IP Library › Granted Patent US 11,468,857
Granted Patent B2
US 11,468,857 · App. 17/502,352 · Granted Oct 11, 2022

Liquid crystal display device and electronic device including the same

Inventor: Atsushi Umezaki (Kanagawa, JP)
G09G3/3674G02F1/13454G02F1/136286G09G3/3677G11C19/28H01L23/528H01L29/786G02F1/13606G02F2201/124G09G3/3688G09G2300/0408G09G2300/0417G09G2310/0286H01L27/1214H01L29/7869H01L2924/0002
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Quick Facts
Patent No.
US 11,468,857
App. No.
17/502,352
Granted
Oct 11, 2022
Kind
B2
Abstract

A driver circuit includes first to third transistors, a first circuit, and a second circuit. In the first transistor, a first terminal is electrically connected to a second wiring, a second terminal is electrically connected to a first wiring, and a gate is electrically connected to the second circuit and a first terminal of the third transistor. In the second transistor, a first terminal is electrically connected to the first wiring, a second terminal is electrically connected to a sixth wiring, a gate is electrically connected to the first circuit and a gate of the third transistor. A second terminal of the third transistor is electrically connected to the sixth wiring. The first circuit is electrically connected to a third wiring, a fourth wiring, a fifth wiring, and the sixth wiring. The second circuit is electrically connected to the first wiring, the second wiring, and the sixth wiring.

Claims (54)

1. A semiconductor device comprising:

first to ninth transistors,

wherein one of a source electrode and a drain electrode of the first transistor is electrically connected to one of a source electrode and a drain electrode of the second transistor, one of a source electrode and a drain electrode of the ninth transistor, and a first gate line,

wherein the other of the source electrode and the drain electrode of the first transistor is electrically connected to a first wiring,

wherein a gate electrode of the first transistor is electrically connected to one of a source electrode and a drain electrode of the third transistor, one of a source electrode and a drain electrode of the eighth transistor, a gate electrode of the fifth transistor, and a gate electrode of the seventh transistor,

wherein the other of the source electrode and the drain electrode of the eighth transistor is electrically connected to a second wiring,

wherein a gate electrode of the eighth transistor is electrically connected to a fourth wiring,

wherein a gate electrode of the ninth transistor is electrically connected to a second gate line,

wherein a gate electrode of the second transistor is electrically connected to a gate electrode of the third transistor, one of a source electrode and a drain electrode of the fourth transistor, and one of a source electrode and a drain electrode of the fifth transistor,

wherein the other of the source electrode and the drain electrode of the fourth transistor is electrically connected to one of a source electrode and a drain electrode of the sixth transistor, a gate electrode of the sixth transistor, and a third wiring,

wherein a gate electrode of the fourth transistor is electrically connected to the other of the source electrode and the drain electrode of the sixth transistor, and one of a source electrode and a drain electrode of the seventh transistor,

wherein the other of the source electrode and the drain electrode of the second transistor is electrically connected to a first power supply line,

wherein the other of the source electrode and the drain electrode of the third transistor is electrically connected to a second power supply line, and

wherein a clock signal is supplied to the first wiring.

2. The semiconductor device according to claim 1 , wherein the same voltage is supplied to the first power supply line and the second power supply line.

3. The semiconductor device according to claim 1 ,

wherein, in the first transistor, an area where the one of the source electrode and the drain electrode overlaps with the gate electrode with a semiconductor layer interposed therebetween is larger than an area where the other of the source electrode and the drain electrode overlaps with the gate electrode with the semiconductor layer interposed therebetween,

wherein, in the second transistor, an area where the one of the source electrode and the drain electrode overlaps with the gate electrode with a semiconductor layer interposed therebetween is smaller than an area where the other of the source electrode and the drain electrode overlaps with the gate electrode with the semiconductor layer interposed therebetween, and

wherein, in the third transistor, an area where the one of the source electrode and the drain electrode overlaps with the gate electrode with a semiconductor layer interposed therebetween is smaller than an area where the other of the source electrode and the drain electrode overlaps with the gate electrode with the semiconductor layer interposed therebetween.

4. A semiconductor device comprising:

first to ninth transistors,

wherein one of a source electrode and a drain electrode of the first transistor is electrically connected to one of a source electrode and a drain electrode of the second transistor, one of a source electrode and a drain electrode of the ninth transistor, and a first gate line,

wherein the other of the source electrode and the drain electrode of the first transistor is electrically connected to a first wiring,

wherein a gate electrode of the first transistor is electrically connected to one of a source electrode and a drain electrode of the third transistor, one of a source electrode and a drain electrode of the eighth transistor, a gate electrode of the fifth transistor, and a gate electrode of the seventh transistor,

wherein the other of the source electrode and the drain electrode of the eighth transistor is electrically connected to a gate electrode of the eighth transistor and a second wiring,

wherein a gate electrode of the ninth transistor is electrically connected to a second gate line,

wherein a gate electrode of the second transistor is electrically connected to a gate electrode of the third transistor, one of a source electrode and a drain electrode of the fourth transistor, and one of a source electrode and a drain electrode of the fifth transistor,

wherein the other of the source electrode and the drain electrode of the fourth transistor is electrically connected to one of a source electrode and a drain electrode of the sixth transistor, a gate electrode of the sixth transistor, and a third wiring,

wherein a gate electrode of the fourth transistor is electrically connected to the other of the source electrode and the drain electrode of the sixth transistor, and one of a source electrode and a drain electrode of the seventh transistor,

wherein the other of the source electrode and the drain electrode of the second transistor is electrically connected to a first power supply line,

wherein the other of the source electrode and the drain electrode of the ninth transistor is electrically connected to a second power supply line, and

wherein a clock signal is supplied to the first wiring.

