Organic thin film transistor and method for producing same
An organic thin film transistor (OTFT), in particular thin-film field-effect transistor (OFET), that includes a substrate, a source electrode, a drain electrode, a gate electrode arranged in a top gate arrangement, and an organic semiconductor functional layer. The source electrode, the drain electrode, and the gate electrode are arranged in a coplanar layer structure. The organic thin-film transistor has an intermediate layer for the capacitive decoupling of the gate electrode from the source electrode and/or from the drain electrode.
1. An organic thin film transistor comprising:
a substrate, a source electrode, a drain electrode, a gate electrode arranged in a top gate arrangement, and an organic semiconductor functional layer, wherein the source electrode, the drain electrode, and the gate electrode are all arranged in a coplanar layer structure on one side of the organic semiconductor functional layer, and
wherein the organic thin film transistor comprises an intermediate layer configured for capacitive decoupling of the gate electrode from the source electrode and/or from the drain electrode, and the intermediate layer is arranged on the gate electrode and extends between the gate electrode and both of the drain electrode and the source electrode, which extend partly over the intermediate layer or the gate electrode,
wherein the intermediate layer comprises a thickness in a range of 500 nm to 5 μm,
wherein each of the source electrode and the drain electrode have a Z-shaped cross section, and
wherein the intermediate layer is arranged above the gate electrode and is embodied without an interruption.
2. The organic thin film transistor according to claim 1 , wherein the organic semiconductor functional layer is arranged between the gate electrode and the substrate.
3. The organic thin film transistor according to claim 1 , wherein the intermediate layer, perpendicular to a main plane of extent of the substrate, at least partly overlaps both the drain electrode and the source electrode in a direction perpendicular to a main plane of extension of the substrate.
4. The organic thin film transistor according to claim 1 , wherein the drain electrode or the source electrode extends over the gate electrode.
5. The organic thin film transistor according to claim 1 , wherein the organic thin film transistor comprises a gate insulation layer between the gate electrode and the organic semiconductor functional layer, and wherein the drain electrode and/or the source electrode extend over the gate insulation layer.
6. The organic thin film transistor according to claim 1 , wherein the drain electrode and/or the source electrode contact the gate insulation layer.
7. The organic thin film transistor according to claim 1 , wherein the source electrode is a mirror image of the drain electrode.
8. The organic thin film transistor according to claim 1 , wherein the organic thin film transistor comprises a gate insulation layer, and each of the source electrode and the drain electrode are directly above the intermediate layer, the gate electrode, and the gate insulation layer.
9. The organic thin film transistor according to claim 8 , wherein at least part of the source electrode and at least part of the drain electrode are arranged directly above the organic semiconductor functional layer.
10. The organic thin film transistor according to claim 1 , wherein the drain electrode and the source electrode both extend over the gate electrode.
11. The organic thin film transistor according to claim 10 , wherein the intermediate layer is a single layer.
12. The organic thin film transistor according to claim 11 , wherein a thickness of the single intermediate layer is greater than a thickness of the gate electrode.
13. The organic thin film transistor according to claim 11 , wherein the intermediate layer is free from contacting the organic semiconductor functional layer.
14. The organic thin film transistor according to claim 1 , wherein the Z-shaped cross section of each of the source electrode and the drain electrode is defined by a first substantially horizontal portion, a substantially vertical portion, and a second substantially horizontal portion,
wherein the first substantially horizontal portion extends partially along a top surface of the organic semiconductor functional layer, a first end of the substantially vertical portion extends from the first substantially horizontal portion, and the second substantially horizontal portion extends from an opposing second end of the substantially vertical portion, the second substantially horizontal portion extends partially along a top surface of the intermediate layer.
15. The organic thin film transistor according to claim 14 , wherein the source electrode is a mirror image of the drain electrode.
16. A display comprising a multiplicity of pixels, wherein at least one pixel comprises the organic thin film transistor according to claim 1 .
17. A method for producing the organic thin film transistor according to claim 1 , wherein:
in a first production step, an organic semiconductor material is deposited on the substrate for forming the organic semiconductor functional layer,
in a second production step, a first metal layer is arranged on the organic semiconductor material,
in a third production step, the first metal layer is structured for forming at least one first electrode,
in a fourth production step, a second metal layer is deposited,
in a fifth production step, the second metal layer is structured for forming at least one second electrode.
18. The method according to claim 17 , wherein an intermediate step is carried out between the second production step and the fourth production step or between the third production step and the fourth production step.
19. The method according to claim 18 , wherein the intermediate step comprises applying photoresist in the third production step, and the photoresist remains contained in the layer structure as an intermediate layer for capacitive decoupling in a region of the at least one first electrode.
20. The method according to claim 18 , wherein the intermediate step comprises applying photoresist in the third production step and the photoresist remains contained in the layer structure as an intermediate layer for capacitive decoupling in the region of the source and drain electrodes.