Granted Patent B1

US 9,613,820 · App. 15/069,936 · Granted Apr 4, 2017

Abstract

Claims (16)

1. A method of forming patterns, comprising the steps of:

providing a substrate having a target layer thereon;

coating a photoresist layer onto the target layer;

performing a photolithographic process to pattern the photoresist layer into a plurality of first resist patterns;

depositing a directed self-assembly (DSA) material layer in a blanket manner on the first resist patterns, wherein the DSA material layer fills up gaps between the first resist patterns;

subjecting the DSA material layer to a self-assembling process so as to form repeatedly arranged block copolymer patterns in the DSA material layer, wherein the repeatedly arranged block copolymer patterns are aligned corresponding to the first resist patterns and the gaps;

removing undesired portions being not positioned directly above the first resist patterns from the DSA material layer to form second resist patterns on the target layer wherein the second resist patterns covers each of the plurality of first resist patterns; and

using the second resist patterns and the plurality of first resist patterns together as an etch hard mask, performing an etching process to transfer the second resist patterns to the target layer.

2. The method of forming patterns according to claim 1 , wherein the target layer comprises silicon oxide, silicon nitride, silicon, or polysilicon.

3. The method of forming patterns according to claim 1 , wherein each of the first resist patterns has a width that is equal to a width of the gap.

4. The method of forming patterns according to claim 1 , wherein each of the first resist patterns has a width that is not equal to a width of the gap.

5. The method of forming patterns according to claim 1 , wherein the DSA material layer comprises block copolymers.

6. The method of forming patterns according to claim 5 , wherein the block copolymers comprise polystyrene and poly(methyl methacrylate).

7. The method of forming patterns according to claim 6 , wherein the self-assembling process is performed at a temperature lower than a glass transition temperature (Tg) of the block copolymers.

8. The method of forming patterns according to claim 1 , wherein the undesired portions are the DSA material layer not directly positioned on the first resist patterns.

9. The of forming patterns according to claim 1 , wherein the photoresist layer has a ultra-thin thickness ranging between 10˜50 nanometers.

Assignments (6)