5. The semiconductor device according to claim 4 , wherein the same voltage is supplied to the first power supply line and the second power supply line.

6. The semiconductor device according to claim 4 ,

wherein, in the first transistor, an area where the one of the source electrode and the drain electrode overlaps with the gate electrode with a semiconductor layer interposed therebetween is larger than an area where the other of the source electrode and the drain electrode overlaps with the gate electrode with the semiconductor layer interposed therebetween,

wherein, in the second transistor, an area where the one of the source electrode and the drain electrode overlaps with the gate electrode with a semiconductor layer interposed therebetween is smaller than an area where the other of the source electrode and the drain electrode overlaps with the gate electrode with the semiconductor layer interposed therebetween, and

wherein, in the third transistor, an area where the one of the source electrode and the drain electrode overlaps with the gate electrode with a semiconductor layer interposed therebetween is smaller than an area where the other of the source electrode and the drain electrode overlaps with the gate electrode with the semiconductor layer interposed therebetween.

7. A semiconductor device comprising:

first to tenth transistors,

wherein one of a source electrode and a drain electrode of the first transistor is electrically connected to one of a source electrode and a drain electrode of the second transistor, one of a source electrode and a drain electrode of the ninth transistor, and a first gate line,

wherein the other of the source electrode and the drain electrode of the first transistor is electrically connected to a first wiring,

wherein a gate electrode of the first transistor is electrically connected to one of a source electrode and a drain electrode of the third transistor, one of a source electrode and a drain electrode of the eighth transistor, one of a source electrode and a drain electrode of the tenth transistor, a gate electrode of the fifth transistor, and a gate electrode of the seventh transistor,

wherein the other of the source electrode and the drain electrode of the eighth transistor is electrically connected to a gate electrode of the eighth transistor and a second wiring,

wherein a gate electrode of the ninth transistor is electrically connected to a gate electrode of the tenth transistor and a second gate line,

wherein a gate electrode of the second transistor is electrically connected to a gate electrode of the third transistor, one of a source electrode and a drain electrode of the fourth transistor, and one of a source electrode and a drain electrode of the fifth transistor,

wherein the other of the source electrode and the drain electrode of the fourth transistor is electrically connected to one of a source electrode and a drain electrode of the sixth transistor, a gate electrode of the sixth transistor, and a third wiring,

wherein a gate electrode of the fourth transistor is electrically connected to the other of the source electrode and the drain electrode of the sixth transistor, and one of a source electrode and a drain electrode of the seventh transistor,

wherein the other of the source electrode and the drain electrode of the second transistor is electrically connected to the other of the source electrode and the drain electrode of the third transistor, the other of the source electrode and the drain electrode of the fifth transistor, the other of the source electrode and the drain electrode of the seventh transistor, the other of the source electrode and the drain electrode of the ninth transistor, the other of the source electrode and the drain electrode of the tenth transistor, and a power supply line,

wherein a clock signal is supplied to the first wiring.

8. The semiconductor device according to claim 7 ,

wherein, in the first transistor, an area where the one of the source electrode and the drain electrode overlaps with the gate electrode with a semiconductor layer interposed therebetween is larger than an area where the other of the source electrode and the drain electrode overlaps with the gate electrode with the semiconductor layer interposed therebetween,

wherein, in the second transistor, an area where the one of the source electrode and the drain electrode overlaps with the gate electrode with a semiconductor layer interposed therebetween is smaller than an area where the other of the source electrode and the drain electrode overlaps with the gate electrode with the semiconductor layer interposed therebetween,

wherein, in the third transistor, an area where the one of the source electrode and the drain electrode overlaps with the gate electrode with a semiconductor layer interposed therebetween is smaller than an area where the other of the source electrode and the drain electrode overlaps with the gate electrode with the semiconductor layer interposed therebetween, and

wherein, in the tenth transistor, an area where the one of the source electrode and the drain electrode overlaps with the gate electrode with a semiconductor layer interposed therebetween is smaller than an area where the other of the source electrode and the drain electrode overlaps with the gate electrode with the semiconductor layer interposed therebetween.

Priority Claims (1)
JP 2009-007419 · Jan 16, 2009 · national
Continuity (7)
Continuation 16985586 · Aug 5, 2020
Continuation 16447357 · Jun 20, 2019
Continuation 15807119 · Nov 8, 2017
Continuation 14285819 · May 23, 2014
Continuation 13742662 · Jan 16, 2013
Continuation 12685439 · Jan 11, 2010
Related Publication 20220036845A1 · Feb 3, 2022
Cited By (1)
US 12,744,016