IP Library › Granted Patent US 12,196,688
Granted Patent B2
US 12,196,688 · App. 17/772,826 · Granted Jan 14, 2025

Method and apparatus for efficient high harmonic generation

Inventor: Petrus Wilhelmus Smorenburg (Veldhoven, NL)
Assignee: ASML NETHERLANDS B.V.
G01N21/9501G01N21/33G01N23/20008G02F1/354G03F7/70033G03F7/7065H05G2/003H05G2/008G01N2223/05G01N2223/6116
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Quick Facts
Patent No.
US 12,196,688
App. No.
17/772,826
Granted
Jan 14, 2025
Kind
B2
Abstract

A high harmonic radiation source and associated method of generating high harmonic radiation is disclosed. The high harmonic radiation source is configured to condition a gas medium by irradiating the gas medium with a pre-pulse of radiation, thereby generating a plasma comprising a pre-pulse plasma distribution; and irradiate the gas medium with a main pulse of radiation to generate said high harmonic radiation. The conditioning step is such that the plasma comprising a pre-pulse plasma distribution acts to configure a wavefront of said main pulse to improve one or both of: the efficiency of the high harmonic generation process and the beam quality of the high harmonic radiation. The high harmonic radiation source further may comprise a beam shaping device configured to shape said customized pre-pulse prior to said conditioning.

Claims (25)

1. A high harmonic radiation source comprising a gas medium and being configured to:

irradiate the gas medium with a main pulse of radiation to generate high harmonic radiation; and

irradiate the gas medium with a pre-pulse of radiation prior to an arrival of the main pulse of radiation,

wherein the pre-pulse of radiation is used to condition the gas medium.

2. The high harmonic radiation source of claim 1 , wherein the conditioning step is such that the pre-pulse is used to condition the gas medium by deliberately pre-ionizing a certain part of the gas medium.

3. The high harmonic radiation source of claim 1 , wherein the conditioning step is such that a plasma comprising a pre-pulse plasma distribution is generated.

4. The high harmonic radiation source of claim 3 , wherein the conditioning step is such that the plasma comprising the pre-pulse plasma distribution acts to configure a wavefront of the main pulse.

5. The high harmonic radiation source of claim 4 , wherein the pre-pulse plasma distribution is configured to correct the wavefront of the main pulse such that beam quality of the high harmonic radiation is improved.

6. The high harmonic radiation source of claim 1 , wherein the high harmonic radiation source further comprises a beam shaping device configured to shape the pre-pulse to a customized pre-pulse prior to the conditioning step.

7. The apparatus of claim 6 , wherein the beam shaping device comprises a phase modulation device and/or an intensity modulation device.

8. The apparatus of claim 6 , wherein the beam shaping device comprises one or any combination of a phase plate, a spatial light modulator, or an aperture.

9. The high harmonic radiation source of claim 6 , wherein the beam shaping device is operable to shape the customized pre-pulse such that it generates the pre-pulse plasma distribution that compensates for a main pulse plasma distribution subsequently generated by the main pulse.

10. The high harmonic radiation source of claim 6 , wherein the beam shaping device is operable to shape the customized pre-pulse to have an off-axis spatial intensity distribution configured to generate an off-axis pre-pulse plasma distribution.

11. The high harmonic radiation source of claim 1 , wherein the main pulse is configured to be temporally delayed with respect to the pre-pulse by a delay time.

12. The high harmonic radiation source of claim 1 , wherein the high harmonic radiation source is operable to generate the pre-pulse as a circularly polarized pre-pulse.

13. The high harmonic radiation source of claim 1 , comprising a main pulse laser for generating the main pulse and a pre-pulse laser for generating the pre-pulse.

14. A metrology device comprising a high harmonic radiation source comprising a gas medium and being configured to:

irradiate the gas medium with a main pulse of radiation to generate high harmonic radiation; and

irradiate the gas medium with a pre-pulse of radiation prior to an arrival of the main pulse of radiation,

wherein the pre-pulse of radiation is used to condition the gas medium.

15. A method of generating high harmonic radiation in a high harmonic generation process, comprising:

receiving a pre-pulse of radiation;

irradiating a gas medium with the pre-pulse prior to an arrival of a main pulse of radiation; and

irradiating the gas medium with the main pulse of radiation to generate the high harmonic radiation,

wherein the pre-pulse of radiation is used to condition the gas medium.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 25, 2024
From: SMORENBURG, PETRUS WILHELMUS
To: ASML NETHERLANDS B.V.
Reel/Frame 069025/0236 →
Priority Claims (1)
EP 19205875 · Oct 29, 2019 · regional
Continuity (1)
Related Publication 20220390388A1 · Dec 8, 2022
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