IP Library Granted Patent US 12,451,860
Granted Patent B2
US 12,451,860 · App. 17/564,824 · Granted Oct 21, 2025

Structures, acoustic wave resonators, devices and systems

Inventors: Dariusz Burak (Fort Collins, CO); Kevin J. Grannen (Thornton, CO); Jack Lenell (Fort Collins, CO)
Assignee: QXONIX INC.
H03H9/02259H03H9/02015H03H9/0207H03H9/02102H03H9/0211H03H9/02157H03H9/131H03H9/205H03H2009/02165
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,451,860
App. No.
17/564,824
Granted
Oct 21, 2025
Kind
B2
Abstract

Techniques for improving Bulk Acoustic Wave (BAW) reflector and resonator structures are disclosed, including filters, oscillators and systems that may include such devices. A bulk acoustic wave (BAW) resonator may comprise a substrate and a first layer of piezoelectric material having a first piezoelectric axis orientation. The bulk acoustic wave (BAW) resonator may comprise a multi-layer acoustic reflector, e.g., a multi-layer metal top acoustic reflector electrode, including a first pair of top metal electrode layers. The first pair of top metal electrode layers may be electrically and acoustically coupled with the first layer of piezoelectric material to excite a piezoelectrically excitable resonance mode at a resonant frequency of the BAW resonator.

Claims (79)

1. A bulk acoustic wave resonator comprising:

a substrate;

a first piezoelectric layer having a first piezoelectric axis orientation;

a second piezoelectric layer having a second piezoelectric axis orientation that substantially opposes the first piezoelectric axis orientation; and

a multi-layer metal top acoustic reflector electrode including a first pair of top metal electrode layers electrically and acoustically coupled with the first and second piezoelectric layers to excite a piezoelectrically excitable resonance mode at a main resonant frequency of the bulk acoustic wave resonator; and

an etched edge region extending through the first piezoelectric layer, the second piezoelectric layer, and the first pair of top metal electrode layers.

2. The bulk acoustic wave resonator as in claim 1 including at least a multi-layer metal bottom acoustic reflector electrode, in which the multi-layer metal bottom acoustic reflector electrode includes at least a first pair of bottom metal electrode layers electrically and acoustically coupled with the first piezoelectric layer and the second piezoelectric layer, in which the etched edge region extends through the first pair of bottom metal electrode layers, the first piezoelectric layer, the second piezoelectric layer, and the first pair of top metal electrode layers.

3. The bulk acoustic wave resonator as in claim 1 in which the first pair of top metal electrode layers is acoustically de-tuned from the main resonant frequency of the bulk acoustic wave resonator to facilitate suppressing a plurality of parasitic lateral resonances in operation of the bulk acoustic wave resonator.

4. The bulk acoustic wave resonator as in claim 1 in which the multi-layer metal top acoustic reflector electrode includes at least a second pair of top metal electrode layers electrically and acoustically coupled with the first piezoelectric layer and the second piezoelectric layer, in which the etched edge region extends through the first piezoelectric layer, the second piezoelectric layer, the first pair of top metal electrode layers, and the second pair of top metal electrode layers.

5. The bulk acoustic wave resonator as in claim 4 in which the multi-layer metal top acoustic reflector electrode includes at least a third pair of top metal electrode layers.

6. The bulk acoustic wave resonator as in claim 5 in which the multi-layer metal top acoustic reflector electrode comprises a fourth pair of top metal electrode layers.

7. The bulk acoustic wave resonator as in claim 1 in which:

the multi-layer metal top acoustic reflector electrode includes at least a second pair of top metal electrode layers;

the first pair of top metal electrode layers have respective layer thicknesses to be acoustically de-tuned by a first amount from the main resonant frequency;

the second pair of top metal electrode layers have respective layer thicknesses to be acoustically de-tuned by a second amount from the main resonant frequency; and

the first amount is different than the second amount.

