in the thermally conductive layer.