Substrate processing apparatus
The present inventive concept relates to a substrate processing apparatus comprising: a chamber providing a processing space; a lid for covering the top of the chamber; a substrate support part supporting at least one substrate and rotating about a rotation axis such that the substrate passes through an imaging area; a gas injection part for injecting a process gas toward the substrate support part; an area image capturing part for capturing an image of the imaging area to obtain a thermal image of the imaging area; and a calculation part for calculating the temperature data of the substrate from the thermal image.
1 . An apparatus for processing substrate, the apparatus comprising:
a chamber providing a processing space;
a lid covering an upper portion of the chamber;
a substrate supporting unit supporting at least one substrate and rotating about a rotational shaft so that a substrate passes through a photographing region;
a gas injection unit injecting a processing gas toward the substrate supporting unit;
a region photographing unit photographing the photographing region to obtain a thermal image of the photographing region; and
a calculation unit calculating temperature data of a substrate from the thermal image, wherein the calculation unit comprises:
an extraction module extracting first candidate data of a point-based temperature of a substrate corresponding to a first measurement line from the thermal image and extracting second candidate data of a point-based temperature of a substrate, corresponding to a second measurement line parallel to the first measurement line, from the thermal image, both the first candidate data and the second candidate data being extracted from the thermal image obtained at a certain moment; and
a calculation module calculating temperature data of a point-based temperature of a substrate included in the thermal image by using the first candidate data and the second candidate data,
wherein the first candidate data includes a first temperature corresponding to a first point on the first measurement line and the second candidate data includes a second temperature corresponding to a second point which is a point on the second measurement line corresponding to the first point, and
wherein the calculation module is configured to (i) determine an average temperature of the first and second temperatures as a point-based temperature corresponding to the first and second points if both the first and second temperatures are equal to or lower than a predetermined reference temperature, (ii) determine the second temperature as the point-based temperature corresponding to the first and second points if only the first temperature among the first and second temperatures is higher than the predetermined reference temperature, and (iii) transmit an alarm if both the first and second temperatures are higher than the predetermined reference temperature.
2 . The apparatus of claim 1 , wherein
a measurement hole disposed in the photographing region is provided in the lid, and
the region photographing unit is disposed over the lid and obtains the thermal image including a substrate passing through a region under the measurement hole by using the measurement hole.
3 . The apparatus of claim 2 , wherein the extraction module determines an interval between the first measurement line and the second measurement line on the basis of a separation distance between a substrate and the region photographing unit.
4 . The apparatus of claim 2 , wherein the extraction module extracts a portion, other than a portion corresponding to a pre-set temperature or less, of the thermal image as a substrate portion and extracts the first candidate data and the second candidate data corresponding to the extracted substrate portion.
5 . The apparatus of claim 1 , wherein
a measurement hole disposed in the photographing region is provided in the gas injection unit, and
the region photographing unit is disposed over the gas injection unit and obtains the thermal image including a substrate passing through a region under the measurement hole by using the measurement hole.
6 . The apparatus of claim 5 , wherein the extraction module determines an interval between the first measurement line and the second measurement line on the basis of a separation distance between a substrate and the region photographing unit.
7 . The apparatus of claim 5 , wherein the extraction module extracts a portion, other than a portion corresponding to a pre-set temperature or less, of the thermal image as a substrate portion and extracts the first candidate data and the second candidate data corresponding to the extracted substrate portion.
8 . The apparatus of claim 1 , wherein the extraction module determines an interval between the first measurement line and the second measurement line on the basis of a separation distance between a substrate and the region photographing unit.
9 . The apparatus of claim 1 , wherein the first measurement line and the second measurement line are apart from each other by an interval of 0.3 mm.
10 . The apparatus of claim 1 , wherein the extraction module extracts a portion, other than a portion corresponding to a pre-set temperature or less, of the thermal image as a substrate portion and extracts the first candidate data and the second candidate data corresponding to the extracted substrate portion.
11 . The apparatus of claim 1 , wherein the calculation unit comprises:
a generating module generating an oval detection image representing the temperature distribution of the substrate by using a plurality of temperature data; and
a conversion module converting the oval detection image into a circular detection image corresponding to a substrate.
12 . The apparatus of claim 11 , wherein
the generating module generates the oval detection image representing a temperature distribution corresponding one rotation of a substrate by using a rotation speed of the substrate supporting unit and a photographing time of the thermal image used to calculate the pieces of temperature data, and
the conversion module calculates point-based coordinates of a substrate by using a rotation speed of the substrate supporting unit and a distance apart from a rotational shaft of the substrate supporting unit for each point of the substrate, and then, converts the oval detection image into the circular detection image on the basis of the calculated coordinates.
13 . The apparatus of claim 1 , further comprising a temperature control unit for controlling a temperature of a substrate supported on the substrate supporting unit,
wherein the temperature control unit controls the temperature of the substrate by using temperature data calculated by the calculation unit.
14 . The apparatus of claim 1 , wherein the gas injection unit stops injection of a gas to the substrate supporting unit until a temperature of a substrate supported by the substrate supporting unit is controlled to a pre-set processing temperature by using the temperature data calculated by the calculation unit.