Organic light-emitting display apparatus and fabrication method thereof
An organic light-emitting display apparatus includes a display substrate and a thin film encapsulation layer on the display substrate. The display substrate includes at least one hole, a thin film transistor, a light-emitting portion electrically connected to the thin film transistor, and a plurality of insulating layers. The light-emitting portion includes a first electrode, an intermediate layer, and a second electrode. The display substrate includes an active area, an inactive area between the active area and the hole, and a plurality of insulating dams. Each insulating dam includes at least one layer. The inactive area includes a first area different from a laser-etched area and a second laser-etched area.
1. A method for fabricating an organic light-emitting display apparatus, the method comprising:
preparing a substrate, the substrate comprising a hole area, an active area, and an inactive area between the hole area and the active area;
forming an organic light-emitting element on the substrate, the forming the organic light-emitting element comprising:
forming a first electrode in the active area;
forming an intermediate layer, the intermediate layer comprising an emission layer in the active area and a common layer in the active area and the inactive area; and
forming a second electrode on the intermediate layer; and
removing at least a part of the common layer so that the common layer comprises a first portion between the first electrode and the second electrode in the active area and a plurality of second portions arranged in the inactive area.
2. The method as claimed in claim 1 , wherein the removing at least a part of the common layer comprises:
irradiating a laser beam to the inactive area.
3. The method as claimed in claim 2 , wherein the second electrode is formed in the active area and the inactive area in the forming the second electrode,
wherein the method further comprises:
removing at least a part of the second electrode that is in the inactive area by the laser beam.
4. The method as claimed in claim 3 , wherein after the removing at least a part of the second electrode, the second electrode comprises a first portion in the active area and a plurality of second portions arranged in the inactive area.
5. The method as claimed in claim 1 , further comprising:
forming a first dam and a second dam in the inactive area,
wherein the removing at least a part of the common layer comprises:
removing a part of the common layer that is located between the first dam and the second dam.
6. The method as claimed in claim 5 , wherein:
one of the plurality of second portions of the common layer is on an upper surface of the first dam, and
another one of the plurality of second portions of the common layer is on an upper surface of the second dam.
7. The method as claimed in claim 1 , further comprising:
forming an encapsulation layer, the encapsulation layer comprising a first inorganic layer and an organic layer, wherein the first inorganic layer and the organic layer overlap the organic light-emitting element in the active area.
8. The method as claimed in claim 7 , wherein the first inorganic layer of the encapsulation layer covers the first portion and the plurality of second portions of the common layer.
9. The method as claimed in claim 7 , wherein a portion of the organic layer of the encapsulation layer overlaps a first gap region, wherein
the first gap region is a region between an edge of the first portion of the common layer and an edge of a second portion that is located closest to the active area from among the plurality of second portions of the common layer.