8. The bulk acoustic wave resonator as in claim 1 in which:

the multi-layer metal top acoustic reflector electrode is acoustically coupled over an active region of the first piezoelectric layer; and

the first piezoelectric layer is mass loaded by a mass load layer arranged over a peripheral region of the first piezoelectric layer that is adjacent to the active region of the first piezoelectric layer to facilitate suppressing a plurality of parasitic lateral resonances in operation of the bulk acoustic wave resonator.

9. The bulk acoustic wave resonator as in claim 1 in which the multi-layer metal top acoustic reflector electrode is acoustically de-tuned higher in frequency from the main resonant frequency of the bulk acoustic wave resonator.

10. The bulk acoustic wave resonator as in claim 1 in which:

a second member of the first pair of top metal electrode layers has an acoustic impedance;

a first member of the first pair of top metal electrode layers has a first acoustic impedance that is lower than the acoustic impedance of the second member; and

the first member having the first acoustic impedance substantially abuts the first piezoelectric layer.

11. The bulk acoustic wave resonator as in claim 1 in which:

a second member of the first pair of top metal electrode layers has a second acoustic impedance;

a first member of the first pair of top metal electrode layers has a first acoustic impedance that is lower than the second acoustic impedance of the second member; and

the first member having the relatively lower first acoustic impedance is arranged nearest to the first piezoelectric layer, relative to other top metal electrode layers of the multi-layer metal top acoustic reflector electrode, to facilitate suppressing a plurality of parasitic lateral resonances in operation of the bulk acoustic wave.

12. The bulk acoustic wave resonator as in claim 1 in which:

a standing wave acoustic energy is to be coupled into the multi-layer metal top acoustic reflector electrode in operation of the bulk acoustic wave resonator;

a second member of the first pair of top metal electrode layers has a second acoustic impedance;

a first member of the first pair of top metal electrode layers has a first acoustic impedance that is lower than the second acoustic impedance of the second member; and

the first member having the first acoustic impedance is arranged sufficiently proximate to the first piezoelectric layer, to facilitate a first portion of the standing wave acoustic energy in the first member being greater than respective portions of the standing wave acoustic energy in other layers of the multi-layer metal top acoustic reflector electrode.

13. The bulk acoustic wave resonator as in claim 1 including at least a bottom electrode, in which the first piezoelectric layer is interposed between the bottom electrode and the multi-layer metal top acoustic reflector electrode, the first piezoelectric layer including at least an active region where the bottom electrode and the multi-layer metal top acoustic reflector electrode overlap, and the first piezoelectric layer including at least a peripheral region where the bottom electrode and the multi-layer metal top acoustic reflector electrode avoid overlapping, in which:

a second member of the first pair of top metal electrode layers has a second acoustic impedance;

a first member of the first pair of top metal electrode layers has a first acoustic impedance that is lower than the second acoustic impedance of the second member;

the peripheral region of the first piezoelectric layer has a mechanical resonance frequency;

in operation, the bulk acoustic wave resonator is to have a parallel electrical resonance frequency; and

the first member of the first pair of top metal electrode layers having the first acoustic impedance is arranged sufficiently near to the first piezoelectric layer to facilitate the mechanical resonance frequency of the peripheral region approximately matching or being below the parallel electrical resonance frequency.

14. The bulk acoustic wave resonator as in claim 13 in which the multi-layer metal top acoustic reflector electrode is sufficiently de-tuned from the main resonant frequency to facilitate the mechanical resonance frequency of the peripheral region being below the parallel electrical resonance frequency.

15. The bulk acoustic wave resonator as in claim 1 including at least a bottom electrode, in which:

the first piezoelectric layer is interposed between the bottom electrode and the multi-layer metal top acoustic reflector electrode;

the first piezoelectric layer includes at least an active region where the bottom electrode and the multi-layer metal top acoustic reflector electrode overlap;

the first piezoelectric layer includes at least a peripheral region where the bottom electrode and the multi-layer metal top acoustic reflector electrode avoid overlapping; and

the multi-layer metal top acoustic reflector electrode is sufficiently de-tuned from the main resonant frequency to facilitate a mechanical resonance frequency of the peripheral region being below a parallel electrical resonance frequency in operation of the bulk acoustic wave resonator.

