Semiconductor device comprising various thin-film transistors
A transistor includes oxide semiconductor stacked layers between a first gate electrode layer and a second gate electrode layer through an insulating layer interposed between the first gate electrode layer and the oxide semiconductor stacked layers and an insulating layer interposed between the second gate electrode layer and the oxide semiconductor stacked layers. The thickness of a channel formation region is smaller than the other regions in the oxide semiconductor stacked layers. Further in this transistor, one of the gate electrode layers is provided as what is called a back gate for controlling the threshold voltage. Controlling the potential applied to the back gate enables control of the threshold voltage of the transistor, which makes it easy to maintain the normally-off characteristics of the transistor.
1. A semiconductor device comprising:
a first transistor;
a second transistor;
a third transistor;
a fourth transistor;
a first layer comprising silicon over a substrate;
a first insulating layer over the first layer;
a first gate electrode of the third transistor over the first insulating layer;
a first conductive layer over the first gate electrode of the third transistor, the first conductive layer functioning as a first gate electrode of the second transistor;
a second insulating layer over the first conductive layer;
a second layer comprising an oxide semiconductor over the second insulating layer;
a third insulating layer over the second layer;
a second conductive layer over the third insulating layer, the second conductive layer functioning as a second gate electrode of the second transistor; and
a third conductive layer in contact with a top surface of the second layer,
wherein the second transistor comprises the oxide semiconductor in a channel formation region,
wherein a first wiring is electrically connected to one of a source electrode and a drain electrode of the first transistor,
wherein the other of the source electrode and the drain electrode of the first transistor is electrically connected to one of a source electrode and a drain electrode of the second transistor,
wherein a second wiring is electrically connected to a first gate electrode of the first transistor,
wherein a third wiring is electrically connected to the first gate electrode of the second transistor,
wherein the other of the source electrode and the drain electrode of the second transistor is electrically connected to one of a source electrode and a drain electrode of the third transistor and one of a source electrode and a drain electrode of the fourth transistor,
wherein the first transistor comprises a second gate electrode overlapping with the first gate electrode of the first transistor, and
wherein the third conductive layer comprises a region extending below the second layer.
2. The semiconductor device according to claim 1 , wherein the first insulating layer, the second insulating layer, and the third insulating layer comprise silicon.
3. A semiconductor device comprising:
a first transistor, the first transistor comprising an oxide semiconductor in a channel formation region;
a second transistor;
a third transistor, the third transistor comprising silicon in a channel formation region;
a fourth transistor;
a first layer over a substrate, the first layer comprising the channel formation region of the third transistor;
a first insulating layer over the first layer;
a first gate electrode of the third transistor over the first insulating layer;
a first conductive layer over the first gate electrode of the third transistor, the first conductive layer functioning as a first gate electrode of the second transistor;
a second insulating layer over the first conductive layer;
a second layer comprising the oxide semiconductor over the second insulating layer;
a third insulating layer over the second layer;
a second conductive layer over the third insulating layer, the second conductive layer functioning as a second gate electrode of the second transistor; and
a third conductive layer in contact with a top surface of the second layer,
wherein a first wiring is electrically connected to one of a source electrode and a drain electrode of the first transistor,
wherein the other of the source electrode and the drain electrode of the first transistor is electrically connected to one of a source electrode and a drain electrode of the second transistor,
wherein a second wiring is electrically connected to a first gate electrode of the first transistor,
wherein a third wiring is electrically connected to the first gate electrode of the second transistor,
wherein the other of the source electrode and the drain electrode of the second transistor is electrically connected to one of a source electrode and a drain electrode of the third transistor and one of a source electrode and a drain electrode of the fourth transistor,
wherein the first transistor comprises a second gate electrode overlapping with the first gate electrode of the first transistor, and
wherein the third conductive layer comprises a region extending below the second layer.
4. The semiconductor device according to claim 3 , wherein the first insulating layer, the second insulating layer, and the third insulating layer comprise silicon.
5. A semiconductor device comprising:
a first transistor, the first transistor comprising an oxide semiconductor in a channel formation region;
a second transistor, the second transistor comprising an oxide semiconductor in a channel formation region;
a third transistor, the third transistor comprising silicon in a channel formation region;
a fourth transistor, the fourth transistor comprising silicon in a channel formation region;
a first layer over a substrate, the first layer comprising the channel formation region of the third transistor;
a first insulating layer over the first layer;
a first gate electrode of the third transistor over the first insulating layer;
a first conductive layer over the first gate electrode of the third transistor, the first conductive layer functioning as a first gate electrode of the second transistor;
a second insulating layer over the first conductive layer;
a second layer comprising the oxide semiconductor of the second transistor over the second insulating layer;
a third insulating layer over the second layer;
a second conductive layer over the third insulating layer, the second conductive layer functioning as a second gate electrode of the second transistor; and
a third conductive layer in contact with a top surface of the second layer,
wherein a first wiring is electrically connected to one of a source electrode and a drain electrode of the first transistor,
wherein the other of the source electrode and the drain electrode of the first transistor is electrically connected to one of a source electrode and a drain electrode of the second transistor,
wherein a second wiring is electrically connected to a first gate electrode of the first transistor,
wherein a third wiring is electrically connected to the first gate electrode of the second transistor,
wherein the other of the source electrode and the drain electrode of the second transistor is electrically connected to one of a source electrode and a drain electrode of the third transistor and one of a source electrode and a drain electrode of the fourth transistor,
wherein the oxide semiconductor of the second transistor comprises a crystal with a size greater than or equal to 1 nm and less than 10 nm, and
wherein the third conductive layer comprises a region extending below the second layer.
6. The semiconductor device according to claim 5 , wherein the first insulating layer, the second insulating layer, and the third insulating layer comprise silicon.