IP Library Granted Patent US 12,401,010
Granted Patent B2
US 12,401,010 · App. 17/474,917 · Granted Aug 26, 2025

3D processor having stacked integrated circuit die

Inventors: Steven L. Teig (Menlo Park, CA); Ilyas Mohammed (Santa Clara, CA); Kenneth Duong (San Jose, CA); Javier DeLaCruz (San Jose, CA)
Assignee: Adeia Semiconductor Inc.
H01L25/18H01L24/92H01L25/0657H01L24/03H01L24/08H01L24/11H01L24/16H01L24/32H01L24/80H01L25/043H01L25/074H01L25/0756H01L25/105H01L25/117H01L25/16H01L2224/08145H01L2224/16145H01L2224/16225H01L2224/17181H01L2224/32145H01L2224/80895H01L2224/80896H01L2224/9202H01L2225/06503H01L2225/06548H10B41/20H10B51/20H10B53/20H10B63/84H10D88/00H10K19/201
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,401,010
App. No.
17/474,917
Granted
Aug 26, 2025
Kind
B2
Abstract

Some embodiments of the invention provide a three-dimensional (3D) circuit that is formed by vertically stacking two or more integrated circuit (IC) dies to at least partially overlap. In this arrangement, several circuit blocks defined on each die (1) overlap with other circuit blocks defined on one or more other dies, and (2) electrically connect to these other circuit blocks through connections that cross one or more bonding layers that bond one or more pairs of dies. In some embodiments, the overlapping, connected circuit block pairs include pairs of computation blocks and pairs of computation and memory blocks. The connections that cross bonding layers to electrically connect circuit blocks on different dies are referred to below as z-axis wiring or connections. This is because these connections traverse completely or mostly in the z-axis of the 3D circuit, with the x-y axes of the 3D circuit defining the planar surface of the IC die substrate or interconnect layers. These connections are also referred to as vertical connections to differentiate them from the horizontal planar connections along the interconnect layers of the IC dies.

Claims (51)

1. A three dimensional (3D) processor circuit, comprising:

a first integrated circuit (IC) die comprising a first processor core; and

a second IC die vertically mounted on the first IC die, the second IC die comprising a first cache for the first processor core,

wherein the first cache vertically overlaps with at least a portion of the first processor core at an overlapping area, and

wherein the first IC die is communicatively coupled with the second IC die through a hybrid bond comprising a plurality of directly bonded metal contact pads and directly bonded non-conductive regions, and

wherein the first processor core is electrically connected to the first cache through at least one of the plurality of directly bonded metal contact pads disposed within the overlapping area.

2. The 3D processor circuit of claim 1 , further comprising a plurality of z-axis connections between the first processor core and the first cache.

3. The 3D processor circuit of claim 2 , wherein the plurality of z-axis connections comprises a z-axis bus, the z-axis bus being wholly defined within the overlapping area.

4. The 3D processor circuit of claim 2 , wherein at least two of the plurality of z-axis connections have a center-to-center pitch that is less than 5 microns.

5. The 3D processor circuit of claim 2 , wherein the plurality of z-axis connections comprises interconnect layers interconnecting the first processor core and the first cache through the hybrid bond.

6. The 3D processor circuit of claim 1 , wherein the first IC die and the second IC die are face-to-face mounted.

7. The 3D processor circuit of claim 1 , wherein:

the second IC die further comprises a second processor core;

the first IC die further comprises a second cache;

the second cache is for the second processor core; and

the second processor core vertically overlaps with the second cache.

8. The 3D processor circuit of claim 1 , wherein the first cache is an L1 cache.

9. The 3D processor circuit of claim 8 , wherein the first cache completely overlaps the first processor core.

10. The 3D processor circuit of claim 8 , further comprising a second cache on the first IC die for the first processor core.