16. The bulk acoustic wave resonator as in claim 1 comprising a multi-layer metal bottom acoustic reflector electrode including a first pair of bottom metal electrode layers, a second pair of bottom metal electrode layers, and a third pair of bottom metal electrode layers electrically and acoustically coupled with the first piezoelectric layer and the second piezoelectric layer to excite the piezoelectrically excitable resonance mode at the main resonant frequency.

17. The bulk acoustic wave resonator as in claim 16 in which at least one of the first pair of bottom metal electrode layers, the second pair of bottom metal electrode layers, and the third pair of bottom metal electrode layers is acoustically de-tuned from the main resonant frequency.

18. The bulk acoustic wave resonator as in claim 16 in which:

the first pair of bottom metal electrode layers have respective layer thicknesses to be acoustically de-tuned by a first amount from the main resonant frequency;

the second pair of bottom metal electrode layers have respective layer thicknesses to be acoustically de-tuned by a second amount from the main resonant frequency; and

the first amount is different than the second amount.

19. The bulk acoustic wave resonator as in claim 16 in which the at least one of the first pair of bottom metal electrode layers, the second pair of bottom metal electrode layers, and the third pair of bottom metal electrode layers is acoustically de-tuned lower in frequency from the main resonant frequency.

20. The bulk acoustic wave resonator as in claim 1 including at least a second pair of piezoelectric layers and at least one or more of: a third pair of piezoelectric layers, a fourth pair of piezoelectric layers, a fifth pair of piezoelectric layers, a sixth pair of piezoelectric layers, a seventh pair of piezoelectric layers, an eighth pair of piezoelectric layers and a ninth pair of piezoelectric layers.

21. The bulk acoustic wave resonator as in claim 1 in which the main resonant frequency is in at least one of a 3GPP n257 band, a 3GPP n258 band, a 3GPP n260 band, and a 3GPP n261 band.

22. The bulk acoustic wave resonator as in claim 1 in which the main resonant frequency is in an Earth Exploration Satellite Service (EESS) band.

23. The bulk acoustic wave resonator as in claim 1 in which the main resonant frequency is in one of a Ku band, a K band, a Ka band, a V band, and a W band.

24. The bulk acoustic wave resonator as in claim 1 in which the main resonant frequency of the bulk acoustic wave resonator is in one of an X band, a Ku band, a K band, a Ka band, a V band, and a W band.

25. An apparatus comprising:

a bulk acoustic wave resonator including at least:

a first piezoelectric layer having a first piezoelectric axis orientation;

a second piezoelectric layer having a second piezoelectric axis orientation that substantially opposes the first piezoelectric axis orientation;

a top acoustic reflector electrode including a first pair of top metal electrode layers electrically and acoustically coupled with the first piezoelectric layer and the second piezoelectric layer to excite a main resonant frequency of the bulk acoustic wave resonator;

an etched edge region extending through the first piezoelectric layer, the second piezoelectric layer, and the first pair of top metal electrode layers; and

electrical coupling nodes to facilitate electrical coupling of the bulk acoustic wave resonator with an oscillator circuitry.

26. The apparatus as in claim 25 in which the first pair of top metal electrode layers is acoustically de-tuned from the main resonant frequency.

27. A bulk acoustic wave resonator comprising:

a substrate;

a first piezoelectric layer having a first piezoelectric axis orientation;

a second piezoelectric layer acoustically coupled to the first piezoelectric layer, the second piezoelectric layer having a second piezoelectric axis orientation that is antiparallel to the first piezoelectric axis orientation; and

a top metal acoustic wave reflector electrically interfacing with the first piezoelectric layer, the top metal acoustic wave reflector including at least a first pair of top metal layers and a second pair of top metal layers, in which the first piezoelectric layer is coupled between the top metal acoustic wave reflector and the substrate.

