IP Library Granted Patent US 9,685,432
Granted Patent B2
US 9,685,432 · App. 15/250,855 · Granted Jun 20, 2017

Compact electrostatic discharge (ESD) protection structure

Inventors: Pei-Ming Daniel Chow (Los Angeles, CA); Jing Zhu (Santa Monica, CA); Yon-Lin Kok (Cerritos, CA); Steven Schell (Torrance, CA)
Assignee: MICROCHIP TECHNOLOGY INCORPORATED
H01L27/0292H01L27/0207H01L27/0248H01L27/0605H01L27/0629H01L29/778
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Quick Facts
Patent No.
US 9,685,432
App. No.
15/250,855
Granted
Jun 20, 2017
Kind
B2
Abstract

A multi-gate Schottky depletion-mode field effect transistor (FET), at least one diode and two resistors comprise a compact electrostatic discharge (ESD) protection structure. This ESD protection structure can be laid out in a smaller area than typical multiple diode ESD devices. The multi-gate FET may comprise various types of high-electron-mobility transistor (HEMT) devices, e.g., (pseudomorphic) pHEMT, (metamorphic) mHEMT, induced HEMT. The multiple gates of the Schottky field effect device are used to form an ESD trigger and charge draining paths for protection of circuits following the ESD protection device. Both single and dual polarity ESD protection devices may be provided on an integrated circuit die for protection of input-output circuits thereof.

Claims (35)

1. An electrostatic discharge (ESD) protection device, comprising:

a first field effect transistor (FET) having a drain, at least two gates and a source, wherein the drain thereof is coupled to a node of a circuit to be protected from an ESD event;

at least one first diode having an anode coupled to the source of the first FET;

a first resistor coupled between the at least two gates of the first FET; and

a second resistor coupled to a one of the at least two gates and a cathode of the at least one first diode;

a second field effect transistor (FET) having a drain, at least two gates and a source, wherein the drain thereof is coupled to a power supply common;

at least one second diode having an cathode coupled to the cathode of the at least one first diode;

a third resistor coupled between the at least two gates of the second FET; and

a fourth resistor coupled to a one of the at least two gates of second FET and a cathode of the at least one second diode.

2. The ESD protection device according to claim 1 , wherein one of the at least two gates of the first and second FETs are trigger gates and another one of the at least two gates of the first and second FETs are discharge gates.

3. The ESD protection device according to claim 1 , wherein the at least one first and second diodes are two diodes each connected in series between the sources of the first and second FETs.

4. The ESD protection device according to claim 1 , wherein the power supply common is coupled to an electrical ground.

5. The ESD protection device according to claim 1 , wherein the first and second FETs are depletion-mode FETs.

6. The ESD protection device according to claim 5 , wherein the first and second depletion-mode FETs are high-electron-mobility transistors (HEMTs).

7. The ESD protection device according to claim 6 , wherein the HEMTs are selected from the group consisting of pseudomorphic HEMTs (pHEMTs), metamorphic HEMTs (mHEMTs) and induced HEMTs.

8. The ESD protection device according to claim 1 , wherein the first and second FETs, the at least one first and second diodes and the first, second, third and fourth resistors are fabricated on an integrated circuit die and coupled to the circuit node that is coupled to an external connection of the integrated circuit die.

9. The ESD protection device according to claim 8 , wherein a function of the external connection of the integrated circuit die comprises a radio frequency signal input.

10. The ESD protection device according to claim 8 , wherein a function of the external connection of the integrated circuit die comprises a radio frequency signal output.

11. An electrostatic discharge (ESD) protection device, comprising:

a first field effect transistor (FET) having a drain, at least two gates and a source, wherein the drain thereof is coupled to a node of a circuit to be protected from an ESD event;

a first and second in series connected diodes, wherein an anode of the first and second in series connected diodes is coupled to the source of the first FET;

a first resistor coupled between the at least two gates of the first FET; and

a second resistor coupled to a one of the at least two gates and a cathode of the first and second in series connected diodes;

a second field effect transistor (FET) having a drain, at least two gates and a source, wherein the drain thereof is coupled to a power supply common;

a third and fourth in series connected diodes, wherein a cathode of the third and fourth in series connected diodes is coupled to the cathode of the first and second in series connected diodes;

a third resistor coupled between the at least two gates of the second FET; and

a fourth resistor coupled to a one of the at least two gates of second FET and the cathode of the third and fourth in series connected diodes.

12. The ESD protection device according to claim 11 , wherein one of the at least two gates of the first and second FETs are trigger gates and another one of the at least two gates of the first and second FETs are discharge gates.

13. The ESD protection device according to claim 11 , wherein the power supply common is coupled to an electrical ground.

14. The ESD protection device according to claim 11 , wherein the first and second FETs are depletion-mode FETs.

15. The ESD protection device according to claim 14 , wherein the first and second depletion-mode FETs are high-electron-mobility transistors (HEMTs).

16. The ESD protection device according to claim 15 , wherein the HEMTs are selected from the group consisting of pseudomorphic HEMTs (pHEMTs), metamorphic HEMTs (mHEMTs) and induced HEMTs.

17. The ESD protection device according to claim 11 , wherein the first and second FETs, the at least one first and second diodes and the first, second, third and fourth resistors are fabricated on an integrated circuit die and coupled to the circuit node that is coupled to an external connection of the integrated circuit die.

18. The ESD protection device according to claim 17 , wherein a function of the external connection of the integrated circuit die comprises a radio frequency signal input.

19. The ESD protection device according to claim 18 , wherein a function of the external connection of the integrated circuit die comprises a radio frequency signal output.

Assignments (14)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 16, 2025
From: MICROCHIP TECHNOLOGY INC.; MICROCHIP TECHNOLOGY IRELAND LIMITED; MICROSEMI CORPORATION; ATMEL CORPORATION; SILICON STORAGE TECHNOLOGY, INC.; MICROSEMI FREQUENCY AND TIME CORP.; MICROSEMI SEMICONDUCTOR ULC; MICROCHIP TECHNOLOGY GERMANY GMBH
To: CRESTONE IP MANAGEMENT, LLC
Reel/Frame 071991/0419 →
RELEASE OF SECURITY INTEREST Recorded Mar 14, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 060894/0437 →
RELEASE OF SECURITY INTEREST Recorded Mar 11, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059363/0001 →
RELEASE OF SECURITY INTEREST Recorded Mar 10, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059863/0400 →
RELEASE OF SECURITY INTEREST Recorded Mar 9, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059358/0001 →
RELEASE OF SECURITY INTEREST Recorded Feb 25, 2022
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059333/0222 →
SECURITY INTEREST Recorded Jun 4, 2021
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 057935/0474 →
SECURITY INTEREST Recorded Dec 24, 2020
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 055671/0612 →
SECURITY INTEREST Recorded Jun 5, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION
Reel/Frame 053468/0705 →
RELEASE OF SECURITY INTEREST Recorded May 30, 2020
From: JPMORGAN CHASE BANK, N.A, AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 053466/0011 →
SECURITY INTEREST Recorded Apr 24, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 053311/0305 →
SECURITY INTEREST Recorded Sep 18, 2018
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 047103/0206 →
SECURITY INTEREST Recorded Jun 25, 2018
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 046426/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 14, 2017
From: CHOW, DANIEL; ZHU, JING; SCHELL, STEVEN; KOK, YON-LIN
To: MICROCHIP TECHNOLOGY INCORPORATED
Reel/Frame 041256/0615 →
Continuity (3)
Division 14267185 · May 1, 2014
Provisional Application 61819252 · May 3, 2013
Related Publication 20160372459A1 · Dec 22, 2016