11. The 3D processor circuit of claim 10 , wherein the second cache is an L2 cache.

12. The 3D processor circuit of claim 1 , wherein the 3D processor circuit excludes an L3 cache.

13. The 3D processor circuit of claim 1 , wherein the 3D processor circuit is a graphical processing unit.

14. The 3D processor circuit of claim 1 , wherein the 3D processor circuit is a central processing unit.

15. An electronic device, comprising: a three-dimensional (3D) processor circuit, comprising:

a first integrated circuit (IC) die comprising a first processor core;

a second IC die vertically mounted on the first IC die, the second IC die comprising a first cache for the first processor core,

wherein the first IC die is communicatively coupled with the second IC die through a hybrid bond comprising a plurality of directly bonded metal contact pads and directly bonded non-conductive regions,

wherein the first cache vertically overlaps with at least a portion of the first processor core at an overlapping area, and

wherein the first processor core is electrically connected to the first cache through at least one of the plurality of directly bonded metal contact pads disposed within the overlapping area; and

a board on which the 3D processor circuit is mounted.

16. The electronic device of claim 15 , further comprising a plurality of z-axis connections between the first processor core and the first cache.

17. The electronic device of claim 16 , wherein the plurality of z-axis connections comprises a z-axis bus, the z-axis bus being wholly defined within the overlapping area.

18. The 3D processor circuit of claim 16 , wherein the plurality of z-axis connections comprises interconnect layers interconnecting the first processor core and the first cache through the hybrid bond.

19. The electronic device of claim 15 , wherein the first IC die and the second IC die are face-to-face mounted.

20. The electronic device of claim 15 , wherein:

the second IC die further comprises a second processor core;

the first IC die further comprises a second cache;

the second cache is for the second processor core; and

the second processor core vertically overlaps with at least a portion of the second cache.

21. A three dimensional (3D) processor circuit, comprising:

a first integrated circuit (IC) die comprising a processor core;

a second IC die vertically stacked on the first IC die, the second IC die comprising a cache for the processor core; and

interconnect layers interconnecting the first IC die and the second IC die through a hybrid bond comprising a plurality of directly bonded metal contact pads and directly bonded non-conductive regions,

wherein the processor core is electrically connected to the cache through at least one of the plurality of directly bonded metal contact pads disposed within an area defined by overlapping circuit blocks on the first and second IC dies.

22. The 3D processor circuit of claim 21 , wherein the cache is a first cache and the first IC die further comprises a second cache.

23. The 3D processor circuit of claim 21 , wherein adjacent metal contact pads have a pitch between 0.5 μm and 15 μm.

24. The 3D processor circuit of claim 21 , wherein the first IC die and the second IC die are face-to-back mounted.

25. The 3D processor circuit of claim 21 , wherein:

at least one of the first IC die and the second IC die comprises through silicon vias (TSVs); and

a signal path communicatively coupling the processor core and the cache further comprises at least one of the TSVs.

26. The 3D processor circuit of claim 21 , wherein the overlapping circuit blocks comprise a first circuit block comprising at least a portion of the processor core and a second circuit block comprising at least a portion of the cache.