28. The bulk acoustic wave resonator of claim 27 , including at least an etched edge region extending through the first piezoelectric layer, the second piezoelectric layer, and the first pair of top metal layers.

29. The bulk acoustic wave resonator of claim 27 in which the top metal acoustic wave reflector includes at least a third pair of top metal layers acoustically coupled to the first and second piezoelectric layers.

30. The bulk acoustic wave resonator of claim 27 including at least a bottom metal acoustic wave reflector electrically interfacing with the second piezoelectric layer.

31. A resonator filter comprising:

a plurality of acoustic wave resonators, in which a first acoustic wave resonator of the plurality of acoustic wave resonators includes at least:

a substrate;

a first plurality of piezoelectric layers having alternating parallel and antiparallel piezoelectric axis orientations, the first plurality of piezoelectric layers having respective thicknesses, the respective thicknesses to facilitate a main acoustic resonance frequency of the first acoustic wave resonator; and

a top metal acoustic wave reflector electrically interfacing with a first layer of the first plurality of piezoelectric layers, the top metal acoustic wave reflector including at least a first plurality of top metal layers and a second plurality of top metal layers, in which the first plurality of piezoelectric layers is coupled between the top metal acoustic wave reflector and the substrate.

32. The resonator filter of claim 31 in which the first acoustic wave resonator includes at least a bottom metal acoustic wave reflector electrically interfacing with a second piezoelectric layer of the first plurality of piezoelectric layers, the bottom metal acoustic wave reflector including at least a first plurality of bottom metal layers.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 7, 2022
From: BURAK, DARIUSZ; GRANNEN, KEVIN J.; LENELL, JACK
To: QXONIX INC.
Reel/Frame 058915/0166 →
Continuity (11)
Continuation In Part 17380011 · Jul 20, 2021
Continuation In Part PCTUS2020043762 · Jul 27, 2020
Continuation 16940172 · Jul 27, 2020
Provisional Application 62881074 · Jul 31, 2019
Provisional Application 62881091 · Jul 31, 2019
Provisional Application 62881087 · Jul 31, 2019
Provisional Application 62881085 · Jul 31, 2019
Provisional Application 62881061 · Jul 31, 2019
Provisional Application 62881094 · Jul 31, 2019
Provisional Application 62881077 · Jul 31, 2019
Related Publication 20220140806A1 · May 5, 2022
References Cited (172)
US 5929555A · Sugimoto et al. · 1999 [cited by applicant]
US 5945770A · Hanafy · 1999 [cited by applicant]
US 6927651B2 · Larson, III et al. · 2005 [cited by applicant]
US 6975183B2 · Aigner et al. · 2005 [cited by applicant]
US 7385334B1 · Olsson et al. · 2008 [cited by applicant]
US 7964144B1 · Nordin et al. · 2011 [cited by applicant]
US 8346482B2 · Fernandez · 2013 [cited by applicant]
US 8673121B2 · Larson, III et al. · 2014 [cited by applicant]
US 8796904B2 · Burak et al. · 2014 [cited by applicant]
US 9065421B2 · Feng et al. · 2015 [cited by applicant]
US 9243316B2 · Larson, III et al. · 2016 [cited by applicant]
US 9401692B2 · Burak et al. · 2016 [cited by applicant]
US 9679765B2 · Larson, III et al. · 2017 [cited by applicant]
