IP Library Granted Patent US 10,720,458
Granted Patent B2
US 10,720,458 · App. 16/204,194 · Granted Jul 21, 2020

Solid-state imaging device, method of manufacturing solid-state imaging device, and electronic apparatus

Inventor: Hiroaki Ishiwata (Tokyo, JP)
Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
H01L27/14612H01L27/14603H01L27/14605H01L27/14621H01L27/14627H01L27/14641H01L27/14645H01L27/14685H04N5/2253H04N5/2254H04N5/347H04N5/357H04N5/3696H04N5/3745H04N5/37457H04N9/045
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Quick Facts
Patent No.
US 10,720,458
App. No.
16/204,194
Granted
Jul 21, 2020
Kind
B2
Abstract

A solid-state imaging device including an imaging area where a plurality of unit pixels are disposed to capture a color image, wherein each of the unit pixels includes: a plurality of photoelectric conversion portions; a plurality of transfer gates, each of which is disposed in each of the photoelectric conversion portions to transfer signal charges from the photoelectric conversion portion; and a floating diffusion to which the signal charges are transferred from the plurality of the photoelectric conversion portions by the plurality of the transfer gates, wherein the plurality of the photoelectric conversion portions receive light of the same color to generate the signal charges, and wherein the signal charges transferred from the plurality of the photoelectric conversion portions to the floating diffusion are added to be output as an electrical signal.

Claims (43)

1. An imaging device, comprising a unit pixel which unit pixel comprises:

a first photoelectric conversion region;

a first transfer transistor coupled to the first photoelectric conversion region;

a first floating diffusion coupled to the first transfer transistor;

a second photoelectric conversion region disposed adjacent to the first photoelectric conversion region;

a second transfer transistor coupled to the second photoelectric conversion region;

a second floating diffusion coupled to the second transfer transistor;

a first wiring coupled to the first floating diffusion and the second floating diffusion;

a first amplification transistor with a first gate coupled to the first wiring; and

a first color filter disposed above the first photoelectric conversion region and the second photoelectric conversion region.

2. The imaging device according to claim 1 , wherein the first photoelectric conversion region and the second photoelectric conversion region are configured to receive light filtered to a first spectrum.

3. The imaging device according to claim 1 , wherein the first photoelectric conversion region and the second photoelectric conversion region are configured to receive light transmitted through the first color filter.

4. The imaging device according to claim 1 , wherein the first color filter bandpasses red light.

5. The imaging device according to claim 1 , wherein the first color filter bandpasses green light.

6. The imaging device according to claim 1 , wherein the first color filter bandpasses blue light.

7. The imaging device according to claim 1 , wherein the first floating diffusion and the second floating diffusion are disposed in a semiconductor substrate.

8. The imaging device according to claim 1 , wherein the unit pixel further comprises a first micro lens disposed above the first photoelectric conversion region and a second micro lens disposed above the second photoelectric conversion region.

9. The imaging device according to claim 8 , wherein the first micro lens is configured to focus incident light on the first photoelectric conversion region and the second micro lens is configured to focus incident light on the second photoelectric conversion region.

10. The imaging device according to claim 1 , wherein the first transfer transistor is coupled to a first input signal line and the second transfer transistor is coupled to a second input signal line different from the first input signal line.

11. The imaging device according to claim 1 , wherein the unit pixel further comprises a first selection transistor coupled to the first amplification transistor, and wherein the first selection transistor is coupled to a first signal line.

12. The imaging device according to claim 11 , wherein the first floating diffusion and the first amplification transistor are disposed along a first line that extends parallel to the first signal line.

13. The imaging device according to claim 11 , wherein the first floating diffusion and the first amplification transistor are disposed along a first line and the first amplification transistor and the first selection transistor are disposed along a second line that extends perpendicular to the first line.

14. The imaging device according to claim 1 , wherein:

(a) the unit pixel further comprises:

a third photoelectric conversion region,

a third transfer transistor coupled to the third photoelectric conversion region,

a third floating diffusion coupled to the third transfer transistor,

a fourth photoelectric conversion region disposed adjacent to the third photoelectric conversion region,

a fourth transfer transistor coupled to the fourth photoelectric conversion region,

a fourth floating diffusion coupled to the fourth transfer transistor,

a second wiring coupled to the third floating diffusion and the fourth floating diffusion, and

a second amplification transistor with a second gate coupled to the second wiring; and

(b) the first color filer is disposed above the third photoelectric conversion region and the fourth photoelectric conversion region.

15. The imaging device according to claim 14 , wherein the first, second, third, and fourth photoelectric conversion regions are disposed in a 2-by-2 matrix arrangement.

16. The imaging device according to claim 14 , wherein the first photoelectric conversion region is disposed adjacent to the third photoelectric conversion region and the second photoelectric conversion region is disposed adjacent to the fourth photoelectric conversion region.

17. The imaging device according to claim 14 , wherein the unit pixel further comprises a first selection transistor coupled to the first amplification transistor and a second selection transistor coupled to the second amplification transistor, the first selection transistor being coupled to a first signal line and the second selection transistor being coupled to a second signal line.

18. The imaging device according to claim 17 , wherein the first signal line is disposed between the first photoelectric conversion region and the fourth photoelectric conversion region, and the first signal line is disposed between the second photoelectric conversion region and the third photoelectric conversion region.

19. The imaging device according to claim 17 , wherein two of the first, second, third, and fourth photoelectric conversion regions are disposed between the first signal line and the second signal line.

20. An electronic apparatus, comprising:

an imaging device according to claim 1 ;

an optical system;

a signal processing circuit; and

a controller.

Priority Claims (1)
JP 2010-107265 · May 7, 2010 · national
Continuity (7)
Continuation 16031345 · Jul 10, 2018
Continuation 15894542 · Feb 12, 2018
Continuation 15465084 · Mar 21, 2017
Continuation 15156564 · May 17, 2016
Continuation 14495318 · Sep 24, 2014
Continuation 13085676 · Apr 13, 2011
Related Publication 20190096936A1 · Mar 28, 2019