Assignments (4)
CHANGE OF NAME Recorded Sep 23, 2024
From: XCELSIS CORPORATION
To: ADEIA SEMICONDUCTOR INC.
Reel/Frame 069015/0766 →
CHANGE OF NAME Recorded Sep 10, 2024
From: XCELSIS CORPORATION
To: ADEIA SEMICONDUCTOR INC.
Reel/Frame 068922/0628 →
SECURITY INTEREST Recorded May 3, 2023
From: ADEIA GUIDES INC.; ADEIA IMAGING LLC; ADEIA MEDIA HOLDINGS LLC; ADEIA MEDIA SOLUTIONS INC.; ADEIA SEMICONDUCTOR ADVANCED TECHNOLOGIES INC.; ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC.; ADEIA SEMICONDUCTOR INC.; ADEIA SEMICONDUCTOR SOLUTIONS LLC; ADEIA SEMICONDUCTOR TECHNOLOGIES LLC; ADEIA SOLUTIONS LLC
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 063529/0272 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 17, 2021
From: TEIG, STEVEN L.; MOHAMMED, ILYAS; DUONG, KENNETH; DELACRUZ, JAVIER
To: XCELSIS CORPORATION
Reel/Frame 057511/0531 →
Continuity (19)
Continuation 16833341 · Mar 27, 2020
Continuation 16159705 · Oct 14, 2018
Continuation In Part 15976809 · May 10, 2018
Continuation In Part 15859546 · Dec 31, 2017
Continuation In Part 15859546 · Dec 31, 2017
Continuation In Part 15859551 · Dec 31, 2017
Continuation In Part 15859548 · Dec 31, 2017
Continuation In Part 15859612 · Dec 31, 2017
Continuation In Part 15725030 · Oct 4, 2017
Continuation In Part 15725030 · Oct 4, 2017
Provisional Application 62678246 · May 30, 2018
Provisional Application 62619910 · Jan 21, 2018
Provisional Application 62575221 · Oct 20, 2017
Provisional Application 62575259 · Oct 20, 2017
Provisional Application 62575184 · Oct 20, 2017
Provisional Application 62575240 · Oct 20, 2017
Provisional Application 62541064 · Aug 3, 2017
Provisional Application 62405833 · Oct 7, 2016
Related Publication 20220068890A1 · Mar 3, 2022
References Cited (278)
US 4818728A · Rai · 1989 [cited by examiner]
US 5016138A · Woodman · 1991 [cited by applicant]
US 5376825A · Tukamoto et al. · 1994 [cited by applicant]
US 5579207A · Hayden et al. · 1996 [cited by applicant]
US 5621863A · Boulet et al. · 1997 [cited by applicant]
US 5673478A · Beene et al. · 1997 [cited by applicant]
US 5717832A · Steimle et al. · 1998 [cited by applicant]
US 5740326A · Boulet et al. · 1998 [cited by applicant]
US 5793115A · Zavracky · 1998 [cited by applicant]
US 5909587A · Tran · 1999 [cited by applicant]
US 6320255B1 · Terrill · 2001 [cited by applicant]
US 6421654B1 · Gordon · 2002 [cited by applicant]
US 6624046B1 · Zavracky · 2003 [cited by examiner]
US 6642081B1 · Patti · 2003 [cited by examiner]
US 6707124B2 · Wachtler et al. · 2004 [cited by applicant]
US 6844624B1 · Kiritani · 2005 [cited by applicant]
US 6891447B2 · Song · 2005 [cited by applicant]
US 6909194B2 · Farnworth et al. · 2005 [cited by applicant]
US 6917219B2 · New · 2005 [cited by applicant]
US 6962835B2 · Tong et al. · 2005 [cited by applicant]
US 7046522B2 · Sung et al. · 2006 [cited by applicant]
US 7099215B1 · Rotenberg et al. · 2006 [cited by applicant]
US 7124250B2 · Kyung · 2006 [cited by applicant]
US 7202566B2 · Liaw · 2007 [cited by applicant]
US 7485968B2 · Enquist et al. · 2009 [cited by applicant]
US 7638869B2 · Irsigler et al. · 2009 [cited by applicant]
US 7692946B2 · Taufique et al. · 2010 [cited by applicant]
US 7863918B2 · Jenkins · 2011 [cited by applicant]
US 7902851B2 · Fenner · 2011 [cited by examiner]
US 7977962B2 · Hargan et al. · 2011 [cited by applicant]