US 10153750B2 · Hurwitz · 2018 [cited by applicant]
US 20020093398A1 · Ella et al. · 2002 [cited by applicant]
US 20020121945A1 · Ruby et al. · 2002 [cited by applicant]
US 20040140869A1 · Marksteiner et al. · 2004 [cited by applicant]
US 20040183400A1 · Aigner et al. · 2004 [cited by applicant]
US 20040195937A1 · Matsubara et al. · 2004 [cited by applicant]
US 20040233019A1 · Inoue et al. · 2004 [cited by applicant]
US 20050012568A1 · Aigner et al. · 2005 [cited by applicant]
US 20050070232A1 · Mages · 2005 [cited by applicant]
US 20050148065A1 · Zhang et al. · 2005 [cited by applicant]
US 20060094374A1 · Olip · 2006 [cited by applicant]
US 20060119230A1 · Umead et al. · 2006 [cited by applicant]
US 20060197411A1 · Hoen et al. · 2006 [cited by applicant]
US 20060287195A1 · Jerome et al. · 2006 [cited by applicant]
US 20070120625A1 · Larson et al. · 2007 [cited by applicant]
US 20070210349A1 · Iimura et al. · 2007 [cited by applicant]
US 20070222336A1 · Grannen et al. · 2007 [cited by applicant]
US 20070296513A1 · Ruile et al. · 2007 [cited by applicant]
US 20090045704A1 · Barber et al. · 2009 [cited by applicant]
US 20090096550A1 · Handtmann et al. · 2009 [cited by applicant]
US 20090256740A1 · Teshirogi et al. · 2009 [cited by applicant]
US 20100073106A1 · Stuebing et al. · 2010 [cited by applicant]
US 20100167416A1 · Kaliban et al. · 2010 [cited by applicant]
US 20100327701A1 · Grannen et al. · 2010 [cited by applicant]
US 20110043081A1 · Safari et al. · 2011 [cited by applicant]
US 20110121689A1 · Grannen et al. · 2011 [cited by applicant]
US 20110121916A1 · Barbet et al. · 2011 [cited by applicant]
US 20110309899A1 · Leiba et al. · 2011 [cited by applicant]
US 20120051976A1 · Lu et al. · 2012 [cited by applicant]
US 20120096697A1 · Grannen et al. · 2012 [cited by applicant]
US 20120154074A1 · Ruby et al. · 2012 [cited by applicant]
US 20120201174A1 · Jian et al. · 2012 [cited by applicant]
US 20120218057A1 · Burak et al. · 2012 [cited by applicant]
US 20120218058A1 · Burak et al. · 2012 [cited by applicant]
US 20120218059A1 · Burak et al. · 2012 [cited by applicant]
US 20120218060A1 · Burak et al. · 2012 [cited by applicant]
US 20120248941A1 · Saito et al. · 2012 [cited by applicant]
US 20120280767A1 · Burak et al. · 2012 [cited by applicant]
US 20120293278A1 · Burak et al. · 2012 [cited by applicant]
US 20120319530A1 · Burak et al. · 2012 [cited by applicant]
US 20120319534A1 · Shiwakawa et al. · 2012 [cited by applicant]
US 20130038408A1 · Burak et al. · 2013 [cited by applicant]
US 20130063226A1 · Burak et al. · 2013 [cited by applicant]
US 20130063227A1 · Burak et al. · 2013 [cited by applicant]
US 20130092547A1 · Li et al. · 2013 [cited by applicant]
US 20130106248A1 · Burak et al. · 2013 [cited by applicant]
US 20130106534A1 · Burak et al. · 2013 [cited by applicant]
US 20130193808A1 · Feng et al. · 2013 [cited by applicant]
US 20130314177A1 · Burak et al. · 2013 [cited by applicant]
US 20140111288A1 · Nikkel et al. · 2014 [cited by applicant]
US 20140118087A1 · Burak et al. · 2014 [cited by applicant]
US 20140118088A1 · Burak et al. · 2014 [cited by applicant]
US 20140118089A1 · Bradley et al. · 2014 [cited by applicant]
US 20140118090A1 · Grannen et al. · 2014 [cited by applicant]
