Semiconductor device
A transistor includes oxide semiconductor stacked layers between a first gate electrode layer and a second gate electrode layer through an insulating layer interposed between the first gate electrode layer and the oxide semiconductor stacked layers and an insulating layer interposed between the second gate electrode layer and the oxide semiconductor stacked layers. The thickness of a channel formation region is smaller than the other regions in the oxide semiconductor stacked layers. Further in this transistor, one of the gate electrode layers is provided as what is called a back gate for controlling the threshold voltage. Controlling the potential applied to the back gate enables control of the threshold voltage of the transistor, which makes it easy to maintain the normally-off characteristics of the transistor.
1. A semiconductor device comprising:
a first conductive layer over an insulating surface;
a first insulating layer over the first conductive layer;
oxide semiconductor stacked lavers comprising a first oxide semiconductor layer and a second oxide semiconductor layer, the oxide semiconductor stacked layers comprise a region overlapping with the first conductive layer with the first insulating layer interposed therebetween;
a second conductive layer and a third conductive layer, each of which comprises a region over and in contact with the second oxide semiconductor layer;
a second insulating layer comprising a region in direct contact with the oxide semiconductor stacked layers and positioned over the oxide semiconductor stacked layers, the second conductive layer and the third conductive layer; and
a fourth conductive layer comprising a region overlapping with the oxide semiconductor stacked layers with the second insulating layer interposed therebetween,
wherein the second semiconductor layer is provided over the first oxide semiconductor layer,
wherein the first oxide semiconductor layer comprises a region in direct contact with the first insulating layer,
wherein each of the first oxide semiconductor layer and the second oxide semiconductor layer comprises at least indium and gallium,
wherein an indium content in the first oxide semiconductor layer is higher than a gallium content,
wherein an indium content in the second oxide semiconductor layer is lower than a gallium content,
wherein the first oxide semiconductor layer comprises a microcrystal,
wherein the second oxide semiconductor layer comprises a c-axis aligned crystal part,
wherein the first conductive layer comprises molybdenum, titanium, tantalum, tungsten, aluminum, copper, chromium, neodymium, or scandium, and
wherein the fourth conductive layer comprises indium oxide-tin oxide, indium oxide containing tungsten oxide, indium zinc oxide containing tungsten oxide, indium oxide containing titanium oxide, indium oxide-zinc oxide, or indium tin oxide to which silicon oxide is added.
2. A semiconductor device comprising:
a first conductive layer over an insulating surface;
a first insulating layer over the first conductive layer;
oxide semiconductor stacked layers comprising a first oxide semiconductor layer and a second oxide semiconductor layer, the oxide semiconductor stacked layers comprise a region overlapping with the first conductive layer with the first insulating layer interposed therebetween;
a second conductive layer and a third conductive layer, each of which comprises a region over and in contact with the second oxide semiconductor layer;
a second insulating layer comprising a region in direct contact with the oxide semiconductor stacked layers and positioned over the oxide semiconductor stacked layers, the second conductive layer and the third conductive layer; and
a fourth conductive layer comprising a region overlapping with the oxide semiconductor stacked layers with the second insulating layer interposed therebetween,
wherein the second semiconductor layer is provided over the first oxide semiconductor layer,
wherein the first oxide semiconductor layer comprises a region in direct contact with the first insulating layer,
wherein each of the first oxide semiconductor layer and the second oxide semiconductor layer comprises at least indium and gallium,
wherein an indium content in the first oxide semiconductor layer is higher than a gallium content,
wherein the first oxide semiconductor layer comprises a microcrystal,
wherein the second oxide semiconductor layer comprises a c-axis aligned crystal part,
wherein the first conductive layer comprises molybdenum, titanium, tantalum, tungsten, aluminum, copper, chromium, neodymium, or scandium, and
wherein the fourth conductive layer comprises indium oxide-tin oxide, indium oxide containing tungsten oxide, indium zinc oxide containing tungsten oxide, indium oxide containing titanium oxide, indium oxide-zinc oxide, or indium tin oxide to which silicon oxide is added.
3. A semiconductor device comprising:
a first conductive layer over an insulating surface;
a first insulating layer over the first conductive layer;
oxide semiconductor stacked layers comprising a first oxide semiconductor layer and a second oxide semiconductor layer, the oxide semiconductor stacked layers comprise a region overlapping with the first conductive layer with the first insulating layer interposed therebetween;
a second conductive layer and a third conductive layer, each of which comprises a region over and in contact with the second oxide semiconductor layer;
a second insulating layer comprising a region in direct contact with the oxide semiconductor stacked layers and positioned over the oxide semiconductor stacked layers, the second conductive layer and the third conductive layer; and
a fourth conductive layer comprising a region overlapping with the oxide semiconductor stacked layers with the second insulating layer interposed therebetween,
wherein the second semiconductor layer is provided over the first oxide semiconductor layer,
wherein the first oxide semiconductor layer comprises a region in direct contact with the first insulating layer,
wherein each of the first oxide semiconductor layer and the second oxide semiconductor layer comprises at least indium and gallium,
wherein an indium content in the second oxide semiconductor layer is lower than a gallium content,
wherein the first oxide semiconductor layer comprises a microcrystal,
wherein the second oxide semiconductor layer comprises a c-axis aligned crystal part,
wherein the first conductive layer comprises molybdenum, titanium, tantalum, tungsten, aluminum, copper, chromium, neodymium, or scandium, and
wherein the fourth conductive layer comprises indium oxide-tin oxide, indium oxide containing tungsten oxide, indium zinc oxide containing tungsten oxide, indium oxide containing titanium oxide, indium oxide-zinc oxide, or indium tin oxide to which silicon oxide is added.