US 8032711B2 · Black et al. · 2011 [cited by applicant]
US 8042082B2 · Solomon · 2011 [cited by applicant]
US 8053277B2 · Yu · 2011 [cited by examiner]
US 8059443B2 · McLaren et al. · 2011 [cited by applicant]
US 8110899B2 · Reed et al. · 2012 [cited by applicant]
US 8148814B2 · Furuta et al. · 2012 [cited by applicant]
US 8198716B2 · Periaman · 2012 [cited by examiner]
US 8223523B2 · Jin et al. · 2012 [cited by applicant]
US 8223524B2 · Chung · 2012 [cited by applicant]
US 8228684B2 · Losavio et al. · 2012 [cited by applicant]
US 8233303B2 · Best et al. · 2012 [cited by applicant]
US 8432467B2 · Jaworski et al. · 2013 [cited by applicant]
US 8441831B2 · Ku et al. · 2013 [cited by applicant]
US 8516409B2 · Coteus et al. · 2013 [cited by applicant]
US 8546188B2 · Liu · 2013 [cited by examiner]
US 8546955B1 · Wu · 2013 [cited by applicant]
US 8547769B2 · Saraswat et al. · 2013 [cited by applicant]
US 8552569B2 · Lee · 2013 [cited by applicant]
US 8697493B2 · Sadaka · 2014 [cited by examiner]
US 8704384B2 · Wu et al. · 2014 [cited by applicant]
US 8736068B2 · Bartley et al. · 2014 [cited by applicant]
US 8797818B2 · Jeddeloh · 2014 [cited by applicant]
US 8802541B2 · Wang · 2014 [cited by examiner]
US 8816486B2 · Tsai · 2014 [cited by examiner]
US 8816506B2 · Kawashita et al. · 2014 [cited by applicant]
US 8860199B2 · Black et al. · 2014 [cited by applicant]
US 8860221B2 · Park · 2014 [cited by examiner]
US 8885380B2 · Kang et al. · 2014 [cited by applicant]
US 8901749B2 · Kim et al. · 2014 [cited by applicant]
US 8907439B1 · Kay et al. · 2014 [cited by applicant]
US 8930647B1 · Smith · 2015 [cited by applicant]
US 8947931B1 · D'Abreu · 2015 [cited by applicant]
US 8987066B2 · Grobelny et al. · 2015 [cited by applicant]
US 9030253B1 · Ngai · 2015 [cited by applicant]
US 9064937B2 · Edelstein · 2015 [cited by examiner]
US 9067272B2 · Sutanto · 2015 [cited by applicant]
US 9076700B2 · Kawashita et al. · 2015 [cited by applicant]
US 9076770B2 · Foster, Sr. et al. · 2015 [cited by applicant]
US 9142262B2 · Ware · 2015 [cited by applicant]
US 9224704B2 · Landru · 2015 [cited by examiner]
US 9230940B2 · Goodnow et al. · 2016 [cited by applicant]
US 9300298B2 · Cordero · 2016 [cited by applicant]
US 9318418B2 · Kawashita et al. · 2016 [cited by applicant]
US 9418964B2 · Chang et al. · 2016 [cited by applicant]
US 9432298B1 · Smith · 2016 [cited by applicant]
US 9478496B1 · Lin · 2016 [cited by examiner]
US 9484326B2 · Keeth et al. · 2016 [cited by applicant]
US 9497854B2 · Giuliano · 2016 [cited by applicant]
US 9501603B2 · Barowski et al. · 2016 [cited by applicant]
US 9508607B2 · Chua-Eoan · 2016 [cited by applicant]
US 9559081B1 · Lai · 2017 [cited by examiner]
US 9613925B2 · Cai · 2017 [cited by examiner]
US 9640233B2 · Sohn · 2017 [cited by applicant]
US 9645603B1 · Chall et al. · 2017 [cited by applicant]
US 9647187B1 · Yap · 2017 [cited by examiner]
US 9679867B2 · Ashidate · 2017 [cited by examiner]
US 9691739B2 · Kawashita et al. · 2017 [cited by applicant]
US 9726691B2 · Garibay · 2017 [cited by applicant]
US 9746517B2 · Whetsel · 2017 [cited by applicant]
US 9747959B2 · Seo · 2017 [cited by applicant]
US 9871014B2 · Haba · 2018 [cited by applicant]
US 9915978B2 · Dabby et al. · 2018 [cited by applicant]
US 9934832B2 · Shibata et al. · 2018 [cited by applicant]
US 9953941B2 · Enquist · 2018 [cited by examiner]
US 10121743B2 · Kamal · 2018 [cited by applicant]