US 20140118091A1 · Burak et al. · 2014 [cited by applicant]
US 20140118092A1 · Burak et al. · 2014 [cited by applicant]
US 20140125202A1 · Choy et al. · 2014 [cited by applicant]
US 20140125203A1 · Choy et al. · 2014 [cited by applicant]
US 20140132117A1 · Ella et al. · 2014 [cited by applicant]
US 20140137815A1 · Bi et al. · 2014 [cited by applicant]
US 20140152152A1 · Burak et al. · 2014 [cited by applicant]
US 20140154697A1 · Johal et al. · 2014 [cited by applicant]
US 20140159548A1 · Burak et al. · 2014 [cited by applicant]
US 20140174908A1 · Feng et al. · 2014 [cited by applicant]
US 20140175950A1 · Zou et al. · 2014 [cited by applicant]
US 20140176261A1 · Burak et al. · 2014 [cited by applicant]
US 20140193830A1 · Schimidt et al. · 2014 [cited by applicant]
US 20140225682A1 · Burak et al. · 2014 [cited by applicant]
US 20140225683A1 · Burak et al. · 2014 [cited by applicant]
US 20140232486A1 · Burak · 2014 [cited by examiner]
US 20140246305A1 · Larson, III · 2014 [cited by applicant]
US 20140340172A1 · Bradley et al. · 2014 [cited by applicant]
US 20140354109A1 · Grannen et al. · 2014 [cited by applicant]
US 20140354115A1 · Burak et al. · 2014 [cited by applicant]
US 20150133339A1 · Prindle · 2015 [cited by applicant]
US 20150240349A1 · Grannen · 2015 [cited by applicant]
US 20150244346A1 · Feng et al. · 2015 [cited by applicant]
US 20150244347A1 · Lv et al. · 2015 [cited by applicant]
US 20150270826A1 · Burak · 2015 [cited by applicant]
US 20150280100A1 · Burak et al. · 2015 [cited by applicant]
US 20150280687A1 · Burak et al. · 2015 [cited by applicant]
US 20150308996A1 · Kim et al. · 2015 [cited by applicant]
US 20150311046A1 · Yeh et al. · 2015 [cited by applicant]
US 20150318461A1 · Jacobsen et al. · 2015 [cited by applicant]
US 20150318837A1 · Zou · 2015 [cited by examiner]
US 20150326200A1 · Grannen et al. · 2015 [cited by applicant]
US 20150341015A1 · Grannen et al. · 2015 [cited by applicant]
US 20150349743A1 · Burak et al. · 2015 [cited by applicant]
US 20150349747A1 · Burak · 2015 [cited by examiner]
US 20150377834A1 · Salvati et al. · 2015 [cited by applicant]
US 20160007893A1 · Roberts · 2016 [cited by applicant]
US 20160079958A1 · Burak · 2016 [cited by applicant]
US 20160087186A1 · Burak · 2016 [cited by applicant]
US 20160087187A1 · Burak · 2016 [cited by applicant]
US 20160118957A1 · Burak et al. · 2016 [cited by applicant]
US 20160118958A1 · Burak · 2016 [cited by applicant]
US 20160126930A1 · Giovannini · 2016 [cited by applicant]
US 20160182011A1 · Burak et al. · 2016 [cited by applicant]
US 20160301437A1 · Pehlke · 2016 [cited by applicant]
US 20160308509A1 · Burak et al. · 2016 [cited by applicant]
US 20160349088A1 · Patel · 2016 [cited by applicant]
US 20170047907A1 · Burak et al. · 2017 [cited by applicant]
US 20170063339A1 · Burak et al. · 2017 [cited by applicant]
US 20170117871A1 · Rivas et al. · 2017 [cited by applicant]
US 20170120242A1 · Rivas · 2017 [cited by applicant]
US 20170122911A1 · McCarran et al. · 2017 [cited by applicant]
US 20170122936A1 · Rivas et al. · 2017 [cited by applicant]
US 20170134001A1 · Belsick et al. · 2017 [cited by applicant]
US 20170134002A1 · Rivas et al. · 2017 [cited by applicant]
US 20170168017A1 · Rivas et al. · 2017 [cited by applicant]
US 20170168018A1 · Morton et al. · 2017 [cited by applicant]
