Transistor and display device
It is an object to manufacture a highly reliable display device using a thin film transistor having favorable electric characteristics and high reliability as a switching element. In a bottom gate thin film transistor including an amorphous oxide semiconductor, an oxide conductive layer having a crystal region is formed between an oxide semiconductor layer which has been dehydrated or dehydrogenated by heat treatment and each of a source electrode layer and a drain electrode layer which are formed using a metal material. Accordingly, contact resistance between the oxide semiconductor layer and each of the source electrode layer and the drain electrode layer can be reduced; thus, a thin film transistor having favorable electric characteristics and a highly reliable display device using the thin film transistor can be provided.
1. A display device comprising a pixel, the pixel comprising:
a transistor comprising:
a gate electrode layer;
a first insulating layer over the gate electrode layer;
an oxide semiconductor layer over the first insulating layer, the oxide semiconductor layer comprising indium, gallium, and zinc;
a second insulating layer over the oxide semiconductor layer, the second insulating layer being in contact with a top surface and a side surface of a peripheral portion of the oxide semiconductor layer; and
a source electrode layer and a drain electrode layer over the second insulating layer, the source electrode layer and the drain electrode layer being electrically connected to the oxide semiconductor layer;
a third insulating layer over and in contact with a top surface of the oxide semiconductor layer, the third insulating layer overlapping with a channel formation region of the transistor;
a capacitor; and
a light-emitting element electrically connected to the transistor, the light-emitting element comprising:
a first electrode;
an EL layer over the first electrode; and
a second electrode over the EL layer,
wherein the second insulating layer is different from the third insulating layer, and
wherein the second insulating layer comprises a region overlapping with the capacitor.
2. The display device according to claim 1 ,
wherein the oxide semiconductor layer comprises a first region and a second region,
wherein the channel formation region is between the first region and the second region, and
wherein a carrier concentration of the first region is higher than a carrier concentration of the channel formation region.
3. A display device comprising a pixel, the pixel comprising:
a transistor comprising:
a gate electrode layer over and in direct contact with an insulating surface;
a first insulating layer over the gate electrode layer;
an oxide semiconductor layer over the first insulating layer, the oxide semiconductor layer comprising indium, gallium, and zinc;
a second insulating layer over the oxide semiconductor layer, the second insulating layer being in contact with a top surface and a side surface of a peripheral portion of the oxide semiconductor layer; and
a source electrode layer and a drain electrode layer over the second insulating layer, the source electrode layer and the drain electrode layer being electrically connected to the oxide semiconductor layer;
a third insulating layer over and in contact with a top surface of the oxide semiconductor layer, the third insulating layer overlapping with a channel formation region of the transistor;
a capacitor; and
a light-emitting element electrically connected to the transistor, the light-emitting element comprising:
a first electrode;
an EL layer over the first electrode; and
a second electrode over the EL layer,
wherein the second insulating layer is different from the third insulating layer,
wherein the second insulating layer comprises a region overlapping with the capacitor,
wherein one electrode of the capacitor is provided over and in direct contact with the insulating surface, and
wherein the one electrode of the capacitor comprises the same material as the gate electrode layer.
4. The display device according to claim 3 ,
wherein the oxide semiconductor layer comprises a first region and a second region,
wherein the channel formation region is between the first region and the second region, and
wherein a carrier concentration of the first region is higher than a carrier concentration of the channel formation region.
5. A display device comprising a pixel, the pixel comprising:
a transistor comprising:
a gate electrode layer;
a first insulating layer over the gate electrode layer;
an oxide semiconductor layer over the first insulating layer, the oxide semiconductor layer comprising indium, gallium, and zinc;
a second insulating layer over the oxide semiconductor layer, the second insulating layer being in contact with a top surface and a side surface of the oxide semiconductor layer; and
a source electrode layer and a drain electrode layer electrically connected to the oxide semiconductor layer;
a third insulating layer over and in contact with a top surface of the oxide semiconductor layer, the third insulating layer overlapping with a channel formation region of the transistor;
a capacitor; and
a light-emitting element electrically connected to the transistor, the light-emitting element comprising:
a first electrode;
an EL layer over the first electrode; and
a second electrode over the EL layer,
wherein at least one of the source electrode layer and the drain electrode layer is provided over the second insulating layer,
wherein the second insulating layer is different from the third insulating layer, and
wherein the first insulating layer comprises a region overlapping with the capacitor.
6. The display device according to claim 5 ,
wherein the oxide semiconductor layer comprises a first region and a second region,
wherein the channel formation region is between the first region and the second region, and
wherein a carrier concentration of the first region is higher than a carrier concentration of the channel formation region.
7. A display device comprising a pixel, the pixel comprising:
a transistor comprising:
a gate electrode layer over and in direct contact with an insulating surface;
a first insulating layer over the gate electrode layer;
an oxide semiconductor layer over the first insulating layer, the oxide semiconductor layer comprising indium, gallium, and zinc;
a second insulating layer over the oxide semiconductor layer, the second insulating layer being in contact with a top surface and a side surface of the oxide semiconductor layer; and
a source electrode layer and a drain electrode layer electrically connected to the oxide semiconductor layer;
a third insulating layer over and in contact with a top surface of the oxide semiconductor layer, the third insulating layer overlapping with a channel formation region of the transistor;
a capacitor; and
a light-emitting element electrically connected to the transistor, the light-emitting element comprising:
a first electrode;
an EL layer over the first electrode; and
a second electrode over the EL layer,
wherein at least one of the source electrode layer and the drain electrode layer is provided over the second insulating layer,
wherein the second insulating layer is different from the third insulating layer,
wherein the first insulating layer comprises a region overlapping with the capacitor,
wherein one electrode of the capacitor is provided over and in direct contact with the insulating surface, and
wherein the one electrode of the capacitor comprises the same material as the gate electrode layer.
8. The display device according to claim 7 ,
wherein the oxide semiconductor layer comprises a first region and a second region,
wherein the channel formation region is between the first region and the second region, and
wherein a carrier concentration of the first region is higher than a carrier concentration of the channel formation region.