US 10180692B2 · Kouchi · 2019 [cited by applicant]
US 10241150B2 · Woo et al. · 2019 [cited by applicant]
US 10255969B2 · Eom et al. · 2019 [cited by applicant]
US 10262911B1 · Gong · 2019 [cited by applicant]
US 10269586B2 · Chou et al. · 2019 [cited by applicant]
US 10289604B2 · Sankaralingam et al. · 2019 [cited by applicant]
US 10354975B2 · Soares · 2019 [cited by examiner]
US 10373657B2 · Kondo et al. · 2019 [cited by applicant]
US 10446207B2 · Kim et al. · 2019 [cited by applicant]
US 10446601B2 · Otake et al. · 2019 [cited by applicant]
US 10522352B2 · Delacruz et al. · 2019 [cited by applicant]
US 10580735B2 · Mohammed et al. · 2020 [cited by applicant]
US 10580757B2 · Nequist et al. · 2020 [cited by applicant]
US 10580817B2 · Otake et al. · 2020 [cited by applicant]
US 10586786B2 · DeLaCruz et al. · 2020 [cited by applicant]
US 10593667B2 · DeLaCruz et al. · 2020 [cited by applicant]
US 10600691B2 · DeLaCruz et al. · 2020 [cited by applicant]
US 10600735B2 · DeLaCruz et al. · 2020 [cited by applicant]
US 10600780B2 · DeLaCruz et al. · 2020 [cited by applicant]
US 10607136B2 · Teig et al. · 2020 [cited by applicant]
US 10672663B2 · DeLaCruz et al. · 2020 [cited by applicant]
US 10672743B2 · Teig et al. · 2020 [cited by applicant]
US 10672744B2 · Teig et al. · 2020 [cited by applicant]
US 10672745B2 · Teig et al. · 2020 [cited by applicant]
US 10719762B2 · Teig et al. · 2020 [cited by applicant]
US 10762420B2 · Teig et al. · 2020 [cited by applicant]
US 20010017418A1 · Noguchi et al. · 2001 [cited by applicant]
US 20020008309A1 · Akiyama · 2002 [cited by applicant]
US 20030102495A1 · Huppenthal et al. · 2003 [cited by applicant]
US 20040178819A1 · New · 2004 [cited by examiner]
US 20050127490A1 · Black et al. · 2005 [cited by applicant]
US 20060036559A1 · Nugent · 2006 [cited by applicant]
US 20060087013A1 · Hsieh · 2006 [cited by applicant]
US 20060097402A1 · Pu · 2006 [cited by examiner]
US 20070220207A1 · Black et al. · 2007 [cited by applicant]
US 20080150088A1 · Reed · 2008 [cited by examiner]
US 20080225493A1 · Barth · 2008 [cited by examiner]
US 20080237310A1 · Periaman et al. · 2008 [cited by applicant]
US 20080237891A1 · Irsigler · 2008 [cited by examiner]
US 20090037658A1 · Sistla · 2009 [cited by examiner]
US 20090070727A1 · Solomon · 2009 [cited by applicant]
US 20090138688A1 · Black · 2009 [cited by examiner]
US 20090224388A1 · Bernstein · 2009 [cited by examiner]
US 20100140750A1 · Toms · 2010 [cited by applicant]
US 20100255262A1 · Chen · 2010 [cited by examiner]
US 20100258890A1 · Ahn · 2010 [cited by examiner]
US 20100261159A1 · Hess et al. · 2010 [cited by applicant]
US 20100308455A1 · Kim · 2010 [cited by examiner]
US 20110026293A1 · Riho · 2011 [cited by applicant]
US 20110078412A1 · Emma · 2011 [cited by examiner]
US 20110102066A1 · Jin · 2011 [cited by examiner]
US 20110131391A1 · Barowski et al. · 2011 [cited by applicant]
US 20110248396A1 · Liu · 2011 [cited by examiner]
US 20120092062A1 · Lee et al. · 2012 [cited by applicant]
US 20120098140A1 · Bartley · 2012 [cited by examiner]
US 20120119357A1 · Byeon et al. · 2012 [cited by applicant]
US 20120124532A1 · Coteus · 2012 [cited by examiner]
US 20120136913A1 · Duong et al. · 2012 [cited by applicant]
US 20120170345A1 · Choi et al. · 2012 [cited by applicant]
US 20120171818A1 · Barth · 2012 [cited by examiner]
