Semiconductor structure containing multilayer bonding pads and methods of forming the same
A bonded assembly includes a first semiconductor die that includes first semiconductor devices, and a first pad-level dielectric layer and embedding first bonding pads; and a second semiconductor die that includes second semiconductor devices, and a second pad-level dielectric layer embedding second bonding pads that includes a respective second pad base portion. Each of the first bonding pads includes a respective first pad base portion and a respective first metal alloy material portion having a higher coefficient of thermal expansion (CTE) than the respective first pad base portion. Each of the second bonding pads is bonded to a respective one of the first bonding pads.
1. A bonded assembly comprising:
a first semiconductor die that comprises first semiconductor devices, and a first pad-level dielectric layer embedding first bonding pads; and
a second semiconductor die that comprises second semiconductor devices, and a second pad-level dielectric layer embedding second bonding pads that includes a respective second pad base portion,
wherein each of the first bonding pads comprises a respective first pad base portion and a respective first material portion comprising a different material than the first pad base portion, and wherein each of the second bonding pads is bonded to a respective one of the first bonding pads.
2. The bonded assembly of claim 1 , wherein:
each first pad base portion includes copper at an atomic percentage greater than 95%; and
the first material portion comprises a first metal alloy material portion having a higher coefficient of thermal expansion (CTE) than the respective first pad base portion.
3. The bonded assembly of claim 2 , wherein the first metal alloy material portion comprises copper silicide, copper germanide, or copper germanide-silicide.
4. The bonded assembly of claim 2 , wherein the first metal alloy material portion comprises an intermetallic copper based alloy material that includes greater than 50 atomic percent copper and less than 50 atomic percent of another metal selected from at least one of aluminum, zinc, iron or tin.
5. The bonded assembly of claim 2 , wherein:
the second pad base portions include copper at an atomic percentage greater than 95%; and
each of the second bonding pads further comprises a second metal alloy material portion having a higher coefficient of thermal expansion (CTE) than the second pad base portions.
6. The bonded assembly of claim 5 , wherein:
the first metal alloy material portions comprise a first metal-semiconductor alloy material;
the second metal alloy material portions comprise a second metal-semiconductor alloy material; and
the first metal alloy material portions are bonded to a respective one of the second metal alloy material portions.
7. The bonded assembly of claim 5 , wherein:
the first metal alloy material portions comprise a first intermetallic alloy material;
the second metal alloy material portions comprise a second intermetallic alloy material; and
the first metal alloy material portions are bonded to a respective one of the second metal alloy material portions.
8. The bonded assembly of claim 2 , wherein the second pad base portions include copper at an atomic percentage greater than 95%, and are bonded directly to a respective one of the first metal alloy material portions.
9. The bonded assembly of claim 2 , wherein the first pad-level dielectric layer comprises a layer stack that includes:
a proximal pad-level dielectric layer laterally surrounding the first pad base portions; and
a distal pad-level dielectric layer laterally surrounding the first metal alloy material portions.
10. The bonded assembly of claim 2 , wherein each of the first metal alloy material portions comprises a convex surface that contacts a concave surface of a respective one of the first pad base portions.
11. The bonded assembly of claim 10 , wherein each of the second bonding pads further comprises a respective second metal alloy material portion having a higher coefficient of thermal expansion (CTE) than the second pad base portion.
12. The bonded assembly of claim 10 , wherein within each of the second bonding pads, a concave surface of the respective second pad base portion contacts a convex surface of the respective second metal alloy material portion.
13. The bonded assembly of claim 10 , wherein each of the first metal alloy material portions comprises an additional convex surface that contacts a concave surface of a respective one of the second bonding pads.
14. A method of forming a bonded assembly, comprising:
providing a first semiconductor die that comprises first semiconductor devices located over a first substrate, and a first pad-level dielectric layer and embedding first bonding pads;
providing a second semiconductor die that comprises second semiconductor devices located over a second substrate, and a second pad-level dielectric layer embedding second bonding pads that include respective second pad base portions; and
forming a bonded assembly by bonding the second bonding pads to the respective first bonding pads, wherein each of the first bonding pads comprises a respective first pad base portion and a respective first metal alloy material portion having a higher coefficient of thermal expansion (CTE) than the respective first pad base portion.
15. The method of claim 14 , wherein:
the first pad base portion includes copper at an atomic percentage greater than 95%; and
the first metal alloy material portions comprise copper silicide, copper germanide, or copper germanide-silicide.
16. The method of claim 15 , further comprising:
depositing a semiconductor layer comprising a silicon layer, a germanium layer or a silicon-germanium layer on the first pad base portions; and
annealing the first semiconductor die and the second semiconductor die to react the semiconductor layer with the first pad base portions to form the first metal alloy material portions and to bond the second bonding pads to the respective first bonding pads.
17. The method of claim 14 , wherein the first metal alloy material portions comprise an intermetallic copper-based alloy material that includes greater than 50 atomic percent copper and less than 50 atomic percent of another metal selected from at least one of aluminum, zinc, iron or tin.
18. The method of claim 14 , wherein:
the first pad base portions include copper at an atomic percentage greater than 95%; and
the first metal alloy material portions comprise a first metal-semiconductor alloy material or a first intermetallic alloy material.
19. The method of claim 18 , wherein:
the second pad base portions include copper at an atomic percentage greater than 95%; and
the second metal alloy material portions comprise a second metal-semiconductor alloy material or a second intermetallic alloy material that has a higher coefficient of thermal expansion (CTE) than the second pad base portions.
20. The method of claim 14 , further comprising:
forming a proximal pad-level dielectric layer over the first substrate;
forming the first pad base portions in the proximal pad-level dielectric layer; and
forming the first metal alloy material portions on a respective one of the first pad base portions.