Methods of forming nanostructures having low defect density
A method of forming a nanostructure comprises forming self-assembled nucleic acids on at least a portion of a substrate. The method further comprises contacting the self-assembled nucleic acids on the at least a portion of a substrate with a solution comprising at least one repair enzyme to repair defects in the self-assembled nucleic acids. The method may comprise repeating the repair of defects in the self-assembled nucleic acids on the at least a portion of a substrate until a desired, reduced threshold level of defect density is achieved. A semiconductor structure comprises a pattern of self-assembled nucleic acids defining a template having at least one aperture therethrough. At least one of the apertures has a dimension of less than about 50 nm.
1. A method of forming a nanostructure, comprising:
forming a pattern of self-assembled nucleic acids on a substrate;
contacting the pattern of self-assembled nucleic acids with at least one repair enzyme to repair defects in the pattern of self-assembled nucleic acids; and
transferring the repaired pattern of self-assembled nucleic acids to the substrate to form features therein.
2. The method of claim 1 , wherein forming a pattern of self-assembled nucleic acids on a substrate comprises forming a self-assembled multi-stranded nucleic acid structure, a self-assembled scaffolded nucleic acid structure, or a self-assembled single-stranded nucleic acid structure on the substrate.
3. The method of claim 1 , wherein contacting the pattern of self-assembled nucleic acids with at least one repair enzyme comprises reducing a defect density in the pattern of self-assembled nucleic acids.
4. The method of claim 1 , wherein transferring the repaired pattern of self-assembled nucleic acids to the substrate to form features therein comprises forming the features having a lower defect density than the defect density in the pattern of self-assembled nucleic acids.
5. The method of claim 1 , wherein transferring the repaired pattern of self-assembled nucleic acids to the substrate to form features therein comprises forming features having dimensions of less than about 50 nm in the substrate.
6. A method of forming a nanostructure, comprising:
self-assembling nucleic acids on a substrate to form an initial self-assembled nucleic acid pattern;
contacting the initial self-assembled nucleic acid pattern with at least one repair enzyme and repairing defects in the self-assembled nucleic acid pattern; and
transferring the repaired self-assembled nucleic acid pattern to the substrate.
7. The method of claim 6 , wherein self-assembling nucleic acids on a substrate to form an initial self-assembled nucleic acid pattern comprises bonding the self-assembled nucleic acids to the substrate.
8. The method of claim 6 , wherein self-assembling nucleic acids on a substrate to form an initial self-assembled nucleic acid pattern comprises covalently bonding nucleic acids of the self-assembled nucleic acids to the substrate.
9. The method of claim 8 , wherein covalently bonding nucleic acids of the self-assembled nucleic acids to the substrate comprises bonding a primary amine group on the nucleic acids to the substrate.
10. The method of claim 8 , wherein covalently bonding nucleic acids of the self-assembled nucleic acids to the substrate comprises bonding an amine derivatized with a thiolation reagent on the nucleic acids to the substrate.
11. The method of claim 6 , wherein self-assembling nucleic acids on a substrate to form an initial self-assembled nucleic acid pattern comprises forming ionic attractions between the self-assembled nucleic acids and the substrate.
12. A method of forming a nanostructure, comprising:
forming a pattern of self-assembled nucleic acids on a substrate;
contacting the pattern of self-assembled nucleic acids with at least one repair enzyme and repairing defects in the pattern of self-assembled nucleic acids; and
transferring the pattern of self-assembled nucleic acids to the substrate and forming a modified substrate, the modified substrate having a lower defect level than the pattern of self-assembled nucleic acids.
13. The method of claim 12 , wherein contacting the pattern of self-assembled nucleic acids with at least one repair enzyme and repairing defects in the pattern of self-assembled nucleic acids comprises excising at least one base from the pattern of self-assembled nucleic acids.
14. The method of claim 12 , wherein contacting the pattern of self-assembled nucleic acids with at least one repair enzyme and repairing defects in the pattern of self-assembled nucleic acids comprises repairing a defect in two divalent metal ion binding sites in the pattern of self-assembled nucleic acids.
15. The method of claim 12 , wherein contacting the pattern of self-assembled nucleic acids with at least one repair enzyme and repairing defects in the pattern of self-assembled nucleic acids comprises repairing a defect in a single divalent metal ion binding site in the pattern of self-assembled nucleic acids.
16. The method of claim 12 , wherein transferring the pattern of self-assembled nucleic acids to the substrate comprises forming a corresponding pattern in the substrate, the corresponding pattern in the substrate comprising at least one dimension less than about 50 nm.
17. The method of claim 16 , further comprising forming nanocomponents in the corresponding pattern in the substrate.
18. The method of claim 17 , wherein forming nanocomponents in the corresponding pattern in the substrate comprises forming silicon nanowires, gold nanoparticles, semiconductive quantum dots, or fluorescent quantum dots in the substrate.