US 20120201068A1 · Ware · 2012 [cited by applicant]
US 20120242346A1 · Wang · 2012 [cited by applicant]
US 20120256653A1 · Cordero et al. · 2012 [cited by applicant]
US 20120262196A1 · Yokou · 2012 [cited by applicant]
US 20120286431A1 · Foster, Sr. et al. · 2012 [cited by applicant]
US 20120313263A1 · Barth · 2012 [cited by applicant]
US 20130021866A1 · Lee · 2013 [cited by applicant]
US 20130032950A1 · Ware et al. · 2013 [cited by applicant]
US 20130051116A1 · En et al. · 2013 [cited by applicant]
US 20130070436A1 · Sutanto · 2013 [cited by examiner]
US 20130144542A1 · Ernst · 2013 [cited by applicant]
US 20130187292A1 · Semmelmeyer · 2013 [cited by applicant]
US 20130207268A1 · Chapelon · 2013 [cited by applicant]
US 20130242500A1 · Lin et al. · 2013 [cited by applicant]
US 20130275823A1 · Cordero et al. · 2013 [cited by applicant]
US 20130283008A1 · Buyuktosunoglu · 2013 [cited by examiner]
US 20130321074A1 · Ko et al. · 2013 [cited by applicant]
US 20140011324A1 · Liu · 2014 [cited by examiner]
US 20140022002A1 · Chua-Eoan et al. · 2014 [cited by applicant]
US 20140176187A1 · Jayasena · 2014 [cited by examiner]
US 20140177626A1 · Thottethodi · 2014 [cited by examiner]
US 20140269022A1 · Xie · 2014 [cited by examiner]
US 20140285253A1 · Jeon et al. · 2014 [cited by applicant]
US 20140323046A1 · Asai · 2014 [cited by applicant]
US 20140369148A1 · Matsui et al. · 2014 [cited by applicant]
US 20140379975A1 · Ikegami · 2014 [cited by examiner]
US 20150032962A1 · Buyuktosunoglu · 2015 [cited by examiner]
US 20150121052A1 · Emma · 2015 [cited by examiner]
US 20150162220A1 · Chou · 2015 [cited by examiner]
US 20150199997A1 · Ito · 2015 [cited by examiner]
US 20150228584A1 · Huang et al. · 2015 [cited by applicant]
US 20150262902A1 · Shen et al. · 2015 [cited by applicant]
US 20150348943A1 · Chen · 2015 [cited by examiner]
US 20150370754A1 · Morimoto · 2015 [cited by examiner]
US 20160111386A1 · England · 2016 [cited by examiner]
US 20160155725A1 · Chen · 2016 [cited by examiner]
US 20160217087A1 · Lim · 2016 [cited by examiner]
US 20160225431A1 · Best et al. · 2016 [cited by applicant]
US 20160233134A1 · Lim et al. · 2016 [cited by applicant]
US 20160276313A1 · Kume · 2016 [cited by examiner]
US 20160329312A1 · O'Mullan et al. · 2016 [cited by applicant]
US 20160379115A1 · Burger · 2016 [cited by applicant]
US 20170092615A1 · Oyamada · 2017 [cited by applicant]
US 20170092616A1 · Su et al. · 2017 [cited by applicant]
US 20170141079A1 · Kao · 2017 [cited by examiner]
US 20170148737A1 · Fasano et al. · 2017 [cited by applicant]
US 20170194309A1 · Evans et al. · 2017 [cited by applicant]
US 20170213787A1 · Alfano et al. · 2017 [cited by applicant]
US 20170227605A1 · Kim et al. · 2017 [cited by applicant]
US 20170278213A1 · Eckert · 2017 [cited by applicant]
US 20170278789A1 · Chuang · 2017 [cited by applicant]
US 20170285584A1 · Nakagawa et al. · 2017 [cited by applicant]
US 20170301625A1 · Mahajan et al. · 2017 [cited by applicant]
US 20180017614A1 · Leedy · 2018 [cited by applicant]
US 20180068218A1 · Yoo et al. · 2018 [cited by applicant]
US 20180286800A1 · Kamal et al. · 2018 [cited by applicant]
US 20180330992A1 · Delacruz et al. · 2018 [cited by applicant]
US 20180330993A1 · Delacruz et al. · 2018 [cited by applicant]
US 20180331037A1 · Mohammed et al. · 2018 [cited by applicant]
US 20180331038A1 · Delacruz et al. · 2018 [cited by applicant]
