Granted Patent B2

US 12,433,315 · App. 17/736,022 · Granted Oct 7, 2025

Inventors: Jacob Michael Winiski (Troy, NY); Alex James Carlton (Troy, NY); Gavin Reim McIntyre (Troy, NY); Peter James Mueller (Poestenkill, NY); Eben D. Bayer (Troy, NY); Asa Trench Snyder (Petersburg, NY); Meghan Anne O'Brien (Halfmoon, NY); Jessica Hannah Kaplan-Bie (Troy, NY); Alex Stephen Friedman (Troy, NY); Russell Allan Hazen (Clifton Park, NY); Stephen Lomnes (Delmar, NY)

Assignee: Ecovative LLC

A23L31/00A01G18/00C12R2001/645

Abstract

Claims (24)

1. A method of making an aerial mycelium, comprising:

providing a growth matrix comprising a substrate and a fungus;

incubating the growth matrix as a solid-state culture in a growth environment for an incubation time period; and

introducing aqueous mist into the growth environment throughout the incubation time period, or a portion thereof;

wherein the aqueous mist has a mist deposition rate and a mean mist deposition rate, and the mean mist deposition rate is less than or equal to about 10 microliter/cm 2 /hour, thereby producing extra-particle aerial mycelial growth from the growth matrix;

wherein

the growth matrix comprises the substrate and a fungal inoculum, said fungal inoculum comprising said fungus; or

the growth matrix comprises a colonized substrate, said colonized substrate comprising the substrate, wherein said substrate is previously colonized with mycelium of said fungus.

2. The method of claim 1 , wherein:

the growth environment comprises a growth atmosphere having a relative humidity, an oxygen (O 2 ) content, and a carbon dioxide (CO 2 ) content, wherein the CO 2 content is at least about 0.02% (v/v) and less than about 8% (v/v);

the mist deposition rate is less than or equal to about 150 microliter/cm 2 /hour; and

the mean mist deposition rate is less than or equal to about 5 microliter/cm 2 /hour or is less than or equal to about 3 microliter/cm 2 /hour.

3. The method of claim 1 , wherein the mist deposition rate is less than about 100 microliter/cm 2 /hour.

4. The method of claim 3 , wherein the mist deposition rate is less than about 10 microliter/cm 2 /hour.

5. The method of claim 2 , wherein the CO 2 content is within a range of about 0.2% (v/v) to about 7% (v/v).

6. The method of claim 2 , wherein the CO 2 content is greater than about 2% (v/v).

7. The method of claim 6 , wherein the CO 2 content is within a range of about 3% (v/v) to about 7% (v/v).

8. The method of claim 1 , wherein the mist deposition rate is less than about 2 microliter/cm 2 /hour.

9. The method of claim 8 , wherein the mean mist deposition rate is within a range of about 0.2 to about 0.8 microliter/cm 2 /hour.

10. The method of claim 8 , wherein the mist deposition rate is less than about 1 microliter/cm 2 /hour.

11. The method of claim 1 , wherein the mist deposition rate is at least about 0.05 microliter/cm 2 /hour and the mean mist deposition rate is at least about 0.02 microliter/cm 2 /hour.

12. The method of claim 8 , wherein the ratio of the mist deposition rate and the mean mist deposition rate is within a range of about 3:1 to about 1:1.

13. The method of claim 1 , wherein the mean mist deposition rate is less than or equal to about 2 microliter/cm 2 /hour.

14. The method of claim 1 , wherein the mean mist deposition rate is less than or equal to about 0.5 microliter/cm 2 /hour.

Assignments (4)

Continuity (4)

References Cited (355)