US 20170214387A1 · Burak et al. · 2017 [cited by applicant]
US 20170227497A1 · Rivas et al. · 2017 [cited by applicant]
US 20170261503A1 · Murdock et al. · 2017 [cited by applicant]
US 20170276670A1 · Salvati et al. · 2017 [cited by applicant]
US 20170288121A1 · Burak et al. · 2017 [cited by applicant]
US 20170288628A1 · Grannen et al. · 2017 [cited by applicant]
US 20170292950A1 · Grinsven · 2017 [cited by applicant]
US 20170310304A1 · Burak et al. · 2017 [cited by applicant]
US 20170347925A1 · Wang et al. · 2017 [cited by applicant]
US 20180034438A1 · Ryder et al. · 2018 [cited by applicant]
US 20180085787A1 · Burak · 2018 [cited by examiner]
US 20180097499A1 · Rinaldi et al. · 2018 [cited by applicant]
US 20180138893A1 · Caron · 2018 [cited by applicant]
US 20180204996A1 · Zou et al. · 2018 [cited by applicant]
US 20180309425A1 · Shealy et al. · 2018 [cited by applicant]
US 20190081192A1 · Horng et al. · 2019 [cited by applicant]
US 20190103853A1 · Burak et al. · 2019 [cited by applicant]
US 20190152995A1 · Gunasekaran et al. · 2019 [cited by applicant]
US 20190187105A1 · Ram et al. · 2019 [cited by applicant]
US 20190234907A1 · Edwards et al. · 2019 [cited by applicant]
US 20190250198A1 · Kenumba et al. · 2019 [cited by applicant]
US 20190256806A1 · Nietfeld · 2019 [cited by applicant]
US 20190326873A1 · Bradley · 2019 [cited by examiner]
US 20200124625A1 · Dunlop et al. · 2020 [cited by applicant]
JP 2007036915A1 · 2007 [cited by applicant]
WO WO2018022757 · 2018 [cited by applicant]
WO 2018111532A1 · 2018 [cited by applicant]
WO WO2021021719 · 2021 [cited by applicant]
WO WO2021021723 · 2021 [cited by applicant]
WO WO2021021730 · 2021 [cited by applicant]
WO WO2021021732 · 2021 [cited by applicant]
WO WO2021021736 · 2021 [cited by applicant]
WO WO2021021739 · 2021 [cited by applicant]
WO WO2021021743 · 2021 [cited by applicant]
WO WO2021021745 · 2021 [cited by applicant]
WO WO2021021747 · 2021 [cited by applicant]
WO WO2021021748 · 2021 [cited by applicant]
Moyer, “The Search for 5G MmWave Filters”, https://semiengineering.com/the-search-for-5g-mmwave-filers, Aug. 12, 2021. [cited by applicant]
International Search Report and Written Opinion for PCT/US2020/043716 mailed Oct. 20, 2020. [cited by applicant]
International Search Report and Written Opinion for PCT/US2020/043720 mailed Oct. 20, 2020. [cited by applicant]
International Search Report and Written Opinion for PCT/US2020/043740 mailed Oct. 28, 2020. [cited by applicant]
International Search Report and Written Opinion for PCT/US2020/043746 mailed Oct. 28, 2020. [cited by applicant]
International Search Report and Written Opinion for PCT/US2020/043752 mailed Oct. 27, 2020. [cited by applicant]
International Search Report and Written Opinion for PCT/US2020/043762 mailed Oct. 21, 2020. [cited by applicant]
International Search Report and Written Opinion for PCT/US2020/043760 mailed Dec. 17, 2020. [cited by applicant]
International Search Report and Written Opinion for PCT/US2020/043733 mailed Dec. 17, 2020. [cited by applicant]
International Search Report and Written Opinion for PCT/US2020/043755 mailed Dec. 18, 2020. [cited by applicant]
International Search Report and Written Opinion for PCT/US2020/043730 mailed Feb. 1, 2021. [cited by applicant]