US 20180331072A1 · Nequist et al. · 2018 [cited by applicant]
US 20180331094A1 · Delacruz et al. · 2018 [cited by applicant]
US 20180331095A1 · Delacruz et al. · 2018 [cited by applicant]
US 20180350775A1 · DeLaCruz · 2018 [cited by applicant]
US 20180373975A1 · Yu et al. · 2018 [cited by applicant]
US 20180374788A1 · Nakagawa et al. · 2018 [cited by applicant]
US 20190006322A1 · Park · 2019 [cited by applicant]
US 20190042377A1 · Teig et al. · 2019 [cited by applicant]
US 20190042912A1 · Teig et al. · 2019 [cited by applicant]
US 20190042929A1 · Teig et al. · 2019 [cited by applicant]
US 20190043832A1 · Teig et al. · 2019 [cited by applicant]
US 20190051641A1 · Lee et al. · 2019 [cited by applicant]
US 20190109057A1 · Hargan et al. · 2019 [cited by applicant]
US 20190123022A1 · Teig et al. · 2019 [cited by applicant]
US 20190123023A1 · Teig et al. · 2019 [cited by applicant]
US 20190123024A1 · Teig et al. · 2019 [cited by applicant]
US 20190156215A1 · Matveev et al. · 2019 [cited by applicant]
US 20190180183A1 · Diamant et al. · 2019 [cited by applicant]
US 20190214991A1 · Ngai · 2019 [cited by applicant]
US 20190244933A1 · Or-Bach · 2019 [cited by applicant]
US 20200013699A1 · Liu · 2020 [cited by applicant]
US 20200143866A1 · Biswas et al. · 2020 [cited by applicant]
US 20200194052A1 · Shaeffer et al. · 2020 [cited by applicant]
US 20200203318A1 · Nequist et al. · 2020 [cited by applicant]
US 20200219771A1 · DeLaCruz et al. · 2020 [cited by applicant]
US 20200227389A1 · Teig et al. · 2020 [cited by applicant]
US 20200273798A1 · Mohammed et al. · 2020 [cited by applicant]
US 20200293872A1 · Teig et al. · 2020 [cited by applicant]
US 20200294858A1 · DeLaCruz et al. · 2020 [cited by applicant]
US 20200372345A1 · Li · 2020 [cited by applicant]
CN 1776905A · 2006 [cited by examiner]
EP 3698401A1 · 2020 [cited by applicant]
EP 3698402A1 · 2020 [cited by applicant]
JP 2010250511A · 2010 [cited by examiner]
KR 20150137970A · 2015 [cited by applicant]
WO 2017138121A1 · 2017 [cited by applicant]
WO 2019079625A1 · 2019 [cited by applicant]
WO 2019079631A1 · 2019 [cited by applicant]
Author Unknown, “Fact Sheet: New Intel Architectures and Technologies Target Expanded Market Opportunities,” Dec. 12, 2018, 9 pages, Intel Corporation, Santa Clara, California. [cited by applicant]
Author Unknown, “Vector Supercomputer SX Series: SX-Aurora TSUBASA,” Oct. 2017, 2 pages, NEC Corporation. [cited by applicant]
Bansal, Samta, “3D-IC is Now Real: Wide-IO is Driving 3D-IC TSV,” Cadence Flash Memory Summit, Aug. 2012, 14 pages, Cadence Design Systems, Inc. [cited by applicant]
Black, Bryan, “Die Stacking is Happening!,” Dec. 9, 2013, 53 pages, Advanced Micro Devices, Inc., Santa Clara, California. [cited by applicant]
Black, Bryan, et al., “3D Processing Technology and its Impact on iA32 Microprocessors,” Proceedings of 2004 IEEE International Conference on Computer Design: VLSI in Computers and Processors, Oct. 11-13, 2004, 3 pages,… [cited by applicant]
Black, Bryan, et al., “Die Stacking (3D) Microarchitecture,” Proceedings of the 39th Annual IEEE/ACM International Symposium on Microarchitecture, Dec. 9-13, 2006, 11 pages, IEEE, Orlando, Florida. [cited by applicant]
Hajkazemi, Mohammad Hossein, et al., “Wide I/O or LPDDR? Exploration and Analysis of Performance, Power and Temperature Trade-offs of Emerging DRAM Technologies in Embedded MPSoCs,” Proceedings of 33rd IEEE Internationa… [cited by applicant]
Invitation to Pay Additional Fees for Commonly Owned International Patent Application PCT/US2018/056559, dated Feb. 7, 2019, 15 pages, International Searching Authority (EPO). [cited by applicant]
Invitation to Pay Additional Fees for Commonly Owned International Patent Application PCT/US2018/056565, dated Feb. 12, 2019, 13 pages, International Searching Authority (EPO). [cited by applicant]
Loh, Gabriel H., et al., “Processor Design in 3D Die-Stacking Technologies,” IEEE Micro, May/Jun. 2007, 18 pages, vol. 27, Issue 3, IEEE Computer Society. [cited by applicant]
Nakamoto, Mark, et al., “Simulation Methodology and Flow Integration for 3D IC Stress Management,” 2010 IEEE Custom Integrated Circuits Conference, Sep. 19-22, 2010, 4 pages, IEEE, San Jose, CA, USA. [cited by applicant]
Tran, Kevin, et al., “Start Your HBM/2.5D Design Today,” High-Bandwidth Memory White Paper, Mar. 29, 2016, 6 pages, Amkor Technology, Inc., San Jose, CA, USA. [cited by applicant]
Wu, Xiaoxia, et al., “Electrical Characterization for Intertier Connections and Timing Analysis for 3-D ICs,” IEEE Transactions on Very Large Scale Integration (VLSI) Systems, Dec. 6, 2010, 5 pages, IEEE. [cited by applicant]
Kim, Jung-Sik, et al., “A 1.2 V 12.8 GB/s 2 GB Mobile Wide-I/O DRAM With 4x128 I/Os Using TSV Based Stacking,” IEEE Journal of Solid-State Circuits, Jan. 2012, 10 pages, vol. 47, No. 1, IEEE. [cited by applicant]
International Search Report and Written Opinion of Commonly Owned International Patent Application PCT/US2018/056565, mailed Apr. 2, 2019, 17 pages, International Searching Authority (European Patent Office). [cited by applicant]
Non-Published Commonly Owned Related U.S. Appl. No. 16/806,854, filed Mar. 2, 2020, 75 pages, Xcelsis Corporation. [cited by applicant]
Non-Published Commonly Owned Related U.S. Appl. No. 16/889,698, filed Jun. 1, 2020, 74 pages, Xcelsis Corporation. [cited by applicant]
Non-Published Commonly Owned Related U.S. Appl. No. 16/891,027, filed Jun. 2, 2020, 47 ages, Xcelsis Corporation. [cited by applicant]
International Search Report and Written Opinion of Commonly Owned International Patent Application PCT/US2018/056559, dated Mar. 29, 2019, 17 pages, International Searching Authority (European Patent Office). [cited by applicant]
Non-Published Commonly Owned Related U.S. Appl. No. 16/827,467, filed Mar. 23, 2020, 74 pages, Xcelsis Corporation. [cited by applicant]
Nair, Vinod and Hinton, Geoffrey E., “Rectified linear units improve restricted Boltzmann machines,” ICML, pp. 807-814, 2010. [cited by applicant]
He, Kaiming, Zhang, Xiangyu, Ren, Shaoqing, and Sun, Jian, “Delving deep into rectifiers: Surpassing human-level performance on imagenet classification,” arXiv preprint arXiv: 1502.01852, 2015, pp. 1026-1034. [cited by applicant]
Non-Published Commonly Owned U.S. Appl. No. 16/806,934, filed Mar. 2, 2020, 74 pages, Xcelsis Corporation. [cited by applicant]
Yuang, Zhang, “Key Research Issues of Memory Architecture for Three Dimensional Multi-Core Processors,” Department of Physics, Nanjing University (May 2015). [cited by applicant]
A. Jouve et al., “1μm Pitch direct hybrid bonding with <300nm wafer-to-wafer overlay accuracy,” 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), Burlingame, CA, USA, 2017, pp. 1-2. [cited by applicant]